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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/mr/OhataBCSWGFC12>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Akiko_Ohata>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Bruno_Ghyselen>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/J._Widiez>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Laurent_Clavelier>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Olivier_Faynot>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sorin_Cristoloveanu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Thomas_Signamarcheix>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Young-Ho_Bae>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1016%2Fj.microrel.2012.05.014>
foaf:homepage <https://doi.org/10.1016/j.microrel.2012.05.014>
dc:identifier DBLP journals/mr/OhataBCSWGFC12 (xsd:string)
dc:identifier DOI doi.org%2F10.1016%2Fj.microrel.2012.05.014 (xsd:string)
dcterms:issued 2012 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/mr>
rdfs:label Deep-amorphization and solid-phase epitaxial regrowth processes for hybrid orientation technologies in SOI MOSFETs with thin body. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Akiko_Ohata>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Bruno_Ghyselen>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/J._Widiez>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Laurent_Clavelier>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Olivier_Faynot>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sorin_Cristoloveanu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Thomas_Signamarcheix>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Young-Ho_Bae>
swrc:number 11 (xsd:string)
swrc:pages 2602-2608 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/mr/OhataBCSWGFC12/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/mr/OhataBCSWGFC12>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/mr/mr52.html#OhataBCSWGFC12>
rdfs:seeAlso <https://doi.org/10.1016/j.microrel.2012.05.014>
dc:title Deep-amorphization and solid-phase epitaxial regrowth processes for hybrid orientation technologies in SOI MOSFETs with thin body. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 52 (xsd:string)