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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/tcad/WessnerCHHS06>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Andreas_H%E2%88%9A%E2%88%82ssinger>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Clemens_Heitzinger>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Johann_Cervenka>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Siegfried_Selberherr>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/W._Wessner>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FTCAD.2005.862750>
foaf:homepage <https://doi.org/10.1109/TCAD.2005.862750>
dc:identifier DBLP journals/tcad/WessnerCHHS06 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FTCAD.2005.862750 (xsd:string)
dcterms:issued 2006 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/tcad>
rdfs:label Anisotropic Mesh Refinement for the Simulation of Three-Dimensional Semiconductor Manufacturing Processes. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Andreas_H%E2%88%9A%E2%88%82ssinger>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Clemens_Heitzinger>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Johann_Cervenka>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Siegfried_Selberherr>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/W._Wessner>
swrc:number 10 (xsd:string)
swrc:pages 2129-2139 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/tcad/WessnerCHHS06/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/tcad/WessnerCHHS06>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/tcad/tcad25.html#WessnerCHHS06>
rdfs:seeAlso <https://doi.org/10.1109/TCAD.2005.862750>
dc:title Anisotropic Mesh Refinement for the Simulation of Three-Dimensional Semiconductor Manufacturing Processes. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 25 (xsd:string)