Mask Assignment and DSA Grouping for DSA-MP Hybrid Lithography for Sub-7 nm Contact/Via Holes.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/journals/tcad/BadrTG17
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Mask Assignment and DSA Grouping for DSA-MP Hybrid Lithography for Sub-7 nm Contact/Via Holes.
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Mask Assignment and DSA Grouping for DSA-MP Hybrid Lithography for Sub-7 nm Contact/Via Holes.
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