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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/sensors/ZarzyckiZBAG19>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Artur_Zarzycki>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Aurore_Andrieux>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Christophe_Gorecki>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/July_Galeano_0001>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sylwester_Bargiel>
foaf:homepage <http://dx.doi.org/doi.org%2F10.3390%2Fs19040892>
foaf:homepage <https://doi.org/10.3390/s19040892>
dc:identifier DBLP journals/sensors/ZarzyckiZBAG19 (xsd:string)
dc:identifier DOI doi.org%2F10.3390%2Fs19040892 (xsd:string)
dcterms:issued 2019 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/sensors>
rdfs:label An Optical Diffuse Reflectance Model for the Characterization of a Si Wafer with an Evaporated SiO2 Layer. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Artur_Zarzycki>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Aurore_Andrieux>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Christophe_Gorecki>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/July_Galeano_0001>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sylwester_Bargiel>
swrc:number 4 (xsd:string)
swrc:pages 892 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/sensors/ZarzyckiZBAG19/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/sensors/ZarzyckiZBAG19>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/sensors/sensors19.html#ZarzyckiZBAG19>
rdfs:seeAlso <https://doi.org/10.3390/s19040892>
dc:title An Optical Diffuse Reflectance Model for the Characterization of a Si Wafer with an Evaporated SiO2 Layer. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 19 (xsd:string)