Harnessing the base-pushout effect for ESD protection in bipolar and BiCMOS technologies.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/journals/mr/StreiblESSWSG03
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Harnessing the base-pushout effect for ESD protection in bipolar and BiCMOS technologies.
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Harnessing the base-pushout effect for ESD protection in bipolar and BiCMOS technologies.
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