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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/phd/ndltd/Fan12>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Wei_Fan_0009>
foaf:homepage <https://hdl.handle.net/1721.1/78446>
dc:identifier DBLP phd/ndltd/Fan12 (xsd:string)
dcterms:issued 2012 (xsd:gYear)
rdfs:label Advanced modeling of planarization processes for integrated circuit fabrication. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Wei_Fan_0009>
dc:publisher Massachusetts Institute of Technology, Cambridge, MA, USA (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/phd/ndltd/Fan12/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/phd/ndltd/Fan12>
rdfs:seeAlso <https://hdl.handle.net/1721.1/78446>
dc:title Advanced modeling of planarization processes for integrated circuit fabrication. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:PhDThesis
rdf:type foaf:Document