Search results for "lithography"

Hits ?▲	Authors	Title	Venue	Year	Link
16	Changtao Wang, Wei Zhang, Zeyu Zhao, Yanqin Wang, Ping Gao 0006, Yunfei Luo, Xiangang Luo	Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review.	Micromachines	2016	DBLP DOI BibTeX RDF
16	Yunfeng Yang, Wai-Shing Luk, David Z. Pan, Hai Zhou 0001, Changhao Yan, Dian Zhou, Xuan Zeng 0001	Layout Decomposition Co-Optimization for Hybrid E-Beam and Multiple Patterning Lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2016	DBLP DOI BibTeX RDF
16	Xuan Dong 0003, Lihong Zhang	Lithography-Aware Analog Layout Retargeting.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2016	DBLP DOI BibTeX RDF
16	Iou-Jen Liu, Shao-Yun Fang, Yao-Wen Chang	Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2016	DBLP DOI BibTeX RDF
16	Yu Lu 0002, Wei Wu, Keyi Wang	High-Speed Transmission and Mass Data Storage Solutions for Large-Area and Arbitrarily Structured Fabrication through Maskless Lithography.	J. Electr. Comput. Eng.	2016	DBLP DOI BibTeX RDF
16	Mohammed-Baker Habhab, Tania Ismail, Joe Fujiou Lo	A Laminar Flow-Based Microfluidic Tesla Pump via Lithography Enabled 3D Printing.	Sensors	2016	DBLP DOI BibTeX RDF
16	Dongxu Ren, Huiying Zhao, Chupeng Zhang, Daocheng Yuan, Jianpu Xi, Xueliang Zhu, Xinxing Ban, Longchao Dong, Yawen Gu, Chunye Jiang	Multi-Repeated Projection Lithography for High-Precision Linear Scale Based on Average Homogenization Effect.	Sensors	2016	DBLP DOI BibTeX RDF
16	Moojoon Shin, Jee-Hyong Lee 0001	CNN Based Lithography Hotspot Detection.	Int. J. Fuzzy Log. Intell. Syst.	2016	DBLP DOI BibTeX RDF
16	Nobuyuki Moronuki, Nguyen Phan, Norito Keyaki	Fabrication of High Aspect Ratio Silicon Nanostructure with Sphere Lithography and Metal-Assisted Chemical Etching and its Wettability.	Int. J. Autom. Technol.	2016	DBLP DOI BibTeX RDF
16	Takamasa Kawanago, Ryo Ikoma, Du Wanjing, Shunri Oda	Adhesion lithography to fabricate MoS2 FETs with self-assembled monolayer-based gate dielectrics.	ESSDERC	2016	DBLP DOI BibTeX RDF
16	Junyang Li, Weicheng Ma, Fuzhou Niu, Yu Ting Chow, Shuxun Chen, Bo Ouyang, Haibo Ji, Jie Yang 0004, Dong Sun 0001	Development of biocompatible magnetic microrobot transporter using 3D laser lithography.	AIM	2016	DBLP DOI BibTeX RDF
16	Jian Kuang 0001, Evangeline F. Y. Young	Optimization for Multiple Patterning Lithography with cutting process and beyond.	DATE	2016	DBLP BibTeX RDF
16	Woohyun Chung, Seongbo Shim, Youngsoo Shin	Redundant via insertion in directed self-assembly lithography.	DATE	2016	DBLP BibTeX RDF
16	You-Lin Tu, Jin-An Wu, Shih-Jui Chen, Barthelemy Cagneau, Luc Chassagne	Fabrication of acoustic ejectors with replaceable acoustic lens by using soft-lithography.	IEEE SENSORS	2016	DBLP DOI BibTeX RDF
16	Fedor G. Pikus, Andres J. Torres	Advanced multi-patterning and hybrid lithography techniques.	ASP-DAC	2016	DBLP DOI BibTeX RDF
16	Yibo Lin, Bei Yu 0001, Yi Zou, Zhuo Li 0001, Charles J. Alpert, David Z. Pan	Stitch aware detailed placement for multiple e-beam lithography.	ASP-DAC	2016	DBLP DOI BibTeX RDF
16	Andrew J. Fleming, Adrian Wills, Omid T. Ghalehbeygi, Ben Routley, Brett Ninness	A nonlinear programming approach to exposure optimization in scanning laser lithography.	ACC	2016	DBLP DOI BibTeX RDF
16	Jun Watanabe, Jun-ya Iwasaki, Toshiyuki Horiuchi	New Maskless Lithography System for Fabricating Biodevices using Light-Emitting Diodes and Squared Optical Fibers.	BIODEVICES	2016	DBLP DOI BibTeX RDF
16	Jiaojiao Ou, Bei Yu 0001, David Z. Pan	Concurrent Guiding Template Assignment and Redundant via Insertion for DSA-MP Hybrid Lithography.	ISPD	2016	DBLP DOI BibTeX RDF
16	Hang Zhang 0010, Bei Yu 0001, Evangeline F. Y. Young	Enabling online learning in lithography hotspot detection with information-theoretic feature optimization.	ICCAD	2016	DBLP DOI BibTeX RDF
16	Yu-Hsuan Su, Yao-Wen Chang	DSA-compliant routing for two-dimensional patterns using block copolymer lithography.	ICCAD	2016	DBLP DOI BibTeX RDF
16	Jung-Hun Seo, Tao Ling, L. Jay Guo, Zhenqiang Ma	Fast flexible thin-film transistors with deep submicron channel enabled by nanoimprint lithography.	RWS	2016	DBLP DOI BibTeX RDF
16	Xuan Dong 0003, Lihong Zhang	Advanced nanometer technology analog layout retargeting for lithography friendly design.	ISCAS	2016	DBLP DOI BibTeX RDF
16	Jonathan St-Yves, Sophie LaRochelle, Wei Shi 0007	O-band silicon photonic Bragg-grating multiplexers using UV lithography.	OFC	2016	DBLP BibTeX RDF
16	Debasis Pal, Abir Pramanik, Parthasarathi Dasgupta, Debesh Kumar Das	Double Patterning Lithography (DPL)-compliant layout construction (DCLC) with area-stitch usage tradeoff.	VDAT	2016	DBLP DOI BibTeX RDF
16	Seongbo Shim, Suhyeong Choi, Youngsoo Shin	Machine learning (ML)-based lithography optimizations.	APCCAS	2016	DBLP DOI BibTeX RDF
16	Yukihide Kohira, Atsushi Takahashi 0001, Tomomi Matsui, Chikaaki Kodama, Shigeki Nojima, Satoshi Tanaka	Manufacturability-aware mask assignment in multiple patterning lithography.	APCCAS	2016	DBLP DOI BibTeX RDF
16	Kuen-Wey Lin, Yih-Lang Li, Rung-Bin Lin	Multiple-patterning lithography-aware routing for standard cell layout synthesis.	APCCAS	2016	DBLP DOI BibTeX RDF
16	Seongbo Shim, Woohyun Chung, Youngsoo Shin	Redundant via insertion for multiple-patterning directed-self-assembly lithography.	DAC	2016	DBLP DOI BibTeX RDF
16	Haitong Tian	Layout decomposition for triple patterning lithography		2016	RDF
16	Zhen Geng, Zheng Shi 0002, Xiaolang Yan, Kai-sheng Luo, Weiwei Pan	Fast Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement and Its Application.	J. Comput. Sci. Technol.	2015	DBLP DOI BibTeX RDF
16	Subhojit Banerjee, Anuj K. Sharma	Co-creation as a risk-sharing strategy for the development of innovative EUV lithography technology in the semiconductor industry.	Technol. Anal. Strateg. Manag.	2015	DBLP DOI BibTeX RDF
16	Jeong-Bong Lee, Kyung-Hak Choi, Koangki Yoo	Innovative SU-8 Lithography Techniques and Their Applications.	Micromachines	2015	DBLP DOI BibTeX RDF
16	Harutaka Mekaru	Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography.	Micromachines	2015	DBLP DOI BibTeX RDF
16	Iou-Jen Liu, Shao-Yun Fang, Yao-Wen Chang	Stitch-Aware Routing for Multiple E-Beam Lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2015	DBLP DOI BibTeX RDF
16	Hsi-An Chien, Ye-Hong Chen, Szu-Yuan Han, Hsiu-Yu Lai, Ting-Chi Wang	On Refining Row-Based Detailed Placement for Triple Patterning Lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2015	DBLP DOI BibTeX RDF
16	Bei Yu 0001, Xiaoqing Xu, Jhih-Rong Gao, Yibo Lin, Zhuo Li 0001, Charles J. Alpert, David Z. Pan	Methodology for Standard Cell Compliance and Detailed Placement for Triple Patterning Lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2015	DBLP DOI BibTeX RDF
16	Chris C. N. Chu, Wai-Kei Mak	Flexible Packed Stencil Design With Multiple Shaping Apertures and Overlapping Shots for E-beam Lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2015	DBLP DOI BibTeX RDF
16	Bei Yu 0001, Kun Yuan, Duo Ding, David Z. Pan	Layout Decomposition for Triple Patterning Lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2015	DBLP DOI BibTeX RDF
16	Ye Zhang 0011, Wai-Shing Luk, Yunfeng Yang, Hai Zhou 0001, Changhao Yan, David Z. Pan, Xuan Zeng 0001	Layout Decomposition with Pairwise Coloring and Adaptive Multi-Start for Triple Patterning Lithography.	ACM Trans. Design Autom. Electr. Syst.	2015	DBLP DOI BibTeX RDF
16	Narendra Chaudhary, Yao Luo, Serap A. Savari, Roger McCay	Lossless Layout Image Compression Algorithms for Electron-Beam Direct-Write Lithography.	CoRR	2015	DBLP BibTeX RDF
16	Jatin Chopra	Analysis of Lithography Based Approaches In development of Semi Conductors.	CoRR	2015	DBLP BibTeX RDF
16	Bei Yu 0001, Kun Yuan, Jhih-Rong Gao, David Z. Pan	E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System.	CoRR	2015	DBLP BibTeX RDF
16	Federico Picollo, Alfio Battiato, Emilio Carbone, Luca Croin, Emanuele Enrico, Jacopo Forneris, Sara Gosso, Paolo Olivero, Alberto Pasquarelli, Valentina Carabelli	Development and Characterization of a Diamond-Insulated Graphitic Multi Electrode Array Realized with Ion Beam Lithography.	Sensors	2015	DBLP DOI BibTeX RDF
16	Masato Suzuki, Takahiro Sawa, Tomokazu Takahashi, Seiji Aoyagi	Fabrication of Microneedle Mimicking Mosquito Proboscis Using Nanoscale 3D Laser Lithography System.	Int. J. Autom. Technol.	2015	DBLP DOI BibTeX RDF
16	Omid T. Ghalehbeygi, Garth Berriman, Andrew J. Fleming, John L. Holdsworth	Optimization and simulation of exposure pattern for scanning laser lithography.	CCA	2015	DBLP DOI BibTeX RDF
16	Anindya Nag, Asif I. Zia, S. C. Mukhopadhyay 0001, Jürgen Kosel	Performance enhancement of electronic sensor through mask-less lithography.	ICST	2015	DBLP DOI BibTeX RDF
16	R. Morarescu, P. K. Pal, X. Han, M. Zhao, Peter Bienstman, Geert Morthier	Polymer microring resonators for biosensing applications by nanoimprint lithography.	ICTON	2015	DBLP DOI BibTeX RDF
16	Seongbo Shim, Youngsoo Shin	Physical design and mask optimization for directed self-assembly lithography (DSAL).	VLSI-SoC	2015	DBLP DOI BibTeX RDF
16	Sudipta Paul 0001, Pritha Banerjee 0001, Susmita Sur-Kolay	Flare reduction in EUV Lithography by perturbation of wire segments.	VLSI-SoC	2015	DBLP DOI BibTeX RDF
16	Yukihide Kohira, Tomomi Matsui, Yoko Yokoyama, Chikaaki Kodama, Atsushi Takahashi 0001, Shigeki Nojima, Satoshi Tanaka	Fast mask assignment using positive semidefinite relaxation in LELECUT triple patterning lithography.	ASP-DAC	2015	DBLP DOI BibTeX RDF
16	Daifeng Guo, Yuelin Du, Martin D. F. Wong	Polynomial time optimal algorithm for stencil row planning in e-beam lithography.	ASP-DAC	2015	DBLP DOI BibTeX RDF
16	Yunfeng Yang, Wai-Shing Luk, Hai Zhou 0001, Changhao Yan, Xuan Zeng 0001, Dian Zhou	Layout decomposition co-optimization for hybrid e-beam and multiple patterning lithography.	ASP-DAC	2015	DBLP DOI BibTeX RDF
16	Xiayun Zhao, David W. Rosen	Process modeling and advanced control methods for Exposure Controlled Projection Lithography.	ACC	2015	DBLP DOI BibTeX RDF
16	Hsi-An Chien, Szu-Yuan Han, Ye-Hong Chen, Ting-Chi Wang	A Cell-Based Row-Structure Layout Decomposer for Triple Patterning Lithography.	ISPD	2015	DBLP DOI BibTeX RDF
16	Zong-Ming Su, Xiao-Sheng Zhang, Mengdi Han, Xiao-Liang Cheng, Xia Jiang, Xiang-Zhi Yin, Haixia Zhang 0002	Honeycomb-patterned PDMS membrane based on nanosphere lithography.	NEMS	2015	DBLP DOI BibTeX RDF
16	Jaehyun Park, ChangKyu Yoon, Qianru Jin, Lei Chen, David H. Gracias	Rolled-up nanoporous membranes by nanoimprint lithography and strain engineering.	NEMS	2015	DBLP DOI BibTeX RDF
16	Seongbo Shim, Woohyun Chung, Youngsoo Shin	Defect Probability of Directed Self-Assembly Lithography: Fast Identification and Post-Placement Optimization.	ICCAD	2015	DBLP DOI BibTeX RDF
16	Xuan Dong 0003, Lihong Zhang	Lithography-friendly analog layout migration.	ISCAS	2015	DBLP DOI BibTeX RDF
16	Bram van der Sanden, Michel A. Reniers, Marc Geilen, Twan Basten, Johan Jacobs, Jeroen Voeten, Ramon R. H. Schiffelers	Modular model-based supervisory controller design for wafer logistics in lithography machines.	MoDELS	2015	DBLP DOI BibTeX RDF
16	Yixiao Ding, Chris C. N. Chu, Wai-Kei Mak	Detailed routing for spacer-is-metal type self-aligned double/quadruple patterning lithography.	DAC	2015	DBLP DOI BibTeX RDF
16	Hung-Chih Ou, Kai-Han Tseng, Yao-Wen Chang	Cutting structure-aware analog placement based on self-aligned double patterning with e-beam lithography.	DAC	2015	DBLP DOI BibTeX RDF
16	Yasmine Badr, Andres Torres, Puneet Gupta 0001	Mask assignment and synthesis of DSA-MP hybrid lithography for sub-7nm contacts/vias.	DAC	2015	DBLP DOI BibTeX RDF
16	Zigang Xiao	Design automation algorithms for advanced lithography		2015	RDF
16	Vitor Riseti Manfrinato	Electron-beam lithography towards the atomic scale and applications to nano-optics.		2015	RDF
16	Kai-sheng Luo, Zheng Shi 0002, Xiaolang Yan, Zhen Geng	SVM based layout retargeting for fast and regularized inverse lithography.	J. Zhejiang Univ. Sci. C	2014	DBLP DOI BibTeX RDF
16	Wei Zhao, Hailong Yao, Yici Cai, Subarna Sinha, Charles C. Chiang	Fast and scalable parallel layout decomposition in double patterning lithography.	Integr.	2014	DBLP DOI BibTeX RDF
16	Shih-Hao Huang, Chia-Kai Lin	Stop-flow Lithography to Continuously Fabricate Microlens Structures Utilizing an Adjustable Three-Dimensional Mask.	Micromachines	2014	DBLP DOI BibTeX RDF
16	Shao-Yun Fang, Yao-Wen Chang, Wei-Yu Chen	A Novel Layout Decomposition Algorithm for Triple Patterning Lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2014	DBLP DOI BibTeX RDF
16	Wan-Yu Wen, Jin-Cheng Li, Sheng-Yuan Lin, Jing-Yi Chen, Shih-Chieh Chang	A Fuzzy-Matching Model With Grid Reduction for Lithography Hotspot Detection.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2014	DBLP DOI BibTeX RDF
16	Wai-Kei Mak, Chris Chu	E-Beam Lithography Character and Stencil Co-Optimization.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2014	DBLP DOI BibTeX RDF
16	Jhih-Rong Gao, Bei Yu 0001, David Z. Pan	Lithography Hotspot Detection and Mitigation in Nanometer VLSI.	CoRR	2014	DBLP BibTeX RDF
16	Bei Yu 0001, Xiaoqing Xu, Jhih-Rong Gao, David Z. Pan	Methodology for standard cell compliance and detailed placement for triple patterning lithography.	CoRR	2014	DBLP BibTeX RDF
16	Bei Yu 0001, David Z. Pan	Layout Decomposition for Quadruple Patterning Lithography and Beyond.	CoRR	2014	DBLP BibTeX RDF
16	Bei Yu 0001, Jhih-Rong Gao, David Z. Pan	Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting.	CoRR	2014	DBLP BibTeX RDF
16	Bei Yu 0001, Jhih-Rong Gao, David Z. Pan	L-Shape based Layout Fracturing for E-Beam Lithography.	CoRR	2014	DBLP BibTeX RDF
16	Bei Yu 0001, Kun Yuan, Boyang Zhang, Duo Ding, David Z. Pan	Layout decomposition for triple patterning lithography.	CoRR	2014	DBLP BibTeX RDF
16	Bei Yu 0001, Subhendu Roy, Jhih-Rong Gao, David Z. Pan	Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting (JM3 Special Session).	CoRR	2014	DBLP BibTeX RDF
16	Yen-Hung Lin, Bei Yu 0001, David Z. Pan, Yih-Lang Li	TRIAD: a triple patterning lithography aware detailed router.	CoRR	2014	DBLP BibTeX RDF
16	Bei Yu 0001, Kun Yuan, Jhih-Rong Gao, David Z. Pan	E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System.	CoRR	2014	DBLP BibTeX RDF
16	Giuseppe Schirripa Spagnolo, Lorenzo Cozzella, Donato Papalillo	Smartphone Sensors for Stone Lithography Authentication.	Sensors	2014	DBLP DOI BibTeX RDF
16	Virginia Estellers, Jean-Philippe Thiran, Maria Gabrani	Surface Reconstruction From Microscopic Images in Optical Lithography.	IEEE Trans. Image Process.	2014	DBLP DOI BibTeX RDF
16	Tomomi Matsui, Yukihide Kohira, Chikaaki Kodama, Atsushi Takahashi 0001	Positive Semidefinite Relaxation and Approximation Algorithm for Triple Patterning Lithography.	ISAAC	2014	DBLP DOI BibTeX RDF
16	Xiantao Sun, Weihai Chen, Rui Zhou 0003, Wenjie Chen, Jianbin Zhang	Design of a force-decoupled compound parallel alignment stage for high-resolution imprint lithography.	ICRA	2014	DBLP DOI BibTeX RDF
16	Colin Rawlings, Urs Dürig, James L. Hedrick, Dan Coady, Armin Knoll	Nanometer control of the markerless overlay process using thermal scanning probe lithography.	AIM	2014	DBLP DOI BibTeX RDF
16	Nigel P. Johnson, Graham J. Sharp, Saima Ishfaque Khan, Ifeoma G. Mbonson, Scott G. McMeekin, Basudev Lahiri, Richard M. De La Rue	Progress in metamaterial fishnet formed by nanoimprint lithography and asymmetric split ring resonators (A-SRRs) for sensing.	ICTON	2014	DBLP DOI BibTeX RDF
16	Tania Mara Ferla, Guilherme Flach, Ricardo Reis 0001	A tool to simulate optical lithography in nanoCMOs.	I2MTC	2014	DBLP DOI BibTeX RDF
16	Jhih-Rong Gao, Bei Yu 0001, David Z. Pan	Self-aligned double patterning layout decomposition with complementary e-beam lithography.	ASP-DAC	2014	DBLP DOI BibTeX RDF
16	Chris Chu, Wai-Kei Mak	Flexible packed stencil design with multiple shaping apertures for e-beam lithography.	ASP-DAC	2014	DBLP DOI BibTeX RDF
16	Toshiyuki Horiuchi, Shinpei Yoshino	Fabrication of Precise Micro-fluidic Devices using a Low-cost and Simple Contact-exposure Tool for Lithography.	BIODEVICES	2014	DBLP DOI BibTeX RDF
16	Jian Kuang 0001, Evangeline F. Y. Young	A highly-efficient row-structure stencil planning approach for e-beam lithography with overlapped characters.	ISPD	2014	DBLP DOI BibTeX RDF
16	Yuan-Jen Chang, Han-Kuan Huang	Nano-scale tip fabricated by electro-chemical machining for nano lithography.	NEMS	2014	DBLP DOI BibTeX RDF
16	Erwin Berenschot, Hadi Yagubizade, Henri V. Jansen, Marcel B. Dijkstra, Niels R. Tas	Fabrication of 2D-extruded fractal structures using repeated corner lithography and etching.	NEMS	2014	DBLP DOI BibTeX RDF
16	T. Lin, T. Huang, Y. Yang, K. Tseng, C. Fu	Throughput comparison of multi-exposure and multi-beam laser interference lithography on nano patterned sapphire substrate process.	NEMS	2014	DBLP DOI BibTeX RDF
16	Jae Hong Park, Hyun Ik Jang, Jun Yong Park, Dong Eon Lee, Seok Woo Jeon, Woo Choong Kim, Hee Yeoun Kim, Chi Won Ahn	Reversible nano-lithography between materials.	NEMS	2014	DBLP DOI BibTeX RDF
16	Jian Kuang 0001, Wing-Kai Chow, Evangeline F. Y. Young	Triple patterning lithography aware optimization for standard cell based design.	ICCAD	2014	DBLP DOI BibTeX RDF
16	Jian Kuang 0001, Evangeline F. Y. Young	Overlapping-aware throughput-driven stencil planning for E-beam lithography.	ICCAD	2014	DBLP DOI BibTeX RDF
16	Seok-Hwan Jeong, Daisuke Shimura, Takasi Simoyama, Tsuyoshi Horikawa, Yu Tanaka, Ken Morito	Delayed interferometer based Si-wire WDM demultiplexers fabricated by phase controllable and productive 300-mm wafer-scale ArF-immersion lithography technology.	OFC	2014	DBLP DOI BibTeX RDF
16	Vladimir Verstov, Vadim A. Shakhnov, Lyudmila Zinchenko	Parallel Algorithm of SOI Layout Decomposition for Double Patterning Lithography on High-Performance Computer Platforms.	DoCEIS	2014	DBLP DOI BibTeX RDF
16	Olivier Delléa, Olga Shavdina, Pascal Fugier, Philippe Coronel, Emmanuel Ollier, Simon-Frédéric Désage	Control Methods in Microspheres Precision Assembly for Colloidal Lithography.	IPAS	2014	DBLP DOI BibTeX RDF