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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/sensors/WilsonSBCSMC18>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Adelina_Stanoiu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Christopher_S._Blackman>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Claire_J._Carmalt>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Cristian_Eugen_Simion>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Francesco_Di_Maggio>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/James_Anthony_Covington>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Rachel_L._Wilson>
foaf:homepage <http://dx.doi.org/doi.org%2F10.3390%2Fs18030735>
foaf:homepage <https://doi.org/10.3390/s18030735>
dc:identifier DBLP journals/sensors/WilsonSBCSMC18 (xsd:string)
dc:identifier DOI doi.org%2F10.3390%2Fs18030735 (xsd:string)
dcterms:issued 2018 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/sensors>
rdfs:label The Effect of Film Thickness on the Gas Sensing Properties of Ultra-Thin TiO2 Films Deposited by Atomic Layer Deposition. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Adelina_Stanoiu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Christopher_S._Blackman>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Claire_J._Carmalt>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Cristian_Eugen_Simion>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Francesco_Di_Maggio>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/James_Anthony_Covington>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Rachel_L._Wilson>
swrc:number 3 (xsd:string)
swrc:pages 735 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/sensors/WilsonSBCSMC18/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/sensors/WilsonSBCSMC18>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/sensors/sensors18.html#WilsonSBCSMC18>
rdfs:seeAlso <https://doi.org/10.3390/s18030735>
dc:title The Effect of Film Thickness on the Gas Sensing Properties of Ultra-Thin TiO2 Films Deposited by Atomic Layer Deposition. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 18 (xsd:string)