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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/mr/ZengSLS04>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Johnny_K._O._Sin>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Junfeng_Li>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/X._W._Sun>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Xiangbin_Zeng>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1016%2Fj.microrel.2003.10.007>
foaf:homepage <https://doi.org/10.1016/j.microrel.2003.10.007>
dc:identifier DBLP journals/mr/ZengSLS04 (xsd:string)
dc:identifier DOI doi.org%2F10.1016%2Fj.microrel.2003.10.007 (xsd:string)
dcterms:issued 2004 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/mr>
rdfs:label Improving reliability of poly-Si TFTs with channel layer and gate oxide passivated by NH3/N2O plasma. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Johnny_K._O._Sin>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Junfeng_Li>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/X._W._Sun>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Xiangbin_Zeng>
swrc:number 3 (xsd:string)
swrc:pages 435-442 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/mr/ZengSLS04/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/mr/ZengSLS04>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/mr/mr44.html#ZengSLS04>
rdfs:seeAlso <https://doi.org/10.1016/j.microrel.2003.10.007>
dc:title Improving reliability of poly-Si TFTs with channel layer and gate oxide passivated by NH3/N2O plasma. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 44 (xsd:string)