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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/tvlsi/LinFCRK18>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chieh-Hsiung_Kuan>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shao-Yun_Fang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Wei-Cheng_Rao>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yao-Wen_Chang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Zhi-Wen_Lin>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FTVLSI.2017.2761850>
foaf:homepage <https://doi.org/10.1109/TVLSI.2017.2761850>
dc:identifier DBLP journals/tvlsi/LinFCRK18 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FTVLSI.2017.2761850 (xsd:string)
dcterms:issued 2018 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/tvlsi>
rdfs:label Provably Good Max-Min-m-Neighbor-TSP-Based Subfield Scheduling for Electron-Beam Photomask Fabrication. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chieh-Hsiung_Kuan>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shao-Yun_Fang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Wei-Cheng_Rao>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yao-Wen_Chang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Zhi-Wen_Lin>
swrc:number 2 (xsd:string)
swrc:pages 378-391 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/tvlsi/LinFCRK18/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/tvlsi/LinFCRK18>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/tvlsi/tvlsi26.html#LinFCRK18>
rdfs:seeAlso <https://doi.org/10.1109/TVLSI.2017.2761850>
dc:title Provably Good Max-Min-m-Neighbor-TSP-Based Subfield Scheduling for Electron-Beam Photomask Fabrication. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 26 (xsd:string)