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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/mr/KimCJLML04>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/J._C._Lee>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/J._H._Lee>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/R._Jha>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Rino_Choi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Veena_Misra>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Y._H._Kim>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1016%2Fj.microrel.2004.07.049>
foaf:homepage <https://doi.org/10.1016/j.microrel.2004.07.049>
dc:identifier DBLP journals/mr/KimCJLML04 (xsd:string)
dc:identifier DOI doi.org%2F10.1016%2Fj.microrel.2004.07.049 (xsd:string)
dcterms:issued 2004 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/mr>
rdfs:label Reliability of High-K Dielectrics and Its Dependence on Gate Electrode and Interfacial / High-K Bi-Layer Structure. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/J._C._Lee>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/J._H._Lee>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/R._Jha>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Rino_Choi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Veena_Misra>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Y._H._Kim>
swrc:number 9-11 (xsd:string)
swrc:pages 1513-1518 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/mr/KimCJLML04/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/mr/KimCJLML04>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/mr/mr44.html#KimCJLML04>
rdfs:seeAlso <https://doi.org/10.1016/j.microrel.2004.07.049>
dc:title Reliability of High-K Dielectrics and Its Dependence on Gate Electrode and Interfacial / High-K Bi-Layer Structure. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 44 (xsd:string)