Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/journals/mr/PecoraMBCMMFY05
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Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing.
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Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing.
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