Search results for "lithography"

Hits ?▲	Authors	Title	Venue	Year	Link	Author keywords
16	Yang-Shan Tong, Sao-Jie Chen	An Automatic Optical Simulation-Based Lithography Hotspot Fix Flow for Post-Route Optimization.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2010	DBLP DOI BibTeX RDF
16	Andrew B. Kahng, Chul-Hong Park, Xu Xu 0001, Hailong Yao	Layout Decomposition Approaches for Double Patterning Lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2010	DBLP DOI BibTeX RDF
16	Tai-Chen Chen, Guang-Wan Liao, Yao-Wen Chang	Predictive Formulae for OPC With Applications to Lithography-Friendly Routing.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2010	DBLP DOI BibTeX RDF
16	Mohit Gupta, Kwangok Jeong, Andrew B. Kahng	Timing Yield-Aware Color Reassignment and Detailed Placement Perturbation for Bimodal CD Distribution in Double Patterning Lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2010	DBLP DOI BibTeX RDF
16	Sergio Gómez, Francesc Moll	Lithography Aware Regular Cell Design Based on a Predictive Technology Model.	J. Low Power Electron.	2010	DBLP DOI BibTeX RDF
16	Xu Ma, Gonzalo R. Arce	Computational Lithography.		2010	RDF
16	Ningning Jia, Edmund Y. Lam	Stochastic gradient descent for robust inverse photomask synthesis in optical lithography.	ICIP	2010	DBLP DOI BibTeX RDF
16	Rami F. Salem, Abdelrahman ElMously, Haitham Eissa, Mohamed Dessouky, Mohab H. Anis	A DFM tool for analyzing lithography and stress effects on standard cells and critical path performance in 45nm digital designs.	IDT	2010	DBLP DOI BibTeX RDF
16	Yit Sung Ngo, Geng Yang, Andi Sudjana Putra, Kar Tien Ang, Arthur Tay, Zhong Ping Fang	Equipment design and process control of critical dimensions in lithography.	ICCA	2010	DBLP DOI BibTeX RDF
16	Kuen-Yu Tsai, Wei-Jhih Hsieh, Yuan-Ching Lu, Bo-Sen Chang, Sheng-Wei Chien, Yi-Chang Lu	A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects.	ASP-DAC	2010	DBLP DOI BibTeX RDF
16	Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, David Z. Pan	A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography.	ASP-DAC	2010	DBLP DOI BibTeX RDF
16	Chin-Ching Hsu, Yung-Chung Lee	Fabrication of flexible nano-wired polarizer by contact-transferred and mask embedded lithography and polyurethane acrylate mold.	NEMS	2010	DBLP DOI BibTeX RDF
16	Min Zhao, Baoqin Chen, Changqing Xie, Ming Liu, Jiebing Nie	Study of process of HSQ in electron beam lithography.	NEMS	2010	DBLP DOI BibTeX RDF
16	Kun Yuan, David Z. Pan	WISDOM: Wire spreading enhanced decomposition of masks in Double Patterning Lithography.	ICCAD	2010	DBLP DOI BibTeX RDF
16	Vivek Joshi, Kanak Agarwal, David T. Blaauw, Dennis Sylvester	Analysis and optimization of SRAM robustness for double patterning lithography.	ICCAD	2010	DBLP DOI BibTeX RDF
16	Vivek Joshi, Michael Wieckowski, Gregory K. Chen, David T. Blaauw, Dennis Sylvester	Analyzing the impact of Double Patterning Lithography on SRAM variability in 45nm CMOS.	CICC	2010	DBLP DOI BibTeX RDF
16	Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topaloglu	Assessing chip-level impact of double patterning lithography.	ISQED	2010	DBLP DOI BibTeX RDF
16	Yao Peng 0003, Jinyu Zhang, Yan Wang 0023, Zhiping Yu	High performance source optimization using a gradient-based method in optical lithography.	ISQED	2010	DBLP DOI BibTeX RDF
16	Wing Chiu Tam, R. D. (Shawn) Blanton, Wojciech Maly	Evaluating yield and testing impact of sub-wavelength lithography.	VTS	2010	DBLP DOI BibTeX RDF
16	Rance Rodrigues, Sandip Kundu	Optical Lithography Simulation with Focus Variation using Wavelet Transform.	VLSI Design	2010	DBLP DOI BibTeX RDF	Critical Dimensions, Edge Detection Value, Wavelet Transform, Wavelet, Aerial Image
16	Kevin J. Meneou	Pathways for quantum dot optoelectronics fabrication using soft nanoimprint lithography		2010	RDF
16	Hsin-I Cindy Liu	Architecture and Hardware Design of Lossless Compression Algorithms for Direct-Write Maskless Lithography Systems.		2010	RDF
16	Hsiu-Ming Yeh, Kuo-Shen Chen	Development of a Digital-Convolution-Based Process Emulator for Three-Dimensional Microstructure Fabrication Using Electron-Beam Lithography.	IEEE Trans. Ind. Electron.	2009	DBLP DOI BibTeX RDF
16	Arthur Tay, Weng Khuen Ho, Xiaodong Wu, Xiaoqi Chen	In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography.	IEEE Trans. Instrum. Meas.	2009	DBLP DOI BibTeX RDF
16	Minsik Cho, Kun Yuan, Yongchan Ban, David Z. Pan	ELIAD: Efficient Lithography Aware Detailed Routing Algorithm With Compact and Macro Post-OPC Printability Prediction.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2009	DBLP DOI BibTeX RDF
16	Quandai Wang, Yugang Duan, Yucheng Ding, Bingheng Lu, Jiawei Xiang, Lianfa Yang	Investigation on LIGA-like process based on multilevel imprint lithography.	Microelectron. J.	2009	DBLP DOI BibTeX RDF
16	Lei Yin, Hongzhong Liu, Yucheng Ding, Hongbo Lan, Bingheng Lu	Fabrication of carbon nanotube arrays for field emission and sensor devices by nanoimprint lithography.	Microelectron. J.	2009	DBLP DOI BibTeX RDF
16	Kurt Ronse, Philippe Jansen, Roel Gronheid, Eric Hendrickx, Mireille Maenhoudt, Vincent Wiaux, Mieke Goethals, R. Jonckheere, Geert Vandenberghe	Lithography Options for the 32 nm Half Pitch Node and Beyond.	IEEE Trans. Circuits Syst. I Regul. Pap.	2009	DBLP DOI BibTeX RDF
16	Jian-Shian Lin, Chieh-Lung Lai, Ya-Chun Tu, Cheng-Hua Wu, Yoshimi Takeuchi	A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment.	Int. J. Autom. Technol.	2009	DBLP DOI BibTeX RDF
16	Aswin Sreedhar, Sandip Kundu	On linewidth-based yield analysis for nanometer lithography.	DATE	2009	DBLP DOI BibTeX RDF
16	Caroline Prodhon, Demetrio Macías, Farouk Yalaoui, Alexandre Vial, Lionel Amodeo	Bi-objective Optimization of the Plasmon-assisted Lithography - Design of Plasmonic Nanostructures.	IJCCI	2009	DBLP BibTeX RDF
16	Shuhua Wei, Jinzhao Zhang, Li Han	Design and implementation of software system of E-beam lithography based on SEM.	NEMS	2009	DBLP DOI BibTeX RDF
16	Michael Junkin, Donna D. Zhang, Pak Kin Wong 0002	Plasma lithography for control of cell morphology and proliferation.	NEMS	2009	DBLP DOI BibTeX RDF
16	Mohit Gupta, Kwangok Jeong, Andrew B. Kahng	Timing yield-aware color reassignment and detailed placement perturbation for double patterning lithography.	ICCAD	2009	DBLP DOI BibTeX RDF
16	Burn J. Lin, R. G. Liu	Progress and outlook of lithography for semiconductor IC.	CICC	2009	DBLP DOI BibTeX RDF
16	Rance Rodrigues, Aswin Sreedhar, Sandip Kundu	Optical lithography simulation using wavelet transform.	ICCD	2009	DBLP DOI BibTeX RDF
16	Nada Amin, William Thies, Saman P. Amarasinghe	Computer-aided design for microfluidic chips based on multilayer soft lithography.	ICCD	2009	DBLP DOI BibTeX RDF
16	Vivek Singh	Computational Lithography - Moore Bang for your Buck.	VLSI Design	2009	DBLP DOI BibTeX RDF
16	Pengfei Cao, Lin Cheng, Xiao-Ping Zhang	Computer Simulation of 3D Mask Image Based on Self-Adaptive Model in VLSI Lithography.	CSIE (3)	2009	DBLP DOI BibTeX RDF
16	Bryan M. Cord	Achieving sub-10-nm resolution using scanning electron beam lithography.		2009	RDF
16	Joel K. Yang	Advancements in superconducting nanowire single-photon detectors and development of fabrication for sub-10-nm lithography.		2009	RDF
16	Franklin M. Schellenberg	Modeling and Computational Lithography.	Handbook of Algorithms for Physical Design Automation	2008	DBLP DOI BibTeX RDF
16	Hiroshi Yamauchi, Yasuyuki Watanabe, Masaaki Iizuka, Masakazu Nakamura, Kazuhiro Kudo	Characterization of Organic Static Induction Transistors with Nano-Gap Gate Fabricated by Electron Beam Lithography.	IEICE Trans. Electron.	2008	DBLP DOI BibTeX RDF
16	Ke Cao, Jiang Hu	ASIC design flow considering lithography-induced effects.	IET Circuits Devices Syst.	2008	DBLP DOI BibTeX RDF
16	Shi-Long Lv, Zhi-Tang Song, Song-Lin Feng	Fabrication of arrays of line with nanoscale width and large length by electron beam lithography with high-precision stage.	Microelectron. J.	2008	DBLP DOI BibTeX RDF
16	Ho Seob Kim, Seungjoon Ahn, Dae Wook Kim, Tae-Sik Oh, Seong Joon Ahn	Efficient electron beam condensing for low-energy microcolumn lithography.	Microelectron. J.	2008	DBLP DOI BibTeX RDF
16	Aswin Sreedhar, Sandip Kundu	Lithography Simulation Basics and a Study on Impact of Lithographic Process Window on Gate and Path Delays.	J. Low Power Electron.	2008	DBLP DOI BibTeX RDF
16	R. Fabian W. Pease, Stephen Y. Chou	Lithography and Other Patterning Techniques for Future Electronics.	Proc. IEEE	2008	DBLP DOI BibTeX RDF
16	Yoko Yamanishi, Shinya Sakuma, Yuki Kihara, Fumihito Arai	On-chip magnetic 3D soft microactuators made by gray-scale lithography.	IROS	2008	DBLP DOI BibTeX RDF
16	Fuyuan Luo, Juan Yin	An optimal scheduling algorithm for the motion control of step and scan lithography.	ICARCV	2008	DBLP DOI BibTeX RDF
16	Lianguan Shen, Meiyan Wang, Yu Hao, Gaofei Zhao, Zhao Shu, Sun Yuan, Xiaodong Wang, Mujun Li, Jinjin Zheng	MEMS lithography collaborative simulation environment research.	CSCWD	2008	DBLP DOI BibTeX RDF
16	Kurt Ronse, Philippe Jansen, Roel Gronheid, Eric Hendrickx, Mireille Maenhoudt, Mieke Goethals, Geert Vandenberghe	Lithography options for the 32nm half pitch node and beyond.	CICC	2008	DBLP DOI BibTeX RDF
16	C. H. Zhang, Sunao Katsuki, H. Horta, H. Imamura, Hidenori Akiyama	High-Power EUV Source for Lithography Using Tin Target.	IAS	2008	DBLP DOI BibTeX RDF
16	Aswin Sreedhar, Sandip Kundu	Statistical Yield Modeling for Sub-wavelength Lithography.	ITC	2008	DBLP DOI BibTeX RDF
16	Farah Fida, Ramin Banan-Sadeghian, Ahmad-Reza Hajiaboli, Yahia Djaoued, Simona Badilescu, Subramanian Balaji, M. Kahrizi, Vo-Van Truong	Biosensing Based on Surface Plasmon Resonance of Gold Nanohole and Nanoring Arrays Fabricated by a Novel Nanosphere Lithography Technique.	BIOTECHNO	2008	DBLP DOI BibTeX RDF
16	Zhen Ma, David M. Klymyshyn, Sven Achenbach, Martin Börner, Nina Dambrowsky, Jürgen Mohr	An Ultra-Deep High-Q Microwave Cavity Resonator Fabricated Using Deep X-Ray Lithography.	IEICE Trans. Electron.	2007	DBLP DOI BibTeX RDF
16	Makoto Sugihara, Kenta Nakamura, Yusuke Matsunaga, Kazuaki J. Murakami	Technology Mapping Technique for Increasing Throughput of Character Projection Lithography.	IEICE Trans. Electron.	2007	DBLP DOI BibTeX RDF
16	Manseung Seo, Haeryung Kim	Lithography upon micromirrors.	Comput. Aided Des.	2007	DBLP DOI BibTeX RDF
16	Peng Yu, David Z. Pan	A novel intensity based optical proximity correction algorithm with speedup in lithography simulation.	ICCAD	2007	DBLP DOI BibTeX RDF
16	Jaesik Lee, Joseph Weiner, Hsin-Hung Chen, Yves Baeyens, Vladimir Aksyuk, Young-Kai Chen	CMOS-Based MEMS Mirror Driver for Maskless Lithography Systems.	CICC	2007	DBLP DOI BibTeX RDF
16	Naoto Miyamoto, Masahiko Shimakage, Tatsuo Morimoto, Kazuya Kadota, Shigetoshi Sugawa, Tadahiro Ohmi	A Rapid Prototyping of Real-Time Pattern Generator for Step-and-Scan Lithography Using Digital Micromirror Device.	FPT	2007	DBLP DOI BibTeX RDF
16	Darsun Tsiena, Chien Kuo Wang, William W. J. Wang, Yajun Ran, Philippe Hurat, Nishath Verghese	Context-specific leakage and delay analysis of a 65nm standard cell library for lithography-induced variability.	SoCC	2007	DBLP DOI BibTeX RDF
16	Manseung Seo, Haeryung Kim, Masahiko Onosato	Lithography Using a Microelectronic Mask.	J. Robotics Mechatronics	2006	DBLP DOI BibTeX RDF
16	Carsten Burstedde, Jürgen Braun, Angela Kunoth	Computing light masks in neutral atom lithography.	J. Comput. Phys.	2006	DBLP DOI BibTeX RDF
16	Kanad Chakraborty, Alexey Lvov, Maharaj Mukherjee	Novel algorithms for placement of rectangular covers for mask inspection in advanced lithography and other VLSI design applications.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2006	DBLP DOI BibTeX RDF
16	Edson J. Carvalho, Marco Antonio Robert Alves, Edmundo S. Braga, Lucila Cescato	SiO2 single layer for reduction of the standing wave effects in the interference lithography of deep photoresist structures on Si.	Microelectron. J.	2006	DBLP DOI BibTeX RDF
16	Ali Rostami, Ali Rahmani	Two-dimensional optical mask design and atom lithography.	Microelectron. J.	2006	DBLP DOI BibTeX RDF
16	Antti Tukiainen, J. Viheriälä, Tapio Niemi, T. Rytkönen, J. Kontio, M. Pessa	Selective growth experiments on gallium arsenide (100) surfaces patterned using UV-nanoimprint lithography.	Microelectron. J.	2006	DBLP DOI BibTeX RDF
16	Kuo-Chang Lo, Mei-Li Hsieh, Yi-Sheng Lan	Fabrication and Characterization of Two-dimensional Photonic Crystal using Holographic Lithography Technology.	JCIS	2006	DBLP DOI BibTeX RDF
16	Lo Ming Fok, Yun-Hui Liu, Wen Jung Li	Fabrication and Characterization of nanowires by Atomic Force Microscope Lithography.	IROS	2006	DBLP DOI BibTeX RDF
16	Juan Montoya	Toward nano-accuracy in scanning beam interference lithography.		2006	RDF
16	Kanti Jain, Marc Klosner, Marc Zemel, Shyam Raghunandan	Flexible Electronics and Displays: High-Resolution, Roll-to-Roll, Projection Lithography and Photoablation Processing Technologies for High-Throughput Production.	Proc. IEEE	2005	DBLP DOI BibTeX RDF
16	Steven R. J. Brueck	Optical and Interferometric Lithography - Nanotechnology Enablers.	Proc. IEEE	2005	DBLP DOI BibTeX RDF
16	Walter J. Trybula, Robert L. Wright, Kranthi Mitra Adusumilli, Randy K. Goodall	An analysis: traditional semiconductor lithography versus emerging technology (nano imprint).	WSC	2005	DBLP DOI BibTeX RDF
16	Yick Chuen Chan, Yi-Kuen Lee, Man Wong, Yitshak Zohar	High-throughput fabrication of sub-micron pillar arrays for free-solution DNA electrophoresis without E-beam lithography.	ROBIO	2005	DBLP DOI BibTeX RDF
16	Makoto Sugihara, Taiga Takata, Kenta Nakamura, Ryoichi Inanami, Hiroaki Hayashi, Katsumi Kishimoto, Tetsuya Hasebe, Yukihiro Kawano, Yusuke Matsunaga, Kazuaki J. Murakami, Katsuya Okumura	Cell Library Development Methodology for Throughput Enhancement of Electron Beam Direct-Write Lithography Systems.	SoC	2005	DBLP DOI BibTeX RDF
16	Xuefeng Wang	Microelectromechanical and Microfluidic Systems for Scanning Probe Lithography		2005	RDF
16	Franck Robin, Andrea Orzati, Esteban Moreno Soriano, Otte Jakob Homan, Werner Bächtold	Simulation and evolutionary optimization of electron-beam lithography with genetic and simplex-downhill algorithms.	IEEE Trans. Evol. Comput.	2003	DBLP DOI BibTeX RDF
16	Woei Wan Tan, Reginald F. Y. Li	An in-situ temperature measurement system for DUV lithography.	IEEE Trans. Instrum. Meas.	2003	DBLP DOI BibTeX RDF
16	Paul Isaac Hagouel	Blazed diffraction gratings fabricated using X-ray lithography: fabrication, modeling and simulation.	Microelectron. Reliab.	2003	DBLP DOI BibTeX RDF
16	Jong Ren Kong, Oliver Wilhelmi, Herbert O. Moser	Gap Optimisation For Proximity X-Ray Lithography Using The Super-Resolution Process.	Int. J. Comput. Eng. Sci.	2003	DBLP DOI BibTeX RDF
16	V. A. Kudryashov, X.-C. Yuan, T. L. Tan, P. Lee, S. F. A. Karim, B. L. Tan	3d Structures Formation In A Single Layer Su-8 Car Using Dual Uv And Electron-Beam Lithography.	Int. J. Comput. Eng. Sci.	2003	DBLP DOI BibTeX RDF
16	Jeng T. Sheu, Cheng C. Chen, Sun P. Yeh, Hseih T. Chou	Fabrication Of Ultrahigh-Density Nano-Pyramid Arrays (Npas) On (100) Silicon Wafer Using Scanning Probe Lithography And Anisotropic Wet Etching.	Int. J. Comput. Eng. Sci.	2003	DBLP DOI BibTeX RDF
16	Carl Gang Chen	Beam alignment and image metrology for scanning beam interference lithography: fabricating gratings with nanometer phase accuracy.		2003	RDF
16	Rajesh Menon	Diffractive optics for maskless lithography and imaging.		2003	RDF
16	Jeffrey Todd Hastings	Nanometer-precision electron-beam lithography with applications in integrated optics.		2003	RDF
16	Palash Das, Richard L. Sandstrom	Advances in excimer laser technology for sub-0.25-μm lithography.	Proc. IEEE	2002	DBLP DOI BibTeX RDF
16	Kanti Jain, Marc Zemel, Marc Klosner	Large-area high-resolution lithography and photoablation systems for microelectronics and optoelectronics fabrication.	Proc. IEEE	2002	DBLP DOI BibTeX RDF
16	Harry Shields, Steven W. Fornaca, Michael B. Petach, Rocco A. Orsini, Richard H. Moyer, Randall J. St Pierre	Laser-produced plasma light source for extreme ultraviolet lithography.	Proc. IEEE	2002	DBLP DOI BibTeX RDF
16	Bruno Michel, André Bernard, Alexander Bietsch, Emmanuel Delamarche, Matthias Geissler, David Juncker, Hannes Kind, Jean-Philippe Renault, Hugo E. Rothuizen, Heinz Schmid, Patrick Schmidt-Winkel, Richard Stutz, Heiko Wolf	Printing meets lithography: Soft approaches to high-resolution patterning.	IBM J. Res. Dev.	2001	DBLP DOI BibTeX RDF
16	Hiroshi Ito	Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography.	IBM J. Res. Dev.	2001	DBLP DOI BibTeX RDF
16	Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham	TCAD development for lithography resolution enhancement.	IBM J. Res. Dev.	2001	DBLP DOI BibTeX RDF
16	A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes	Review of technology for 157-nm lithography.	IBM J. Res. Dev.	2001	DBLP DOI BibTeX RDF
16	Rajinder S. Dhaliwal, William A. Enichen, Steven D. Golladay, Michael S. Gordon, Rodney A. Kendall, Jon E. Lieberman, Hans C. Pfeiffer, David J. Pinckney, Christopher F. Robinson, James D. Rockrohr, Werner Stickel, Eileen V. Tressler	PREVAIL-Electron projection technology approach for next-generation lithography.	IBM J. Res. Dev.	2001	DBLP DOI BibTeX RDF
16	Lloyd R. Harriott	Limits of lithography.	Proc. IEEE	2001	DBLP DOI BibTeX RDF
16	Pai-Hsueh Yang, Brian Alamo, Gerry B. Andeen	Control design for a 6 DOF e-beam lithography stage.	ACC	2001	DBLP DOI BibTeX RDF
16	Tsuneo Terasawa	Embedded tutorial: subwavelength lithography.	ASP-DAC	2000	DBLP DOI BibTeX RDF
16	Juan Ferrera Uranga	Nanometer-scale placement in electron-beam lithography.		2000	RDF
16	Aristides A. G. Requicha	Massively Parallel Nanorobotics for Lithography and Data Storage.	Int. J. Robotics Res.	1999	DBLP DOI BibTeX RDF
16	Andrew B. Kahng, Y. C. Pati	Subwavelength optical lithography: challenges and impact on physical design.	ISPD	1999	DBLP DOI BibTeX RDF