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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/mr/YamadaMHFE01>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Koji_Eriguchi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Masaru_Moriwaki>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shinji_Fujii>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Takayuki_Yamada>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yoshinao_Harada>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1016%2FS0026-2714%2800%2900262-6>
foaf:homepage <https://doi.org/10.1016/S0026-2714(00)00262-6>
dc:identifier DBLP journals/mr/YamadaMHFE01 (xsd:string)
dc:identifier DOI doi.org%2F10.1016%2FS0026-2714%2800%2900262-6 (xsd:string)
dcterms:issued 2001 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/mr>
rdfs:label Effects of the sputtering deposition process of metal gate electrode on the gate dielectric characteristics. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Koji_Eriguchi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Masaru_Moriwaki>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shinji_Fujii>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Takayuki_Yamada>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yoshinao_Harada>
swrc:number 5 (xsd:string)
swrc:pages 697-704 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/mr/YamadaMHFE01/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/mr/YamadaMHFE01>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/mr/mr41.html#YamadaMHFE01>
rdfs:seeAlso <https://doi.org/10.1016/S0026-2714(00)00262-6>
dc:title Effects of the sputtering deposition process of metal gate electrode on the gate dielectric characteristics. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 41 (xsd:string)