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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/tim/ElizaIRBBBEG11>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Benjamin_J._Blalock>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/L._R._Baylor>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/M._Nance_Ericson>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Nora_D._Bull>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sazia_A._Eliza>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Syed_Kamrul_Islam>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Touhidur_Rahman>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/W._L._Gardner>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FTIM.2010.2090691>
foaf:homepage <https://doi.org/10.1109/TIM.2010.2090691>
dc:identifier DBLP journals/tim/ElizaIRBBBEG11 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FTIM.2010.2090691 (xsd:string)
dcterms:issued 2011 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/tim>
rdfs:label A Precision Dose Control Circuit for Maskless E-Beam Lithography With Massively Parallel Vertically Aligned Carbon Nanofibers. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Benjamin_J._Blalock>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/L._R._Baylor>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/M._Nance_Ericson>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Nora_D._Bull>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sazia_A._Eliza>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Syed_Kamrul_Islam>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Touhidur_Rahman>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/W._L._Gardner>
swrc:number 4 (xsd:string)
swrc:pages 1132-1140 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/tim/ElizaIRBBBEG11/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/tim/ElizaIRBBBEG11>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/tim/tim60.html#ElizaIRBBBEG11>
rdfs:seeAlso <https://doi.org/10.1109/TIM.2010.2090691>
dc:title A Precision Dose Control Circuit for Maskless E-Beam Lithography With Massively Parallel Vertically Aligned Carbon Nanofibers. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 60 (xsd:string)