Simulation of arsenic in situ doping with polysilicon CVD and its application to high aspect ratio trenches.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/journals/tcad/HeitzingerPTTOS03
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2003
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Simulation of arsenic in situ doping with polysilicon CVD and its application to high aspect ratio trenches.
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Simulation of arsenic in situ doping with polysilicon CVD and its application to high aspect ratio trenches.
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