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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/pieee/FlewittM05>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Andrew_J._Flewitt>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/William_I._Milne>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FJPROC.2005.851533>
foaf:homepage <https://doi.org/10.1109/JPROC.2005.851533>
dc:identifier DBLP journals/pieee/FlewittM05 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FJPROC.2005.851533 (xsd:string)
dcterms:issued 2005 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/pieee>
rdfs:label Low-Temperature Deposition of Hydrogenated Amorphous Silicon in an Electron Cyclotron Resonance Reactor for Flexible Displays. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Andrew_J._Flewitt>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/William_I._Milne>
swrc:number 7 (xsd:string)
swrc:pages 1364-1373 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/pieee/FlewittM05/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/pieee/FlewittM05>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/pieee/pieee93.html#FlewittM05>
rdfs:seeAlso <https://doi.org/10.1109/JPROC.2005.851533>
dc:title Low-Temperature Deposition of Hydrogenated Amorphous Silicon in an Electron Cyclotron Resonance Reactor for Flexible Displays. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 93 (xsd:string)