Search results for "lithography"

Hits ?▲	Authors	Title	Venue	Year	Link	Author keywords
24	Martin Bednarzik, Heinz-Ulrich Scheunemann, Alexander Barth, Daniel Schondelmaier, Bernd Loechel	First Results in Patterning of Ultra High Aspect Ratio Microstructures by a 4T Wave Length Shifter at BESSY.	ICMENS	2003	DBLP DOI BibTeX RDF
24	Mark A. Lavin, Lars Liebmann	CAD computation for manufacturability: can we save VLSI technology from itself?	ICCAD	2002	DBLP DOI BibTeX RDF
24	Edward W. Scheckler, Alexander S. Wong, Robert K. Wang, Goodwin R. Chin, John R. Camagna, Andrew R. Neureuther, Robert W. Dutton	A utility-based integrated system for process simulation.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	1992	DBLP DOI BibTeX RDF
18	Xi-Wei Lin, Victor Moroz	Layout Proximity Effects and Modeling Alternatives for IC Designs.	IEEE Des. Test Comput.	2010	DBLP DOI BibTeX RDF	mobility, CMOS, layout, variability, extraction, proximity, design and test, stress, lithography, threshold voltage, compact model
18	Linda Dailey Paulson	HP Announces Breakthrough in Affordable, Flexible Displays.	Computer	2009	DBLP DOI BibTeX RDF	Optical chips, Chalcogenide, Optical time-division multiplexing, Imprint lithography, Thin-film displays, Supercomputer, High-speed networks, Flexible displays
18	Andrew B. Kahng, Chul-Hong Park, Puneet Sharma, Qinke Wang	Lens aberration aware placement for timing yield.	ACM Trans. Design Autom. Electr. Syst.	2009	DBLP DOI BibTeX RDF	Layout, design for manufacturing, lithography, timing yield
18	Juan C. Rey, N. S. Nagaraj, Andrew B. Kahng, Fabian Klass, Rob Aitken, Cliff Hou, Luigi Capodieci, Vivek Singh	DFM in practice: hit or hype?	DAC	2008	DBLP DOI BibTeX RDF	critical area analysis, CMP, yield, DFM, OPC, lithography
18	Siew-Hong Teh, Chun-Huat Heng, Arthur Tay	Design-process integration for performance-based OPC framework.	DAC	2008	DBLP DOI BibTeX RDF	design-process integration, mask design, OPC, lithography, circuit performance
18	Andrew B. Kahng, Swamy Muddu, Puneet Sharma	Detailed placement for leakage reduction using systematic through-pitch variation.	ISLPED	2007	DBLP DOI BibTeX RDF	aCLV, through-pitch, leakage, lithography, detailed placement
18	Linda Dailey Paulson	News Briefs.	Computer	2006	DBLP DOI BibTeX RDF	Immersion lithography, Spam, Malware, E-mail, Botnets, Hackers, Semiconductors
18	Adriano Cavalcanti, Warren W. Wood, Luiz C. Kretly, Bijan Shirinzadeh	Computational Nanomechatronics: A Pathway for Control and Manufacturing Nanorobots.	CIMCA/IAWTIC	2006	DBLP DOI BibTeX RDF	electromagnetic sensors, nanorobots, nanotubes, NEMS, photonic, nanotechnology, Control systems, lithography, environmental monitoring, mechatronics
18	Andrew B. Kahng, Swamy Muddu, Puneet Sharma	Defocus-aware leakage estimation and control.	ISLPED	2005	DBLP DOI BibTeX RDF	ACLV, yield, leakage, lithography
18	Luigi Capodieci, Puneet Gupta 0001, Andrew B. Kahng, Dennis Sylvester, Jie Yang 0010	Toward a methodology for manufacturability-driven design rule exploration.	DAC	2004	DBLP DOI BibTeX RDF	VLSI manufacturability, process variation, yield, OPC, lithography, RET
18	Puneet Gupta 0001, Andrew B. Kahng, Puneet Sharma, Dennis Sylvester	Selective gate-length biasing for cost-effective runtime leakage control.	DAC	2004	DBLP DOI BibTeX RDF	power, layout, manufacturability, leakage, OPC, lithography
18	Kevin W. McCullen	Phase correct routing for alternating phase shift masks.	DAC	2004	DBLP DOI BibTeX RDF	resolution enhancement techniques (RET), routing, layout, lithography
18	Puneet Gupta 0001, Fook-Luen Heng	Toward a systematic-variation aware timing methodology.	DAC	2004	DBLP DOI BibTeX RDF	ACLV, layout, manufacturability, OPC, lithography
18	Li-Da Huang, Martin D. F. Wong	Optical proximity correction (OPC): friendly maze routing.	DAC	2004	DBLP DOI BibTeX RDF	micro-lithography, optical system, VLSI, manufacturing, OPC, maze routing
18	Gary H. Bernstein	Quantum-dot cellular automata: computing by field polarization.	DAC	2003	DBLP DOI BibTeX RDF	electron beam lithography, nanofabrication, quantum-dot cellular automata, quantum dots
18	Vipul Singhal, C. B. Keshav, K. G. Surnanth, P. R. Suresh	Transistor Flaring in Deep Submicron-Design Considerations.	ASP-DAC/VLSI Design	2002	DBLP DOI BibTeX RDF	Deep Submicron (DSM), pullback, photolithography, Subwavelength-lithography, Optical Proximity Correction (OPC), SPICE-models, standard-ce1l library, Design for Manufacturability (DFM)
16	Masaki Kuramochi, Yukihide Kohira, Hiroyoshi Tanabe, Tetsuaki Matsunawa, Chikaaki Kodama	Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization.	IEEE Access	2024	DBLP DOI BibTeX RDF
16	Mark O. Neisser, Ndubuisi G. Orji, Harry J. Levinson, Umberto Celano, James R. Moyne, Supika Mashiro, Dan Wilcox, Slava Libman	How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning.	Computer	2024	DBLP DOI BibTeX RDF
16	Binwu Zhu, Su Zheng, Ziyang Yu, Guojin Chen, Yuzhe Ma, Fan Yang 0001, Bei Yu 0001, Martin D. F. Wong	L2O-ILT: Learning to Optimize Inverse Lithography Techniques.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2024	DBLP DOI BibTeX RDF
16	Jingyu Pan, Xuezhong Lin, Jinming Xu 0002, Yiran Chen 0001, Cheng Zhuo	Lithography Hotspot Detection Based on Heterogeneous Federated Learning With Local Adaptation and Feature Selection.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2024	DBLP DOI BibTeX RDF
16	Ali Raza, Zubair Saeed, Adnan Aslam, Syeda Mehwish Nizami, Kanwal Habib, Ahmad Nazir Malik	Advances, Application and Challenges of Lithography Techniques.	ICACS	2024	DBLP DOI BibTeX RDF
16	Su-Min Kim, Jae-wook Jeon	Methodology for Lithography Hotspot Detection using ResNet50V2 and Model soups.	ICEIC	2024	DBLP DOI BibTeX RDF
16	Gaku Kataoka, Masahiro Yamamoto, Masato Inagi, Shinobu Nagayama, Shin'ichi Wakabayashi	Feature Vectors Based on Wire Width and Distance for Lithography Hotspot Detection.	IPSJ Trans. Syst. LSI Des. Methodol.	2023	DBLP DOI BibTeX RDF
16	Muhammad Qasim Mehmood, Muhammad Hamza Zulfiqar, Amit Kumar Goyal, Muhammad Shumail Malik, Wasif Tanveer Khan, Muhammad Atif Khan, Muhammad Zubair 0002, Yehia Massoud	Lithography-Based Fabricated Capacitive Pressure Sensitive Touch Sensors for Multimode Intelligent HMIs.	IEEE Access	2023	DBLP DOI BibTeX RDF
16	Wenze Yao, Haojie Zhao, Chengyang Hou, Wei Liu, Hongcheng Xu, Xin Zhang 0055, Jing Xiao, Jie Liu	Efficient Proximity Effect Correction Using Fast Multipole Method With Unequally Spaced Grid for Electron Beam Lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2023	DBLP DOI BibTeX RDF
16	Hao-Chiang Shao, Hsing-Lei Ping, Kuo-Shiuan Chen, Weng-Tai Su, Chia-Wen Lin, Shao-Yun Fang, Pin-Yian Tsai, Yan-Hsiu Liu	Keeping Deep Lithography Simulators Updated: Global-Local Shape-Based Novelty Detection and Active Learning.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2023	DBLP DOI BibTeX RDF
16	Qing Zhang, Yuhang Zhang, Wei Lu, Huajie Huang, Zheng Zhong, Congshu Zhou, Yongfu Li	Litho-AsymVnet: super-resolution lithography modeling with an asymmetric V-net architecture.	Sci. China Inf. Sci.	2023	DBLP DOI BibTeX RDF
16	Wenze Yao, Hongcheng Xu, Haojie Zhao, Ming Tao, Jie Liu	Fast and accurate proximity effect correction algorithm based on pattern edge shape adjustment for electron beam lithography.	Microelectron. J.	2023	DBLP DOI BibTeX RDF
16	Xing-Yu Ma, Shaogang Hao	Inverse Lithography Physics-informed Deep Neural Level Set for Mask Optimization.	CoRR	2023	DBLP DOI BibTeX RDF
16	Hamed Alemansour, S. O. Reza Moheimani	Model-based Control of the Scanning Tunneling Microscope: Enabling New Modes of Imaging, Spectroscopy, and Lithography.	CoRR	2023	DBLP DOI BibTeX RDF
16	Cheng Zheng, Guangyuan Zhao, Peter T. C. So	Neural Lithography: Close the Design-to-Manufacturing Gap in Computational Optics with a 'Real2Sim' Learned Photolithography Simulator.	CoRR	2023	DBLP DOI BibTeX RDF
16	Shimpei Nishiyama, Kimihiko Kato, Yongxun Liu, Raisei Mizokuchi, Jun Yoneda, Tetsuo Kodera, Takahiro Mori	Single-Electron Transistor Operation of a Physically Defined Silicon Quantum Dot Device Fabricated by Electron Beam Lithography Employing a Negative-Tone Resist.	IEICE Trans. Electron.	2023	DBLP DOI BibTeX RDF
16	Raudah Abu Bakar, Harnani Hassan, Sukreen Hana Herman	Patterning of Monolithic Integrated Circuit using Electron Beam Lithography.	ICSET	2023	DBLP DOI BibTeX RDF
16	Hyeong-Min Kim, Young-Ho Nam, Seung-Chul Yang, Jae-Hyoung Park, Seung-Ki Lee	Fabrication of Nanostructures on Optical Fibers Using Nanosphere Lithography for Biosensing.	SENSORS	2023	DBLP DOI BibTeX RDF
16	Haoyu Yang, Haoxing Ren	Enabling Scalable AI Computational Lithography with Physics-Inspired Models.	ASP-DAC	2023	DBLP DOI BibTeX RDF
16	Isabella Fiorello, Alessio Mondini, Barbara Mazzolai	Climbing mini-machines using plant-inspired micropatterned adhesive wheels fabricated via two-photon lithography.	RoboSoft	2023	DBLP DOI BibTeX RDF
16	Marcel Heertjes, Jazmin Zenteno Torres, Mohammad Al Janaideh	Fourth-Order Reference Trajectories in Lithography Stages with Weakly-Damped Modes - a Frequency-Domain Perspective.	CDC	2023	DBLP DOI BibTeX RDF
16	Amos Bardea	Pattern Genomic Probes Inside Capillary Tubes by Magneto Lithography Method Producing Parallel Detection of DNA and RNA.	BIODEVICES	2023	DBLP DOI BibTeX RDF
16	Burn J. Lin	Immersion and EUV Lithography: Two Pillars to Sustain Single-Digit Nanometer Nodes.	ISPD	2023	DBLP DOI BibTeX RDF
16	Kyoung-Whan Oh, Takashi Sasa, Seok Heo, Daejung Kim, Ouiserg Kim, Jung-Hyeon Kim	Reduction of Bubble-Induced Defect in Semiconductor Lithography Process.	TFC	2023	DBLP DOI BibTeX RDF
16	Muyang Zhang, Haonan Li, Zhiqing Xiao, Zitao Feng, Shangneng Yu, Zejingqiu Chen, Huiru Zhang, Weijin Guo	Fabrication of Concave Microwells and Microchannels by Off-stoichiometry Thiol-ene (OSTE) Backside Lithography.	NEMS	2023	DBLP DOI BibTeX RDF
16	Mingjie Liu, Haoyu Yang, Brucek Khailany, Haoxing Ren	An Adversarial Active Sampling-Based Data Augmentation Framework for AI-Assisted Lithography Modeling.	ICCAD	2023	DBLP DOI BibTeX RDF
16	Cheng Zheng, Guangyuan Zhao, Peter T. C. So	Close the Design-to-Manufacturing Gap in Computational Optics with a 'Real2Sim' Learned Two-Photon Neural Lithography Simulator.	SIGGRAPH Asia	2023	DBLP DOI BibTeX RDF
16	Su Zheng, Bei Yu 0001, Martin D. F. Wong	OpenILT: An Open Source Inverse Lithography Technique Framework (Invited Paper).	ASICON	2023	DBLP DOI BibTeX RDF
16	Su Zheng, Haoyu Yang, Binwu Zhu, Bei Yu 0001, Martin D. F. Wong	LithoBench: Benchmarking AI Computational Lithography for Semiconductor Manufacturing.	NeurIPS	2023	DBLP BibTeX RDF
16	Omari Paul, Sakib Abrar, Richard Mu, Riadul Islam, Manar D. Samad	Deep Image Segmentation for Defect Detection in Photo-lithography Fabrication.	ISQED	2023	DBLP DOI BibTeX RDF
16	Yuting Li, Ping Luo, Yunfeng Peng, Zhiyuan Liu	Model Free iterative learning for table motion control of lithography machine.	ICISE	2023	DBLP DOI BibTeX RDF
16	Yu Zhang, Yifan Chen, Zhonglin Xie, Hong Xu 0001, Zaiwen Wen, Yibo Lin, Bei Yu 0001	LRSDP: Low-Rank SDP for Triple Patterning Lithography Layout Decomposition.	DAC	2023	DBLP DOI BibTeX RDF
16	Shuyuan Sun, Fan Yang 0001, Bei Yu 0001, Li Shang, Xuan Zeng 0001	Efficient ILT via Multi-level Lithography Simulation.	DAC	2023	DBLP DOI BibTeX RDF
16	Jia Liu, Qun Yu Xu, Min Su, Ning Fang, Bao Fa Wang	A Hybrid Eigenmode Restoration Algorithm for Computational Lithography Problems Based on Mode Matching Principle.	IEEE Access	2022	DBLP DOI BibTeX RDF
16	Mária Domonkos, Alexander Kromka	Nanosphere Lithography-Based Fabrication of Spherical Nanostructures and Verification of Their Hexagonal Symmetries by Image Analysis.	Symmetry	2022	DBLP DOI BibTeX RDF
16	Johannes Fiedler, Adrià Salvador Palau, Eivind Kristen Osestad, Pekka Parviainen, Bodil Holst	Realistic mask generation for matter-wave lithography via machine learning.	CoRR	2022	DBLP DOI BibTeX RDF
16	Hao-Chiang Shao, Hsing-Lei Ping, Kuo-Shiuan Chen, Weng-Tai Su, Chia-Wen Lin, Shao-Yun Fang, Pin-Yian Tsai, Yan-Hsiu Liu	Keeping Deep Lithography Simulators Updated: Global-Local Shape-Based Novelty Detection and Active Learning.	CoRR	2022	DBLP BibTeX RDF
16	Haoyu Yang, Zongyi Li, Kumara Sastry, Saumyadip Mukhopadhyay, Mark Kilgard, Anima Anandkumar, Brucek Khailany, Vivek Singh, Haoxing Ren	Generic Lithography Modeling with Dual-band Optics-Inspired Neural Networks.	CoRR	2022	DBLP DOI BibTeX RDF
16	Junqing Chen, Haibo Liu	An alternating direction method of multipliers for inverse lithography problem.	CoRR	2022	DBLP DOI BibTeX RDF
16	Kanji Suzuki, Manabu Hakko	Improved Resolution Enhancement Technique for Broadband Illumination in Flat Panel Display Lithography.	IEICE Trans. Electron.	2022	DBLP DOI BibTeX RDF
16	Yuki Taoka, Kohei Kawabata, Pasomphone Hemthavy, Seungman Choi, Kunio Takahashi, Shigeki Saito	Development of Bipolar Electrostatic Chuck with a Beam-Array Assembly Fabricated by Lithography.	Int. J. Autom. Technol.	2022	DBLP DOI BibTeX RDF
16	Yvonne Bergmann, Michael Leippert, Juergen Kuehnle, Johannes Kristan, Sven Erik Jeroschewski, Lukas Römer, Paul Knaus, Axel Wogawa	An IoT Solution for Condition Monitoring of a Lithography Coater Tool in a Semiconductor Fab.	ICPS	2022	DBLP DOI BibTeX RDF
16	Kritanta Saha, Pritha Banerjee 0001, Susmita Sur-Kolay	Stitch-avoiding Detailed Routing for Multiple E-Beam Lithography.	VLSI-SoC	2022	DBLP DOI BibTeX RDF
16	Xuezhong Lin, Jingyu Pan, Jinming Xu 0002, Yiran Chen 0001, Cheng Zhuo	Lithography Hotspot Detection via Heterogeneous Federated Learning with Local Adaptation.	ASP-DAC	2022	DBLP DOI BibTeX RDF
16	Jun Ying Tan, Yuankai Li, Punit Prakash, Bala Natarajan, Jungkwun J. K. Kim	Fabrication of Solid Microneedle using Multi-slit Diffraction UV Lithography.	NEMS	2022	DBLP DOI BibTeX RDF
16	Qipan Wang, Xiaohan Gao, Yibo Lin, Runsheng Wang, Ru Huang	DeePEB: A Neural Partial Differential Equation Solver for Post Exposure Baking Simulation in Lithography.	ICCAD	2022	DBLP DOI BibTeX RDF
16	Jingyu Pan, Chen-Chia Chang, Zhiyao Xie, Jiang Hu, Yiran Chen 0001	Robustify ML-Based Lithography Hotspot Detectors.	ICCAD	2022	DBLP DOI BibTeX RDF
16	Mohamed Tarek Ismail, Hossam Sharara, Kareem Madkour, Karim G. Seddik	Autoencoder-Based Data Sampling for Machine Learning-Based Lithography Hotspot Detection.	MLCAD	2022	DBLP DOI BibTeX RDF
16	Shuyuan Sun, Yiyang Jiang, Fan Yang 0001, Xuan Zeng 0001	Adversarial Sample Generation for Lithography Hotspot Detection.	ISCAS	2022	DBLP DOI BibTeX RDF
16	Kritanta Saha, Sudipta Paul 0001, Pritha Banerjee 0001, Susmita Sur-Kolay	Stitch-avoiding Global Routing for Multiple E-Beam Lithography.	VLSID	2022	DBLP DOI BibTeX RDF
16	Haoyu Yang, Zongyi Li, Kumara Sastry, Saumyadip Mukhopadhyay, Mark Kilgard, Anima Anandkumar, Brucek Khailany, Vivek Singh, Haoxing Ren	Generic lithography modeling with dual-band optics-inspired neural networks.	DAC	2022	DBLP DOI BibTeX RDF
16	Youngsoo Shin	Computational Lithography Using Machine Learning Models.	IPSJ Trans. Syst. LSI Des. Methodol.	2021	DBLP DOI BibTeX RDF
16	Sudipta Paul 0001, Pritha Banerjee 0001, Susmita Sur-Kolay	A study on flare minimisation in EUV lithography by post-layout re-allocation of wire segments.	IET Circuits Devices Syst.	2021	DBLP DOI BibTeX RDF
16	Xu Ma, Yihua Pan, Shengen Zhang, Javier Garcia-Frías, Gonzalo R. Arce	Informational Lithography Approach Based on Source and Mask Optimization.	IEEE Trans. Computational Imaging	2021	DBLP DOI BibTeX RDF
16	Yi-Ting Lin, Iris Hui-Ru Jiang	Novel Guiding Template and Mask Assignment for DSA-MP Hybrid Lithography Using Multiple BCP Materials.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2021	DBLP DOI BibTeX RDF
16	Yun-Jhe Jiang, Kuo-Hao Wu, Shao-Yun Fang	Manufacturability Enhancement With Dummy via Insertion for DSA-MP Lithography Using Multiple BCP Materials.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2021	DBLP DOI BibTeX RDF
16	Yindong Xiao, XueQian Huang, Ke Liu 0005	Model Transferability from ImageNet to Lithography Hotspot Detection.	J. Electron. Test.	2021	DBLP DOI BibTeX RDF
16	Irene Bernardeschi, Muhammad Ilyas, Lucia Beccai	A Review on Active 3D Microstructures via Direct Laser Lithography.	Adv. Intell. Syst.	2021	DBLP DOI BibTeX RDF
16	Xuezhong Lin, Jingyu Pan, Jinming Xu 0002, Yiran Chen 0001, Cheng Zhuo	Lithography Hotspot Detection via Heterogeneous Federated Learning with Local Adaptation.	CoRR	2021	DBLP BibTeX RDF
16	Yazan Mohammad Al-Rawashdeh, Mohammad Al Janaideh, Marcel Heertjes	On Synchronization of Generic Lithography Machine Open-chains using a Novel Fine-Positioning Stage System.	CCTA	2021	DBLP DOI BibTeX RDF
16	Xuanyu Huang, Rui Zhang, Yu Huang, Peiyao Wang, Mei Li	Enhancements of Model and Method in Lithography Hotspot Identification.	DATE	2021	DBLP DOI BibTeX RDF
16	Marc Gmeiner, Wilfried Lepuschitz, Munir Merdan, Maximilian Lackner	Ontology of Lithography-Based Processes in Additive Manufacturing with Focus on Ceramic Materials.	ICO	2021	DBLP DOI BibTeX RDF
16	Yazan Mohammad Al-Rawashdeh, Mahmoud Al-Tamimi, Marcel Heertjes, Mohammad Al Janaideh	Micro-Positioning End-Stage for Precise Multi-Axis Motion Control in Optical Lithography Machines: Preliminary Results.	ACC	2021	DBLP DOI BibTeX RDF
16	Dongjo Yoon, Jaejung Son, Je-Kyun Park, Yoonkey Nam	Development of the micro-patterned 3D neuronal-hydrogel model using soft-lithography for study a 3D neural network on a microelectrode array*.	EMBC	2021	DBLP DOI BibTeX RDF
16	Menghan Xiong, Ningning Luo, Zhimin Zhang, Qingwang Meng	Factors Influencing Resolution of Optical Fiber End Face Processing in Digital Lithography.	NEMS	2021	DBLP DOI BibTeX RDF
16	Hantao Xu, Lianhuan Han, Bingqian Du, Yang Wang, Zhen Ma, Zhong-Qun Tian, Zhao-Wu Tian, Dongping Zhan	Electrochemical Nanoimprint Lithography.	NEMS	2021	DBLP DOI BibTeX RDF
16	Luming Wang, Zhimin Zhang, Ningning Luo, Haifeng Xiao, Long Ma, Qingwang Meng	A Low-Cost Digital Lithography System Supporting Visual Focusing and its Application on Optical Fiber.	NEMS	2021	DBLP DOI BibTeX RDF
16	Mohamed Baker Alawieh, David Z. Pan	ADAPT: An Adaptive Machine Learning Framework with Application to Lithography Hotspot Detection.	MLCAD	2021	DBLP DOI BibTeX RDF
16	Yifeng Xiao, Miaodi Su, Haoyu Yang, Jianli Chen, Jun Yu 0010, Bei Yu 0001	Low-Cost Lithography Hotspot Detection with Active Entropy Sampling and Model Calibration.	DAC	2021	DBLP DOI BibTeX RDF
16	Kerim Tugrul Arat	Simulation of Electron-Matter Interaction in Electron Beam Lithography and Metrology.		2021	RDF
16	Samir Mekid	Integrated Nanomanipulator With In-Process Lithography Inspection.	IEEE Access	2020	DBLP DOI BibTeX RDF
16	Lei Ren, Zhipeng Chen, Hongjian Wang, Zulin Dou, Bin Liu 0046, Lelun Jiang	Fabrication of Bendable Microneedle-Array Electrode by Magnetorheological Drawing Lithography for Electroencephalogram Recording.	IEEE Trans. Instrum. Meas.	2020	DBLP DOI BibTeX RDF
16	Marzieh Khakifirooz, Chen Fu Chien 0001, Mahdi Fathi 0001, Panos M. Pardalos	Minimax Optimization for Recipe Management in High-Mixed Semiconductor Lithography Process.	IEEE Trans. Ind. Informatics	2020	DBLP DOI BibTeX RDF
16	Daifeng Guo, Hongbo Zhang 0001, Martin D. F. Wong	On Coloring Rectangular and Diagonal Grid Graphs for Multipatterning and DSA Lithography.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2020	DBLP DOI BibTeX RDF
16	Haoyu Yang, Shuhe Li, Zihao Deng, Yuzhe Ma, Bei Yu 0001, Evangeline F. Y. Young	GAN-OPC: Mask Optimization With Lithography-Guided Generative Adversarial Nets.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2020	DBLP DOI BibTeX RDF
16	Xu He, Yu Deng, Shizhe Zhou, Rui Li 0019, Yao Wang 0002, Yang Guo 0003	Lithography Hotspot Detection with FFT-based Feature Extraction and Imbalanced Learning Rate.	ACM Trans. Design Autom. Electr. Syst.	2020	DBLP DOI BibTeX RDF
16	Dehia Ait-Ferhat, Vincent Juliard, Gautier Stauffer, J. Andres Torres	Combining lithography and Directed Self Assembly for the manufacturing of vias: Connections to graph coloring problems, integer programming formulations, and numerical experiments.	Eur. J. Oper. Res.	2020	DBLP DOI BibTeX RDF
16	Yingzhi Wang, Tailin Han, Xu Jiang, Yuhan Yan, Hong Liu	Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography.	Entropy	2020	DBLP DOI BibTeX RDF
16	Mohammad Rashidi, Jeremiah Croshaw, Kieran Mastel, Marcus Tamura, Hedieh Hosseinzadeh, Robert A. Wolkow	Deep learning-guided surface characterization for autonomous hydrogen lithography.	Mach. Learn. Sci. Technol.	2020	DBLP DOI BibTeX RDF
16	Amar M. Kamat, Bayu Jayawardhana, Ajay Giri Prakash Kottapalli	PDMS Flow Sensors With Graphene Piezoresistors Using 3D-Printing and Soft Lithography.	IEEE SENSORS	2020	DBLP DOI BibTeX RDF
16	Chi Chung Li, Joseph Toombs, Hayden Taylor	Tomographic color Schlieren refractive index mapping for computed axial lithography.	SCF	2020	DBLP DOI BibTeX RDF