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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/tvlsi/JiangCC12>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chih-Long_Chang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Hua-Yu_Chang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Iris_Hui-Ru_Jiang>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FTVLSI.2011.2116049>
foaf:homepage <https://doi.org/10.1109/TVLSI.2011.2116049>
dc:identifier DBLP journals/tvlsi/JiangCC12 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FTVLSI.2011.2116049 (xsd:string)
dcterms:issued 2012 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/tvlsi>
rdfs:label WiT: Optimal Wiring Topology for Electromigration Avoidance. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chih-Long_Chang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Hua-Yu_Chang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Iris_Hui-Ru_Jiang>
swrc:number 4 (xsd:string)
swrc:pages 581-592 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/tvlsi/JiangCC12/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/tvlsi/JiangCC12>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/tvlsi/tvlsi20.html#JiangCC12>
rdfs:seeAlso <https://doi.org/10.1109/TVLSI.2011.2116049>
dc:title WiT: Optimal Wiring Topology for Electromigration Avoidance. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 20 (xsd:string)