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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/mr/PotterMSARG14>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/C._H._De_Groot>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chris_Shaw>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Katrina_A._Morgan>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kenneth_Potter>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Peter_Ashburn>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/William_Redman-White>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1016%2Fj.microrel.2014.07.018>
foaf:homepage <https://doi.org/10.1016/j.microrel.2014.07.018>
dc:identifier DBLP journals/mr/PotterMSARG14 (xsd:string)
dc:identifier DOI doi.org%2F10.1016%2Fj.microrel.2014.07.018 (xsd:string)
dcterms:issued 2014 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/mr>
rdfs:label Total ionizing dose response of fluorine implanted Silicon-On-Insulator buried oxide. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/C._H._De_Groot>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chris_Shaw>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Katrina_A._Morgan>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kenneth_Potter>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Peter_Ashburn>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/William_Redman-White>
swrc:number 9-10 (xsd:string)
swrc:pages 2339-2343 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/mr/PotterMSARG14/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/mr/PotterMSARG14>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/mr/mr54.html#PotterMSARG14>
rdfs:seeAlso <https://doi.org/10.1016/j.microrel.2014.07.018>
dc:title Total ionizing dose response of fluorine implanted Silicon-On-Insulator buried oxide. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 54 (xsd:string)