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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/tcasII/LishaBS21>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Joseph_Shor>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Liron_Lisha>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ori_Bass>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FTCSII.2020.3020945>
foaf:homepage <https://doi.org/10.1109/TCSII.2020.3020945>
dc:identifier DBLP journals/tcasII/LishaBS21 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FTCSII.2020.3020945 (xsd:string)
dcterms:issued 2021 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/tcasII>
rdfs:label A 5800 őľm¬≤ Process Monitor Circuit for Measurement of in-Die Variation of Vth in 65nm. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Joseph_Shor>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Liron_Lisha>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ori_Bass>
swrc:number 3 (xsd:string)
swrc:pages 863-867 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/tcasII/LishaBS21/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/tcasII/LishaBS21>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/tcasII/tcasII68.html#LishaBS21>
rdfs:seeAlso <https://doi.org/10.1109/TCSII.2020.3020945>
dc:title A 5800 őľm¬≤ Process Monitor Circuit for Measurement of in-Die Variation of Vth in 65nm. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 68 (xsd:string)