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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/mr/YiJAHJ08>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jung-Uk_An>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kwang-Ho_Jang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sang-Soo_Hwang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Seol-Min_Yi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Young-Chang_Joo>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1016%2Fj.microrel.2007.12.005>
foaf:homepage <https://doi.org/10.1016/j.microrel.2007.12.005>
dc:identifier DBLP journals/mr/YiJAHJ08 (xsd:string)
dc:identifier DOI doi.org%2F10.1016%2Fj.microrel.2007.12.005 (xsd:string)
dcterms:issued 2008 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/mr>
rdfs:label The self-formatting barrier characteristics of Cu-Mg/SiO2 and Cu-Ru/SiO2 films for Cu interconnects. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jung-Uk_An>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kwang-Ho_Jang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sang-Soo_Hwang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Seol-Min_Yi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Young-Chang_Joo>
swrc:number 5 (xsd:string)
swrc:pages 744-748 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/mr/YiJAHJ08/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/mr/YiJAHJ08>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/mr/mr48.html#YiJAHJ08>
rdfs:seeAlso <https://doi.org/10.1016/j.microrel.2007.12.005>
dc:title The self-formatting barrier characteristics of Cu-Mg/SiO2 and Cu-Ru/SiO2 films for Cu interconnects. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 48 (xsd:string)