Search results for "lithography"

Hits ?▲	Authors	Title	Venue	Year	Link
16	Bei Yu 0001, David Z. Pan	Layout Decomposition for Quadruple Patterning Lithography and Beyond.	DAC	2014	DBLP DOI BibTeX RDF
16	Iou-Jen Liu, Shao-Yun Fang, Yao-Wen Chang	Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process.	DAC	2014	DBLP DOI BibTeX RDF
16	Yong Xie, Yi Yuan, Haihu Tan, Juanjuan Wang	Effect of Embedding Way on Printed Watermarking Image by Lithography.	CyberC	2014	DBLP DOI BibTeX RDF
16	Yuelin Du	Optimization for advanced lithography		2014	RDF
16	Zhen Geng, Zheng Shi 0002, Xiaolang Yan, Kai-sheng Luo	Regularized level-set-based inverse lithography algorithm for IC mask synthesis.	J. Zhejiang Univ. Sci. C	2013	DBLP DOI BibTeX RDF
16	Chin-Khai Tang, Ming-Shing Su, Yi-Chang Lu	LineDiff Entropy: Lossless Layout Data Compression Scheme for Maskless Lithography Systems.	IEEE Signal Process. Lett.	2013	DBLP DOI BibTeX RDF
16	Shinya Sakuma, Masakuni Sugita, Fumihito Arai	Fabrication of Nanopillar Micropatterns by Hybrid Mask Lithography for Surface-Directed Liquid Flow.	Micromachines	2013	DBLP DOI BibTeX RDF
16	Ekkard Brinksmeier, Frank Vollertsen, Oltmann Riemer, Michael Koerdt, Axel Meier, Simon Kibben, Jan Möller	Ultraviolet lithography on sloped surfaces utilizing diamond turned holograms.	Prod. Eng.	2013	DBLP DOI BibTeX RDF
16	Lars Liebmann, J. Andres Torres	A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial].	IEEE Des. Test	2013	DBLP DOI BibTeX RDF
16	Wei-Cheng Tian, Yu-Hsuan Ho, Chaohao Chen, Chun-Yen Kuo	Sensing Performance of Precisely Ordered TiO2 Nanowire Gas Sensors Fabricated by Electron-Beam Lithography.	Sensors	2013	DBLP DOI BibTeX RDF
16	Josu Martinez-Perdiguero, Aritz Retolaza, Deitze Otaduy, Aritz Juarros, Santos Merino	Real-Time Label-Free Surface Plasmon Resonance Biosensing with Gold Nanohole Arrays Fabricated by Nanoimprint Lithography.	Sensors	2013	DBLP DOI BibTeX RDF
16	Zhen Geng, Zheng Shi 0002, Xiaolang Yan, Kai-sheng Luo	A New Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement with Attenuated Phase Shift Mask.	CAD/Graphics	2013	DBLP DOI BibTeX RDF
16	Radu A. Sporea, Abdullah S. Alshammari, Stamatis Georgakopoulos, John Underwood, Maxim Shkunov, S. Ravi P. Silva	Micron-scale inkjet-assisted digital lithography for large-area flexible electronics.	ESSDERC	2013	DBLP DOI BibTeX RDF
16	Lucas Machado, Vinícius Dal Bem, Francesc Moll, Sergio Gómez, Renato P. Ribas, André Inácio Reis	Logic synthesis for manufacturability considering regularity and lithography printability.	ISVLSI	2013	DBLP DOI BibTeX RDF
16	Bei Yu 0001, Jhih-Rong Gao, David Z. Pan	L-shape based layout fracturing for e-beam lithography.	ASP-DAC	2013	DBLP DOI BibTeX RDF
16	Zhihua Wang, Jun Tan, Qingze Zou, Wei Jiang	Control-based high-speed direct mask fabrication for lithography via mechanical plowing.	ACC	2013	DBLP DOI BibTeX RDF
16	Can Bikcora, Siep Weiland, Wim M. J. Coene	Reduced-order modeling of thermally induced deformations on reticles for extreme ultraviolet lithography.	ACC	2013	DBLP DOI BibTeX RDF
16	Po-Hsun Wu, Mark Po-Hung Lin, Tung-Chieh Chen, Tsung-Yi Ho, Yu-Chuan Chen	Lithography-aware 1-dimensional cell generation.	ECCTD	2013	DBLP DOI BibTeX RDF
16	Shigeki Nojima	Optical lithography extension with double patterning.	ISPD	2013	DBLP DOI BibTeX RDF
16	Dirk Doleschal, Gerald Weigert, Andreas Klemmt, Frank Lehmann 0001	Advanced secondary resource control in semiconductor lithography areas: From theory to practice.	WSC	2013	DBLP DOI BibTeX RDF
16	Shmuel T. Klein, Dana Shapira, Gal Shelef	Lossless Compression of Rotated Maskless Lithography Images.	DCC	2013	DBLP DOI BibTeX RDF
16	Liang Yang, Jiawen Li 0002, Jinli Wang, Chenchu Zhang, Yanlei Hu, Yahui Su, Wenhao Huang, Jiaru Chu	Three dimensional micro-mechanical and micro-optical devices fabricated by holographic two-photon lithography.	NEMS	2013	DBLP DOI BibTeX RDF
16	Li Wang, H. Schift, P. M. Kristiansen, Konstantins Jefimovs, H. H. Solak, J. Gobrecht, Yasin Ekinci	Bilayer wire-grid polarizers for DUV to IR fabricated using EUV interference and nanoimprint lithography.	NEMS	2013	DBLP DOI BibTeX RDF
16	Linsen Chen, Donglin Pu, Jin Hu, Yan Ye, Pengfei Zhu	Hybrid lithography system for MEMS/NEMS.	NEMS	2013	DBLP DOI BibTeX RDF
16	Ye Zhang 0011, Wai-Shing Luk, Hai Zhou 0001, Changhao Yan, Xuan Zeng 0001	Layout decomposition with pairwise coloring for multiple patterning lithography.	ICCAD	2013	DBLP DOI BibTeX RDF
16	Bei Yu 0001, Xiaoqing Xu, Jhih-Rong Gao, David Z. Pan	Methodology for standard cell compliance and detailed placement for triple patterning lithography.	ICCAD	2013	DBLP DOI BibTeX RDF
16	Haitong Tian, Yuelin Du, Hongbo Zhang 0001, Zigang Xiao, Martin D. F. Wong	Constrained pattern assignment for standard cell based triple patterning lithography.	ICCAD	2013	DBLP DOI BibTeX RDF
16	Martin van den Brink	Continuing to shrink: Next-generation lithography - Progress and prospects.	ISSCC	2013	DBLP DOI BibTeX RDF
16	Jhih-Rong Gao, Bei Yu 0001, Duo Ding, David Z. Pan	Lithography hotspot detection and mitigation in nanometer VLSI.	ASICON	2013	DBLP DOI BibTeX RDF
16	Zihao Chen, Hailong Yao, Yici Cai	SUALD: Spacing uniformity-aware layout decomposition in triple patterning lithography.	ISQED	2013	DBLP DOI BibTeX RDF
16	Shmuel Tomi Klein, Dana Shapira, Gal Shelef	Lossless Compression of Rotated Maskless Lithography Images.	SPIRE	2013	DBLP DOI BibTeX RDF
16	David Mikolas, Chang-En Chiang, Pao-Te Lin, Yi-Lin Sun, Chien-Chung Fu	Ultraviolet step-index silica single mode fiber as a spatial filter for interference lithography.	ICAIT	2013	DBLP DOI BibTeX RDF
16	Sheng-Yuan Lin, Jing-Yi Chen, Jin-Cheng Li, Wan-Yu Wen, Shih-Chieh Chang	A novel fuzzy matching model for lithography hotspot detection.	DAC	2013	DBLP DOI BibTeX RDF
16	Shao-Yun Fang, Iou-Jen Liu, Yao-Wen Chang	Stitch-aware routing for multiple e-beam lithography.	DAC	2013	DBLP DOI BibTeX RDF
16	Yuelin Du, Qiang Ma 0002, Hua Song, James P. Shiely, Gerard Luk-Pat, Alexander Miloslavsky, Martin D. F. Wong	Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography.	DAC	2013	DBLP DOI BibTeX RDF
16	Hsing-Chih Chang Chien, Hung-Chih Ou, Tung-Chieh Chen, Ta-Yu Kuan, Yao-Wen Chang	Double patterning lithography-aware analog placement.	DAC	2013	DBLP DOI BibTeX RDF
16	Bei Yu 0001, Kun Yuan, Jhih-Rong Gao, David Z. Pan	E-BLOW: e-beam lithography overlapping aware stencil planning for MCC system.	DAC	2013	DBLP DOI BibTeX RDF
16	Jian Kuang 0001, Evangeline F. Y. Young	An efficient layout decomposition approach for triple patterning lithography.	DAC	2013	DBLP DOI BibTeX RDF
16	Xin Zhao, Chris Chu	Line Search-Based Inverse Lithography Technique for Mask Design.	VLSI Design	2012	DBLP DOI BibTeX RDF
16	Grégory Barbillon	Plasmonic Nanostructures Prepared by Soft UV Nanoimprint Lithography and Their Application in Biological Sensing.	Micromachines	2012	DBLP DOI BibTeX RDF
16	Kun Yuan, Bei Yu 0001, David Z. Pan	E-Beam Lithography Stencil Planning and Optimization With Overlapped Characters.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2012	DBLP DOI BibTeX RDF
16	Maryam Jalali, James J. Marti, Allison L. Kirchhoff, Frances Lawrenz, Stephen A. Campbell	A Low-Cost Hands-On Laboratory to Introduce Lithography Concepts.	IEEE Trans. Educ.	2012	DBLP DOI BibTeX RDF
16	Pavel Poliakov, Pieter Blomme, Alessandro Vaglio Pret, Miguel Corbalan Miranda, Roel Gronheid, Diederik Verkest, Jan Van Houdt, Wim Dehaene	Trades-off between lithography line edge roughness and error-correcting codes requirements for NAND Flash memories.	Microelectron. Reliab.	2012	DBLP DOI BibTeX RDF
16	Seong-Yeol Mun, Seong-Jun Kang, Yang-Hee Joung	Humidity Induced Defect Generation and Its Control during Organic Bottom Anti-reflective Coating in the Photo Lithography Process of Semiconductors.	J. Inform. and Commun. Convergence Engineering	2012	DBLP DOI BibTeX RDF
16	Yi-Ren Huang, Sheng-An Kuo, Michal Stach, Chia-Hsing Liu, Kuan-Hsun Liao, Cheng-Yao Lo	A High Sensitivity Three-Dimensional-Shape Sensing Patch Prepared by Lithography and Inkjet Printing.	Sensors	2012	DBLP DOI BibTeX RDF
16	Robert W. Boyd, Jonathan P. Dowling	Quantum lithography: status of the field.	Quantum Inf. Process.	2012	DBLP DOI BibTeX RDF
16	Siu-Kai Choy, Ningning Jia, Chong-Sze Tong, Man-Lai Tang, Edmund Y. Lam	A Robust Computational Algorithm for Inverse Photomask Synthesis in Optical Projection Lithography.	SIAM J. Imaging Sci.	2012	DBLP DOI BibTeX RDF
16	Peng Du, Wenbo Zhao 0001, Shih-Hung Weng, Chung-Kuan Cheng, Ronald L. Graham	Character design and stamp algorithms for Character Projection Electron-Beam Lithography.	ASP-DAC	2012	DBLP DOI BibTeX RDF
16	Yuelin Du, Hongbo Zhang 0001, Martin D. F. Wong, Kai-Yuan Chao	Hybrid lithography optimization with E-Beam and immersion processes for 16nm 1D gridded design.	ASP-DAC	2012	DBLP DOI BibTeX RDF
16	Vivek Joshi, Kanak Agarwal, Dennis Sylvester	Design-patterning co-optimization of SRAM robustness for double patterning lithography.	ASP-DAC	2012	DBLP DOI BibTeX RDF
16	Vinícius Dal Bem, André Inácio Reis, Renato P. Ribas	Lithography analysis of via-configurable transistor-array fabrics.	NORCHIP	2012	DBLP DOI BibTeX RDF
16	Burn J. Lin	Lithography till the end of Moore's law.	ISPD	2012	DBLP DOI BibTeX RDF
16	Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif	Design-aware lithography.	ISPD	2012	DBLP DOI BibTeX RDF
16	Chong Du, Weihai Chen, Yunjie Wu, Wenjie Chen, Mei Yuan	Design of an aerostatic imprint head with off-plane alignment functionality for nanoimprint lithography.	ROBIO	2012	DBLP DOI BibTeX RDF
16	Yaoping Liu, Wei Wang 0087, Haixia Alice Zhang, Wengang Wu, Zhihong Li	A facile nanowire fabrication approach based on edge lithography.	NEMS	2012	DBLP DOI BibTeX RDF
16	Shinya Sakuma, Masakuni Sugita, Fumihito Arai	Hybrid mask lithography for fabrication of micro-pattern with nano-pillars.	NEMS	2012	DBLP DOI BibTeX RDF
16	H. Y. Chung, C. Y. Wu, C. H. Chen, Y. C. Lee	Arrayed metallic micro/nano particles for localized surface plasmon resonance based on metal contact transfer lithography.	NEMS	2012	DBLP DOI BibTeX RDF
16	Yen-Hung Lin, Bei Yu 0001, David Z. Pan, Yih-Lang Li	TRIAD: A triple patterning lithography aware detailed router.	ICCAD	2012	DBLP DOI BibTeX RDF
16	Jongwook Kye, Yuansheng Ma, Lei Yuan, Yunfei Deng, Harry J. Levinson	Lithography and design integration - New paradigm for the technology architecture development.	CICC	2012	DBLP DOI BibTeX RDF
16	Hongbo Zhang 0001, Yunfei Deng, Jongwook Kye, Martin D. F. Wong	Impact of lithography retargeting process on low level interconnect in 20nm technology.	SLIP	2012	DBLP DOI BibTeX RDF
16	Max Schneider, Nikola Belic, Christoph Sambale, Ulrich Hofmann, Dietmar Fey	Optimization of a Short-Range Proximity Effect Correction Algorithm in E-Beam Lithography Using GPGPUs.	ICA3PP (1)	2012	DBLP DOI BibTeX RDF
16	Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars W. Liebmann, Puneet Gupta 0001	O(n) layout-coloring for multiple-patterning lithography and conflict-removal using compaction.	ICICDT	2012	DBLP DOI BibTeX RDF
16	Kanak B. Agarwal, Shayak Banerjee	Design driven patterning optimizations for low K1 lithography.	ICICDT	2012	DBLP DOI BibTeX RDF
16	Curtis Andrus, Matthew R. Guthaus	Lithography-aware layout compaction.	ACM Great Lakes Symposium on VLSI	2012	DBLP DOI BibTeX RDF
16	Vikram B. Suresh, Priyamvada Vijayakumar, Sandip Kundu	On lithography aware metal-fill insertion.	ISQED	2012	DBLP DOI BibTeX RDF
16	Matthias Mohaupt, Erik Beckert, Thomas Burkhardt, Marcel Hornaff, Christoph Damm, Ramona Eberhardt, Andreas Tünnermann, Hans-Joachim Döring, Klaus Reimer	Precisely Assembled Multi Deflection Arrays - Key Components for Multi Shaped Beam Lithography.	IPAS	2012	DBLP DOI BibTeX RDF
16	Shao-Yun Fang, Yao-Wen Chang, Wei-Yu Chen	A novel layout decomposition algorithm for triple patterning lithography.	DAC	2012	DBLP DOI BibTeX RDF
16	Hongbo Zhang 0001	Design-technology co-optimization in next generation lithography		2012	RDF
16	Donald Winston	Sub-10-nm lithography with light-ion beams.		2012	RDF
16	Minoo Mirsaeedi	EDA Solutions for Double Patterning Lithography.		2012	RDF
16	Sazia A. Eliza, Syed Kamrul Islam, Touhidur Rahman, Nora D. Bull, Benjamin J. Blalock, L. R. Baylor, M. Nance Ericson, W. L. Gardner	A Precision Dose Control Circuit for Maskless E-Beam Lithography With Massively Parallel Vertically Aligned Carbon Nanofibers.	IEEE Trans. Instrum. Meas.	2011	DBLP DOI BibTeX RDF
16	Yoko Yamanishi, Takuma Nakano, Yu Sawada, Kazuyoshi Itoga, Teruo Okano, Fumihito Arai	Maskless Gray Scale Lithography and its 3D Microfluidic Applications.	J. Robotics Mechatronics	2011	DBLP DOI BibTeX RDF
16	Te-Sheng Li, Szu-Hung Chen	Modeling and optimization of thermal-flow lithography process using a neural-genetic approach.	J. Intell. Manuf.	2011	DBLP DOI BibTeX RDF
16	Duo Ding, J. Andres Torres, David Z. Pan	High Performance Lithography Hotspot Detection With Successively Refined Pattern Identifications and Machine Learning.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2011	DBLP DOI BibTeX RDF
16	Banqiu Wu	Next-generation lithography for 22 and 16 nm technology nodes and beyond.	Sci. China Inf. Sci.	2011	DBLP DOI BibTeX RDF
16	Minoo Mirsaeedi, Mohab H. Anis	A statistical yield optimization framework for interconnect in double patterning lithography.	Microelectron. J.	2011	DBLP DOI BibTeX RDF
16	Maciej Paszynski	Convergence of iterative Solvers for non-Linear Step-and-Flash imprint lithography Simulations.	Comput. Sci.	2011	DBLP DOI BibTeX RDF
16	Yao Peng 0003, Jinyu Zhang, Yan Wang 0023, Zhiping Yu	Gradient-Based Source and Mask Optimization in Optical Lithography.	IEEE Trans. Image Process.	2011	DBLP DOI BibTeX RDF
16	Nishant Dhumane, Sudheendra K. Srivathsa, Sandip Kundu	Lithography Constrained Placement and Post-Placement Layout Optimization for Manufacturability.	ISVLSI	2011	DBLP DOI BibTeX RDF
16	Petr Dobrovolný, Miguel Miranda, Paul Zuber	Variability Aware Sub-Wavelength Lithography Characterization for Robust SRAM Design.	ARCS Workshops	2011	DBLP BibTeX RDF
16	Soichi Inoue, Sachiko Kobayashi	All-out fight against yield losses by design-manufacturing collaboration in nano-lithography era.	ASP-DAC	2011	DBLP DOI BibTeX RDF
16	Sam Sivakumar	EUV lithography: Prospects and challenges.	ASP-DAC	2011	DBLP DOI BibTeX RDF
16	Jack J. H. Chen, Faruk Krecinic, Jen-Hom Chen, Raymond P. S. Chen, Burn J. Lin	Future electron-beam lithography and implications on design and CAD tools.	ASP-DAC	2011	DBLP DOI BibTeX RDF
16	Felipe S. Marranghello, Vinícius Dal Bem, André Inácio Reis, Francesc Moll, Renato P. Ribas	Transistor sizing in lithography-aware regular fabrics.	SBCCI	2011	DBLP DOI BibTeX RDF
16	Kun Yuan, David Z. Pan	E-beam lithography stencil planning and optimization with overlapped characters.	ISPD	2011	DBLP DOI BibTeX RDF
16	Michael Junkin, Pak Kin Wong 0002	Plasma lithography for probing collective cell behaviors.	NEMS	2011	DBLP DOI BibTeX RDF
16	Narges Burouni, Erwin Berenschot, Miko Elwenspoek, Niels R. Tas	Dimensional control in corner lithography for wafer-scale fabrication of nano-apertures.	NEMS	2011	DBLP DOI BibTeX RDF
16	Vijay K. Singh, Satoshi Maekawa, Megumi Katori, Yasuhito Minamiyama, Daiji Noda, Tadashi Hattori	Technique for preparing defect-free high aspect ratio SU-8 resist structure using x-ray lithography.	NEMS	2011	DBLP DOI BibTeX RDF
16	Bei Yu 0001, Kun Yuan, Boyang Zhang, Duo Ding, David Z. Pan	Layout decomposition for triple patterning lithography.	ICCAD	2011	DBLP DOI BibTeX RDF
16	Vinícius Dal Bem, Paulo F. Butzen, Felipe S. Marranghello, André Inácio Reis, Renato P. Ribas	Impact and optimization of lithography-aware regular layout in digital circuit design.	ICCD	2011	DBLP DOI BibTeX RDF
16	Pierre-Emmanuel Gaillardon, M. Haykel Ben Jamaa, Fabien Clermidy, Ian O'Connor	Evaluation of a crossbar multiplexer in a lithography-based nanowire technology.	ISCAS	2011	DBLP DOI BibTeX RDF
16	Rance Rodrigues, Sandip Kundu	Model based double patterning lithography (DPL) and simulated annealing (SA).	ISQED	2011	DBLP DOI BibTeX RDF
16	Hongbo Zhang 0001, Yuelin Du, Martin D. F. Wong, Kai-Yuan Chao	Lithography-aware layout modification considering performance impact.	ISQED	2011	DBLP DOI BibTeX RDF
16	Priyamvada Vijayakumar, Vikram B. Suresh, Sandip Kundu	Lithography aware critical area estimation and yield analysis.	ITC	2011	DBLP DOI BibTeX RDF
16	Yongchan Ban, Kevin Lucas, David Z. Pan	Flexible 2D layout decomposition framework for spacer-type double pattering lithography.	DAC	2011	DBLP DOI BibTeX RDF
16	Vivek Singh	Lithography at 14nm and beyond: choices and challenges.	DAC	2011	DBLP DOI BibTeX RDF
16	Duo Ding, Jhih-Rong Gao, Kun Yuan, David Z. Pan	AENEID: a generic lithography-friendly detailed router based on post-RET data learning and hotspot detection.	DAC	2011	DBLP DOI BibTeX RDF
16	Arthur Tay, Hui Tong Chua, Yuheng Wang, Yit Sung Ngo	Equipment Design and Control of Advanced Thermal-Processing Module in Lithography.	IEEE Trans. Ind. Electron.	2010	DBLP DOI BibTeX RDF
16	Jinook Kim, Tae-Joon Song, Ju Hyuk Kim, Seong-Pil Cho, Myoung Su Yang, In-Byeong Kang, Yong Kee Hwang, In-Jae Chung	Formation of the overcoat layer and column spacer for TFT-LCD using capillary force lithography.	Displays	2010	DBLP DOI BibTeX RDF
16	Tejas Jhaveri, Vyacheslav Rovner, Lars Liebmann, Larry T. Pileggi, Andrzej J. Strojwas, Jason Hibbeler	Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	2010	DBLP DOI BibTeX RDF