Search results for "lithography"

Hits ?▲	Authors	Title	Venue	Year	Link	Author keywords
16	H. Radhakrishna, S. Divakar, N. Magotra, S. R. J. Bruek, A. Waters	MPI-Based Parallel Omplementation of a Lithography Pattern Simulation Algorithm.	HPCN	1999	DBLP DOI BibTeX RDF
16	K. Preston White, Walter J. Trybula	Operational simulation of an x-ray lithography cell: comparison of 200mm and 300mm wafers.	WSC	1999	DBLP DOI BibTeX RDF
16	Andrew B. Kahng, Y. C. Pati	Subwavelength Lithography and Its Potential Impact on Design and EDA.	DAC	1999	DBLP DOI BibTeX RDF
16	Andrew B. Kahng, Y. C. Pati, Warren Grobman, Robert Pack, Lance A. Glasser	Subwavelength Lithography: How Will It Affect Your Design Flow? (Panel).	DAC	1999	DBLP DOI BibTeX RDF
16	Henry Guckel	High-aspect-ratio micromachining via deep X-ray lithography.	Proc. IEEE	1998	DBLP DOI BibTeX RDF
16	Graham Pugh, John Canning, Bernie Roman	Impact of high resolution lithography on IC mask design.	CICC	1998	DBLP DOI BibTeX RDF
16	Glenn Charles Abeln	Fabrication of Metal and Organic Nanostructures on Silicon(100) With Scanning Tunneling Microscope-Based Lithography		1998	RDF
16	David John Donat Carter	Sub-50nm x-ray lithography with application to a coupled quantum dot device.		1998	RDF
16	Jan-Erik Müller, Thomas Grave, Heinz J. Siweris, Martin Kärner, Andre Schäfer, Harald Tischer, Henning Riechert, Lothar Schleicher, Ludger Verweyen, Axel Bangert, Walter Kellner, Thomas Meier 0005	A GaAs HEMT MMIC chip set for automotive radar systems fabricated by optical stepper lithography.	IEEE J. Solid State Circuits	1997	DBLP DOI BibTeX RDF
16	Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek	Lithography at a wavelength of 193 nm.	IBM J. Res. Dev.	1997	DBLP DOI BibTeX RDF
16	Jane M. Shaw, Jeffrey D. Gelorme, Nancy C. LaBianca, Will E. Conley, Steven J. Holmes	Negative photoresists for optical lithography.	IBM J. Res. Dev.	1997	DBLP DOI BibTeX RDF
16	Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz	Photoresists for 193-nm lithography.	IBM J. Res. Dev.	1997	DBLP DOI BibTeX RDF
16	Steven J. Holmes, Peter H. Mitchell, Mark C. Hakey	Manufacturing with DUV lithography.	IBM J. Res. Dev.	1997	DBLP DOI BibTeX RDF
16	Hans A. Biebuyck, Niels B. Larsen, Emmanuel Delamarche, Bruno Michel	Lithography beyond light: Microcontact printing with monolayer resists.	IBM J. Res. Dev.	1997	DBLP DOI BibTeX RDF
16	George L.-T. Chiu, Jane M. Shaw	Optical lithography: Introduction.	IBM J. Res. Dev.	1997	DBLP DOI BibTeX RDF
16	Timothy A. Brunner	Impact of lens aberrations on optical lithography.	IBM J. Res. Dev.	1997	DBLP DOI BibTeX RDF
16	H. Zumaqué, Gregory Allen Kohring, J. Hormes	Simulation of Energy Deposition in Deep X-Ray Lithography.	PARCO	1997	DBLP BibTeX RDF
16	Weizhong Dai, Raja Nassar, Danqing Jiang	Domain Decomposition Method for Solving Three-Dimensional Parabolic Differential Equations Arising in Thermal Analysis in X-Ray Lithography.	PPSC	1997	DBLP BibTeX RDF
16	Igor Bubel, Wojciech Maly, Thomas Waas, Pranab K. Nag, Hans Hartmann, Doris Schmitt-Landsiedel, Susanne Griep	AFFCCA: a tool for critical area analysis with circular defects and lithography deformed layout.	DFT	1995	DBLP DOI BibTeX RDF
16	Vincent V. Wong	Fabrication of distributed feeback devices using X-ray lithography.		1995	RDF
16	Scott D. Hector	Optimization of image formation in X-ray lithography using rigorous electromagnetic theory and experiments.		1994	RDF
16	Jeffrey A. Leavey, L. Grant Lesoine	Design considerations for the IBM X-ray lithography facility.	IBM J. Res. Dev.	1993	DBLP DOI BibTeX RDF
16	Jerry Z. Y. Guo, Franco Cerrina	Modeling X-ray proximity lithography.	IBM J. Res. Dev.	1993	DBLP DOI BibTeX RDF
16	Henry I. Smith, Mark L. Schattenburg	X-ray lithography from 500 to 30 nm: X-ray nanolithography.	IBM J. Res. Dev.	1993	DBLP DOI BibTeX RDF
16	Alan D. Wilson	X-ray lithography in IBM, 1980-1992, the development years.	IBM J. Res. Dev.	1993	DBLP DOI BibTeX RDF
16	Timothy R. Groves, John G. Hartley, Hans C. Pfeiffer, Denise Puisto, Donald K. Bailey	Electron beam lithography tool for manufacture of X-ray masks.	IBM J. Res. Dev.	1993	DBLP DOI BibTeX RDF
16	Chas Archie	Performance of the IBM synchrotron X-ray source for lithography.	IBM J. Res. Dev.	1993	DBLP DOI BibTeX RDF
16	David Seeger	Resist materials and processes for X-ray lithography.	IBM J. Res. Dev.	1993	DBLP DOI BibTeX RDF
16	Eberhard Spiller	Early history of X-ray lithography at IBM.	IBM J. Res. Dev.	1993	DBLP DOI BibTeX RDF
16	Martin C. Peckerar, Juan R. Maldonado	X-ray lithography-an overview.	Proc. IEEE	1993	DBLP DOI BibTeX RDF
16	Yoshinao Aoki, Shin Tanahashi, Osamu Kinoshita, Hideaki Nakamura	Development of a System for Producing Stereo Ground Models by Optical Lithography.	MVA	1992	DBLP BibTeX RDF
16	Sunao Ishihara, Atsunobu Une, Munenori Kanai, Masanori Suzuki, Makoto Fukuda, Fujio Omata	A Vertical X-ray Stepper for SOR Lithography.	J. Robotics Mechatronics	1991	DBLP DOI BibTeX RDF
16	Kathleen Early	Experimental characterization and physical modeling of resolution limits in proximity printing x-ray lithography.		1991	RDF
16	Anthony Yen	Fabrication of large-area 100 nm-period gratings using achromatic holographic lithography.		1991	RDF
16	Masashi Nakao, Kenji Sato, Toshio Nishida, Toshiaki Tamamura	Distributed Feedback Laser Arrays Fabricated by Synchrotron Orbital Radiation Lithography.	IEEE J. Sel. Areas Commun.	1990	DBLP DOI BibTeX RDF
16	M. Gentili, A. Lucchesini, L. Scopa, Paolo Lugli, A. Paoletti, G. Messina, S. Santangelo, A. Tucciarone	Modeling of electron beam scattering in high resolution lithography for the fabrication of X-Ray masks.	Eur. Trans. Telecommun.	1990	DBLP DOI BibTeX RDF
16	Robert C. Frye, Kevin D. Cummings, Edward A. Rietman	Proximity Effect Corrections in Electron Beam Lithography.	NIPS	1990	DBLP BibTeX RDF
16	Robert C. Frye, Edward A. Rietman, Kevin D. Cummings	Computation of proximity effect corrections in electron beam lithography by a neural network.	IJCNN	1990	DBLP DOI BibTeX RDF
16	Takashi Nakai, Yoji Marutani	Fabrication of Three - Dimensional Objects Using Laser Lithography.	Syst. Comput. Jpn.	1989	DBLP DOI BibTeX RDF
16	Roberto Guerrieri, Andrew R. Neureuther	Simulation of microcrack effects in dissolution of positive resist exposed by X-ray lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	1988	DBLP DOI BibTeX RDF
16	Kazuhiko Komatsu, Masanori Suzuki	The Outline Procedure in Pattern Data Preparation for Vector-Scan Electron-Beam Lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	1987	DBLP DOI BibTeX RDF
16	Wojciech Maly	Modeling of Lithography Related Yield Losses for CAD of VLSI Circuits.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	1985	DBLP DOI BibTeX RDF
16	Sherri J. Gillespie	Resist Profile Control in E-Beam Lithography.	IBM J. Res. Dev.	1984	DBLP DOI BibTeX RDF
16	H. R. Rottmann	Overlay in Lithography.	IBM J. Res. Dev.	1980	DBLP DOI BibTeX RDF
16	Mihir Parikh	Proximity Effects in Electron Lithography: Magnitude and Correction Techniques.	IBM J. Res. Dev.	1980	DBLP DOI BibTeX RDF
16	Donald E. Davis	Registration Mark Detection for Electron-Beam Lithography - EL1 System.	IBM J. Res. Dev.	1980	DBLP DOI BibTeX RDF
16	Mihir Parikh, Donald E. Schreiber	Pattern Partitioning for Enhanced Proximity-Effect Corrections in Electron-Beam Lithography.	IBM J. Res. Dev.	1980	DBLP DOI BibTeX RDF
16	Faik S. Ozdemir	Electron beam lithography.	DAC	1979	DBLP BibTeX RDF
16	Eiichi Goto, Takashi Soma, Masanori Idesawa, Tateaki Sasaki	Electron beam lithography for advanced LSl fabrication.	AFIPS National Computer Conference	1978	DBLP BibTeX RDF
16	Dale L. Critchlow	High Speed MOSFET Circuits Using Advanced Lithography.	Computer	1976	DBLP DOI BibTeX RDF
16	Jerome Doutriaux, Abrahim Lavi	An Evolutionary Approach to Process Control with Application to Lithography.	IEEE Trans. Syst. Man Cybern.	1974	DBLP DOI BibTeX RDF
12	Konstantin Moiseev, Avinoam Kolodny, Shmuel Wimer	Interconnect power and delay optimization by dynamic programming in gridded design rules.	ISPD	2010	DBLP DOI BibTeX RDF	gridded design rules, interconnect sizing and spacing, power-delay optimization, dynamic programming, interconnect optimization
12	Ou He, Sheqin Dong, Jinian Bian, Satoshi Goto, Chung-Kuan Cheng	Bus via reduction based on floorplan revising.	ACM Great Lakes Symposium on VLSI	2010	DBLP DOI BibTeX RDF	floorplan revising, via reduction, bus routing
12	Linda Dailey Paulson	News Briefs.	Computer	2009	DBLP DOI BibTeX RDF
12	Mehdi Baradaran Tahoori	Low-overhead defect tolerance in crossbar nanoarchitectures.	ACM J. Emerg. Technol. Comput. Syst.	2009	DBLP DOI BibTeX RDF	reconfigurable architectures, nanotechnology, Defect tolerance
12	Wei Zhang 0012, Niraj K. Jha, Li Shang	A hybrid Nano/CMOS dynamically reconfigurable system - Part II: Design optimization flow.	ACM J. Emerg. Technol. Comput. Syst.	2009	DBLP DOI BibTeX RDF	design optimization flow, logic folding, Dynamic reconfiguration, NATURE
12	Victor Erokhin, Tatiana Berzina, Svetlana Erokhina, Marco P. Fontana	Organic Memristors and Adaptive Networks.	NanoNet	2009	DBLP DOI BibTeX RDF	Organic memristor, conducting and ionic polymers, polymer fibers, adaptive networks
12	Takuma Nakano, Keisuke Yoshida, Seiichi Ikeda, Hiroyuki Oura, Toshio Fukuda, Takehisa Matsuda, Makoto Negoro, Fumihito Arai	Multi-scale transparent arteriole and capillary vessel models for circulation type blood vessel simulator.	IROS	2009	DBLP DOI BibTeX RDF
12	Fumitaka Saito, Koichi Suzumori	Micro rubber structure realizing multi-legged passive walking -integration and miniaturization by micro rubber molding process-.	IROS	2009	DBLP DOI BibTeX RDF
12	Costas Argyrides, Giorgos Dimosthenous, Dhiraj K. Pradhan, Carlos Arthur Lang Lisbôa, Luigi Carro	Reliability aware yield improvement technique for nanotechnology based circuits.	SBCCI	2009	DBLP DOI BibTeX RDF	reliability, nanotechnology, yield improvement
12	Saroj K. Nayak	Carbon nanotube, graphene and atomic wires as next generation interconnects: current status and future promise.	SLIP	2009	DBLP DOI BibTeX RDF	quantum simulation, performance, design, reliability
12	Aarti Choudhary, Sandip Kundu	A process variation tolerant self-compensating FinFET based sense amplifier design.	ACM Great Lakes Symposium on VLSI	2009	DBLP DOI BibTeX RDF	sense amplifier, robustness, process -variation, yield, sram, finfet
12	Mehdi Baradaran Tahoori	BISM: built-in self map for hybrid crossbar nano-architectures.	ACM Great Lakes Symposium on VLSI	2009	DBLP DOI BibTeX RDF	crossbar array, emerging nanotechnologies, logic mapping
12	Simeon Realov, William F. McLaughlin, Kenneth L. Shepard	On-chip transistor characterization arrays with digital interfaces for variability characterization.	ISQED	2009	DBLP DOI BibTeX RDF
12	M. Haykel Ben Jamaa, Kirsten E. Moselund, David Atienza, Didier Bouvet, Adrian M. Ionescu, Yusuf Leblebici, Giovanni De Micheli	Variability-Aware Design of Multilevel Logic Decoders for Nanoscale Crossbar Memories.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2008	DBLP DOI BibTeX RDF
12	Andrew B. Kahng, Chul-Hong Park, Xu Xu 0001	Fast Dual-Graph-Based Hotspot Filtering.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2008	DBLP DOI BibTeX RDF
12	Yici Cai, Qiang Zhou 0001, Xianlong Hong, Rui Shi, Yang Wang	Application of optical proximity correction technology.	Sci. China Ser. F Inf. Sci.	2008	DBLP DOI BibTeX RDF	layout, rules-based, OPC, model-based, IC
12	K. P. Zhu, Yoke San Wong, Geok Soon Hong	Noise-Robust Tool Condition Monitoring in Micro-milling with Hidden Markov Models.	Soft Computing Applications in Industry	2008	DBLP DOI BibTeX RDF
12	Sandip Kundu	The Guiding Light for Chip Testing.	DDECS	2008	DBLP DOI BibTeX RDF
12	Costas Argyrides, Stephania Loizidou, Dhiraj K. Pradhan	Area Reliability Trade-Off in Improved Reed Muller Coding.	SAMOS	2008	DBLP DOI BibTeX RDF
12	Brian Cline, Kaviraj Chopra, David T. Blaauw, Andres Torres, Savithri Sundareswaran	Transistor-Specific Delay Modeling for SSTA.	DATE	2008	DBLP DOI BibTeX RDF
12	Abhishek Das, Berkin Özisikyilmaz, Serkan Ozdemir, Gokhan Memik, Joseph Zambreno, Alok N. Choudhary	Evaluating the effects of cache redundancy on profit.	MICRO	2008	DBLP DOI BibTeX RDF
12	Ming-Chao Tsai, Yung-Chia Lin, Ting-Chi Wang	An MILP-based wire spreading algorithm for PSM-aware layout modification.	ASP-DAC	2008	DBLP DOI BibTeX RDF
12	Nishath Verghese, Richard Rouse, Philippe Hurat	Predictive models and CAD methodology for pattern dependent variability.	ASP-DAC	2008	DBLP DOI BibTeX RDF
12	Pranav Agarwal, Deepak R. Sahoo, Abu Sebastian, Haralampos Pozidis, Murti V. Salapaka	Modeling and identification of the dynamics of electrostatically actuated microcantilever with integrated thermal sensor.	CDC	2008	DBLP DOI BibTeX RDF
12	Shengyuan Yang, Shi Shu	Robust Feature Extraction for the Composite Surface Mesh from STL File.	ICYCS	2008	DBLP DOI BibTeX RDF
12	Jae-Seok Yang, David Z. Pan	Overlay aware interconnect and timing variation modeling for double patterning technology.	ICCAD	2008	DBLP DOI BibTeX RDF
12	Alexey Lvov, Ulrich Finkler	Exact basic geometric operations on arbitrary angle polygons using only fixed size integer coordinates.	ICCAD	2008	DBLP DOI BibTeX RDF
12	Aswin Sreedhar, Sandip Kundu	Modeling and analysis of non-rectangular transistors caused by lithographic distortions.	ICCD	2008	DBLP DOI BibTeX RDF
12	Norma Rodriguez, Li Song, Shishir Shroff, Kuang Han Chen, Taber Smith, Wilbur Luo	Hotspot Prevention Using CMP Model in Design Implementation Flow.	ISQED	2008	DBLP DOI BibTeX RDF	CMP modeling, CMP aware design, hotspot
12	Hailong Jiao, Lan Chen	Cellwise OPC Based on Reduced Standard Cell Library.	ISQED	2008	DBLP DOI BibTeX RDF	cellwise OPC, reduced standard cell library, design for manufacturability
12	Sambuddha Bhattacharya, Shabbir H. Batterywala, Subramanian Rajagopalan, Hi-Keung Tony Ma, Narendra V. Shenoy	On Efficient and Robust Constraint Generation for Practical Layout Legalization.	ISQED	2008	DBLP DOI BibTeX RDF	Layout legalization, constraint reduction, compaction, constraint generation
12	Ronaldo Ronaldo, Thomas Papastathis, Hongyi Yang, Carsten Tietje, Michele Turitto, Svetan M. Ratchev	In Situ Microassembly.	IPAS	2008	DBLP DOI BibTeX RDF	in situ microassembly, projection micro stereolithography, rapid prototyping, microassembly
12	Olivier Smal, Benoît Raucent, Frederik Ceyssens, Robert Puers, Michaël De Volder, Dominiek Reynaerts	Design and Testing of an Ortho-Planar Micro-Valve.	IPAS	2008	DBLP DOI BibTeX RDF
12	Hao Wang, Wenzhen Sun, Xiangang Luo	The Design of a Nanometer Biosensor and Its Microfluidic Integration.	RAM	2008	DBLP DOI BibTeX RDF
12	Puneet Gupta 0001, Andrew B. Kahng, Chul-Hong Park	Detailed Placement for Enhanced Control of Resist and Etch CDs.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2007	DBLP DOI BibTeX RDF
12	Amyn Poonawala, Peyman Milanfar	Mask Design for Optical Microlithography-An Inverse Imaging Problem.	IEEE Trans. Image Process.	2007	DBLP DOI BibTeX RDF
12	John H. Reif, Thomas H. LaBean	Autonomous Programmable Biomolecular Devices Using Self-assembled DNA Nanostructures.	WoLLIC	2007	DBLP DOI BibTeX RDF
12	Chung-Shing Wang, Chao-Yin Hsiao, Teng-Ruey Chang, Chin-Kun Teng	STL mesh reconstruction for bio-medical rapid prototyping model.	SMC	2007	DBLP DOI BibTeX RDF
12	Jingyu Xu, Subarna Sinha, Charles C. Chiang	Accurate detection for process-hotspots with vias and incomplete specification.	ICCAD	2007	DBLP DOI BibTeX RDF
12	Maciej Paszynski, Barbara Barabasz, Robert Schaefer	Efficient Adaptive Strategy for Solving Inverse Problems.	International Conference on Computational Science (1)	2007	DBLP DOI BibTeX RDF	Molecular Statics, Finite Element Method, Inverse problems, hp adaptivity
12	Maciej Paszynski	Agents Based Hierarchical Parallelization of Complex Algorithms on the Example of hp Finite Element Method.	International Conference on Computational Science (2)	2007	DBLP DOI BibTeX RDF	Finite Element Method, Computational agents, hp adaptivity, Hierarchical parallelization
12	Bram Adams, Kris De Schutter	An aspect for idiom-based exception handling: (using local continuation join points, join point properties, annotations and type parameters).	SPLAT	2007	DBLP DOI BibTeX RDF
12	S. Ramsundar, Ahmad A. Al-Yamani, Dhiraj K. Pradhan	Defect Tolerance in Nanotechnology Switches Using a Greedy Reconfiguration Algorithm.	ISQED	2007	DBLP DOI BibTeX RDF
12	Robert C. Aitken	Defect or Variation? Characterizing Standard Cell Behavior at 90nm and below.	ISQED	2007	DBLP DOI BibTeX RDF
12	Hua Xiang 0001, Liang Deng, Li-Da Huang, Martin D. F. Wong	OPC-Friendly Bus Driven Floorplanning.	ISQED	2007	DBLP DOI BibTeX RDF
12	Daniel Mazor, Michael L. Bushnell, David J. Mulligan, Richard J. Blaikie	Fault Models and Device Yield of a Large Population of Room Temperature Operation Single-Electron Transistors.	VLSI Design	2007	DBLP DOI BibTeX RDF
12	Swarup Bhunia, Saibal Mukhopadhyay, Kaushik Roy 0001	Process Variations and Process-Tolerant Design.	VLSI Design	2007	DBLP DOI BibTeX RDF
12	Min-Chun Tsai, Daniel Zhang, Zongwu Tang	Modeling Litho-Constrained Design Layout.	DAC	2007	DBLP DOI BibTeX RDF
12	Brian Taylor, Larry T. Pileggi	Exact Combinatorial Optimization Methods for Physical Design of Regular Logic Bricks.	DAC	2007	DBLP DOI BibTeX RDF