Search results for "silicide"

Hits ?▲	Authors	Title	Venue	Year	Link	Author keywords
53	Kiyoshi Nikawa, Shoji Inoue	New Capabilities of OBIRCH Method for Fault Localization and Defect Detection.	Asian Test Symposium	1997	DBLP DOI BibTeX RDF	laser beam, current path, backside observation, high resistivity, heating
36	Paul Beckett	Low-power circuits using dynamic threshold devices.	ACM Great Lakes Symposium on VLSI	2005	DBLP DOI BibTeX RDF	silicide, thin-body, CMOS, nanotechnology, SOI, subthreshold leakage, double-gate
29	Liu Xi, Ya Wang, Meile Wu, Lin Qi, Mengmeng Li, Shouqiang Zhang, Xiaoshi Jin	A Complementary Low Schottky Barrier Nonvolatile Bidirectional Reconfigurable Field Effect Transistor Based on Dual Metal Silicide S/D Contacts.	IEEE Access	2023	DBLP DOI BibTeX RDF
29	Allé Dioum, Yacouba I. Diakité, Yuiry Malozovsky, Blaise Awola Ayirizia, Aboubaker Chedikh Beye, Diola Bagayoko	First-Principles Investigation of Electronic and Related Properties of Cubic Magnesium Silicide (Mg2Si).	Comput.	2023	DBLP DOI BibTeX RDF
29	Brian T. McGowan, Michal Rakowski, Seungman Choi	Nickel Silicide Electromigration on Micro Ring Modulators for Silicon Photonics Technology.	IRPS	2023	DBLP DOI BibTeX RDF
29	Yi Han, Jingxuan Sun, Jin Hee Bae, Detlev Grützmacher, Joachim Knoch, Qing-Tai Zhao	High Performance 5 nm Si Nanowire FETs with a Record Small SS = 2.3 mV/dec and High Transconductance at 5.5 K Enabled by Dopant Segregated Silicide Source/Drain.	VLSI Technology and Circuits	2023	DBLP DOI BibTeX RDF
29	Soundarya Nagarajan, Daniel Hiller, Ingmar Ratschinski, Joachim Knoch, Thomas Mikolajick, Jens Trommer	Evaluation of Schottky barrier height at Silicide/Silicon interface of a Silicon Nanowire with Modulation Acceptor Doped Dielectric Shell.	DRC	2023	DBLP DOI BibTeX RDF
29	Daniela Salvoni, Loredana Parlato, Mikkel Ejrnaes, Francesco Mattioli 0002, Alessandro Gaggero, Francesco Martini, Giovanni Ausanio, Davide Massarotti, Domenico Montemurro, Halima Giovanna Ahmad, Luigi di Palma, Francesco Tafuri, Roberto Cristiano, Giovanni Piero Pepe	Demonstration of Single Photon Detection in Amorphous Molybdenum Silicide / Aluminium Superconducting Nanostrip.	IEEE Instrum. Meas. Mag.	2021	DBLP DOI BibTeX RDF
29	Rengie Mark D. Mailig, Min Gee Kim, Shun'ichiro Ohmi	The Evaluation of the Interface Properties of PdEr-Silicide on Si(100) Formed with TiN Encapsulating Layer and Dopant Segregation Process.	IEICE Trans. Electron.	2020	DBLP DOI BibTeX RDF
29	Shun'ichiro Ohmi, Yuya Tsukamoto, Rengie Mark D. Mailig	Etching Control of HfN Encapsulating Layer for PtHf-Silicide Formation with Dopant Segregation Process.	IEICE Trans. Electron.	2019	DBLP DOI BibTeX RDF
29	Yefan Liu, Hao Yu, Gaspard Hiblot, Anastasiia Kruv, Marc Schaekers, Naoto Horiguchi, Dimitrios Velenis, Ingrid De Wolf	Study of the Mechanical Stress Impact on Silicide Contact Resistance by 4-Point Bending.	IRPS	2019	DBLP DOI BibTeX RDF
29	Ana Covic, Qihang Shi, Hao-Ting Shen, Domenic Forte	Contact-to-Silicide Probing Attacks on Integrated Circuits and Countermeasures.	AsianHOST	2019	DBLP DOI BibTeX RDF
29	Shun'ichiro Ohmi, Yuya Tsukamoto, Weiguang Zuo, Yasushi Masahiro	PdEr-Silicide Formation and Contact Resistivity Reduction to n-Si(100) Realized by Dopant Segregation Process.	IEICE Trans. Electron.	2018	DBLP DOI BibTeX RDF
29	Gunes A. Yakaboylu, Rajalekshmi C. Pillai, Katarzyna Sabolsky, Edward M. Sabolsky	Fabrication and Thermoelectric Characterization of Transition Metal Silicide-Based Composite Thermocouples.	Sensors	2018	DBLP DOI BibTeX RDF
29	Shun'ichiro Ohmi, Mengyi Chen, Weiguang Zuo, Yasushi Masahiro	PdYb-Silicide with Low Schottky Barrier Height to n-Si Formed from Pd/Yb/Si(100) Stacked Structures.	IEICE Trans. Electron.	2017	DBLP DOI BibTeX RDF
29	Marcel Schönhoff, Ulrich Hilleringmann, Johannes de Boor	Mass production of magnesium silicide as a TEG material.	AFRICON	2017	DBLP DOI BibTeX RDF
29	Shun'ichiro Ohmi, Mengyi Chen, Xiaopeng Wu, Yasushi Masahiro	PtHf Silicide Formation Utilizing PtHf-Alloy Target for Low Contact Resistivity.	IEICE Trans. Electron.	2016	DBLP DOI BibTeX RDF
29	Yan Wu, Hiroyuki Hasegawa, Kuniyuki Kakushima, Kenji Ohmori, Takanobu Watanabe, Akira Nishiyama, Nobuyuki Sugii, Hitoshi Wakabayashi, Kazuo Tsutsui, Yoshinori Kataoka, Kenji Natori, Keisaku Yamada, Hiroshi Iwai	A novel hetero-junction Tunnel-FET using Semiconducting silicide-Silicon contact and its scalability.	Microelectron. Reliab.	2014	DBLP DOI BibTeX RDF
29	Ryuji Tomita, Hidehiko Kimura, M. Yasuda, K. Maeda, S. Ueno, T. Tomizawa, Y. Kunimune, H. Nakamura, M. Moritoki, Hiroshi Iwai	Formation of high resistivity phases of nickel silicide at small area.	Microelectron. Reliab.	2013	DBLP DOI BibTeX RDF
29	Ryuji Tomita, Hidehiko Kimura, M. Yasuda, K. Maeda, S. Ueno, T. Tonegawa, T. Fujimoto, M. Moritoki, Hiroshi Iwai	Improvement on sheet resistance uniformity of nickel silicide by optimization of silicidation conditions.	Microelectron. Reliab.	2013	DBLP DOI BibTeX RDF
29	David Olaya, Paul D. Dresselhaus, Samuel P. Benz	Niobium-Silicide Junction Technology for Superconducting Digital Electronics.	IEICE Trans. Electron.	2010	DBLP DOI BibTeX RDF
29	Yu-ichiro Ando, Koji Ueda, Mamoru Kumano, Taizoh Sadoh, Kazumasa Narumi, Yoshihito Maeda, Masanobu Miyao	Low Temperature Hetero-Epitaxy of Ferromagnetic Silicide on Ge Substrates for Spin-Transistor Application.	IEICE Trans. Electron.	2008	DBLP DOI BibTeX RDF
29	A. Shickova, Ben Kaczer, Anabela Veloso, Marc Aoulaiche, M. Houssa, Herman E. Maes, Guido Groeseneken, J. A. Kittl	NBTI reliability of Ni FUSI/HfSiON gates: Effect of silicide phase.	Microelectron. Reliab.	2007	DBLP DOI BibTeX RDF
29	J. Vobecký, D. Kolesnikov	The properties of aluminum, platinum silicide and copper based contacts for silicon high-power devices.	Microelectron. J.	2006	DBLP DOI BibTeX RDF
29	Rudolf Schlangen, Peter Sadewater, Uwe Kerst, Christian Boit	Contact to contacts or silicide by use of backside FIB circuit edit allowing to approach every active circuit node.	Microelectron. Reliab.	2006	DBLP DOI BibTeX RDF
29	Chang-Wu Hur	a-Si: H Photosensor Using Cr silicide Schottky Contact.	J. Inform. and Commun. Convergence Engineering	2006	DBLP BibTeX RDF
29	Soon-Young Oh, Jang-Gn Yun, Bin-Feng Huang, Yong-Jin Kim, Hee-Hwan Ji, Sang-Bum Huh, Han-Seob Cha, Ui-Sik Kim, Jin-Suk Wang, Hi-Deok Lee	Thermally Robust Nickel Silicide Process for Nano-Scale CMOS Technology.	IEICE Trans. Electron.	2005	DBLP DOI BibTeX RDF
29	Jam Wem Lee, Yiming Li, Howard Tang	Silicide Optimization for Electrostatic Discharge Protection Devices in Sub-100 nm CMOS Circuit Design.	VLSI	2003	DBLP BibTeX RDF
29	Carl McCarty Faulkner	Exploratory Investigation of Erbium Silicide NMOS as a Candidate for a Schottky Barrier CMOS Process		2001	RDF
29	Ming-Dou Ker, Wen-Yu Lo	Design on the low-leakage diode string for using in the power-rail ESD clamp circuits in a 0.35-μm silicide CMOS process.	IEEE J. Solid State Circuits	2000	DBLP DOI BibTeX RDF
26	Ning Lu	Statistical Models and Frequency-Dependent Corner Models for Passive Devices.	ISQED	2008	DBLP DOI BibTeX RDF	SPICE models, corner models, RF models, passive devices, statistical models
26	Chao-Wen Tseng, Edward J. McCluskey, Xiaoping Shao, David M. Wu	Cold Delay Defect Screening.	VTS	2000	DBLP DOI BibTeX RDF	Manufacturing quality, Reliability, Delay Testing
26	Mark E. Law	Grid adaption near moving boundaries in two dimensions for IC process simulation.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	1995	DBLP DOI BibTeX RDF