Search results for "Si/SiO2"

Hits ?▲	Authors	Title	Venue	Year	Link	Author keywords
19	Abdesselam Hocini, T. Boumaza, Mohamed Bouchemat, F. Royer, D. Jamon, J. J. Rousseau	Birefringence in magneto-optical rib waveguides made by SiO2/TiO2 doped with gamma-Fe2O3.	Microelectron. J.	2008	DBLP DOI BibTeX RDF
19	Serguei Novikov, J. Sinkkonen, Timur Nikitin, L. Khriachtchev, M. Räsänen, E. Haimi	Free-standing SiO2 films containing Si nanocrystals directly suitable for transmission electron microscopy.	Microelectron. J.	2008	DBLP DOI BibTeX RDF
19	Valerie Girault, F. Terrier, D. Ney	Reservoir effect in SiCN capped copper/SiO2 interconnects.	Microelectron. Reliab.	2008	DBLP DOI BibTeX RDF
19	Paul E. Nicollian	Insights on trap generation and breakdown in ultra thin SiO2 and SiON dielectrics from low voltage stress-induced leakage current measurements.	Microelectron. Reliab.	2008	DBLP DOI BibTeX RDF
19	Elena Atanassova, Albena Paskaleva, Nenad Novkovski	Effects of the metal gate on the stress-induced traps in Ta2O5/SiO2 stacks.	Microelectron. Reliab.	2008	DBLP DOI BibTeX RDF
19	D. Pic, Didier Goguenheim, Jean-Luc Ogier	Assessment of temperature and voltage accelerating factors for 2.3-3.2 nm SiO2 thin oxides stressed to hard breakdown.	Microelectron. Reliab.	2008	DBLP DOI BibTeX RDF
19	Kuan Yew Cheong, F. A. Jasni	Effects of precursor aging and post-deposition treatment time on photo-assisted sol-gel derived low-dielectric constant SiO2 thin film on Si.	Microelectron. J.	2007	DBLP DOI BibTeX RDF
19	Yu Bai, X. Liu, L. Chen, Khizar-ul-Haq, M. A. Khan, Wen-Qing Zhu, X. Y. Jiang, Zhilin Zhang	Organic thin-film field-effect transistors with MoO3/Al electrode and OTS/SiO2 bilayer gate insulator.	Microelectron. J.	2007	DBLP DOI BibTeX RDF
19	Paul K. Hurley, Karim Cherkaoui, S. McDonnell, G. Hughes, A. W. Groenland	Characterisation and passivation of interface defects in (1 0 0)-Si/SiO2/HfO2/TiN gate stacks.	Microelectron. Reliab.	2007	DBLP DOI BibTeX RDF
19	T. S. Iwayama, T. Hama, D. E. Hole	RTA effects on the formation process of embedded luminescent Si nanocrystals in SiO2.	Microelectron. Reliab.	2007	DBLP DOI BibTeX RDF
19	Isodiana Crupi, Robin Degraeve, Bogdan Govoreanu, David P. Brunco, Philippe Roussel, Jan Van Houdt	Distribution and generation of traps in SiO2/Al2O3 gate stacks.	Microelectron. Reliab.	2007	DBLP DOI BibTeX RDF
19	Giuseppina Puzzilli, Bogdan Govoreanu, Fernanda Irrera, Maarten Rosmeulen, Jan Van Houdt	Characterization of charge trapping in SiO2/Al2O3 dielectric stacks by pulsed C-V technique.	Microelectron. Reliab.	2007	DBLP DOI BibTeX RDF
19	V. Em. Vamvakas, M. Theodoropoulou, Stavroula N. Georga, Christoforos A. Krontiras, M. N. Pisanias	Correlation between infrared transmission spectra and the interface trap density of SiO2 films.	Microelectron. Reliab.	2007	DBLP DOI BibTeX RDF
19	Alessandra Cascio, Giuseppe Currò, A. Cavagnoli	Total ionizing dose reliability of thin SiO2 in PowerMOSFET devices.	Microelectron. Reliab.	2007	DBLP DOI BibTeX RDF
19	Francesca Monforte, Marco Camalleri, Denise Calì, Giuseppe Currò, Enza Fazio, Fortunato Neri	Nitrogen bonding configurations near the oxynitride/silicon interface after oxynitridation in N2O ambient of a thin SiO2 gate.	Microelectron. Reliab.	2007	DBLP DOI BibTeX RDF
19	Edson J. Carvalho, Marco Antonio Robert Alves, Edmundo S. Braga, Lucila Cescato	SiO2 single layer for reduction of the standing wave effects in the interference lithography of deep photoresist structures on Si.	Microelectron. J.	2006	DBLP DOI BibTeX RDF
19	Jooyoung Lee, Mao-Nan Chang, Kang L. Wang	Size dependence of hall mobility and dislocation density in Ge heteroepitaxial layers grown by MBE on a SiO2 patterned Si template.	Microelectron. J.	2006	DBLP DOI BibTeX RDF
19	Valeriu Filip, Hei Wong, D. Nicolaescu	Definition of curve fitting parameter to study tunneling and trapping of electrons in Si/ultra-thin SiO2/metal structures.	Microelectron. Reliab.	2006	DBLP DOI BibTeX RDF
19	Z. W. He, X. Q. Liu, D. Y. Xu, Y. Y. Wang	Effect of annealing on the properties of low-k nanoporous SiO2 films prepared by sol-gel method with catalyst HF.	Microelectron. Reliab.	2006	DBLP DOI BibTeX RDF
19	Yoshihiro Saito, Tatsuya Hashinaga, Shigeru Nakajima	Effect of CVD-SiO2 film on reliability of GaAs MESFET with Ti/Pt/Au gate metal.	IEEE Trans. Reliab.	2005	DBLP DOI BibTeX RDF
19	Katsunori Makihara, Yoshihiro Okamoto, Hideki Murakami, Seiichiro Higashi, Seiichi Miyazaki	Characterization of Germanium Nanocrystallites Grown on SiO2 by a Conductive AFM Probe Technique.	IEICE Trans. Electron.	2005	DBLP DOI BibTeX RDF
19	C. L. Heng, T. G. Finstad, Y. J. Li, A. E. Gunnæs, A. Olsen, P. Storås	Ge nanoparticle formation and photoluminescence in Er doped SiO2 films: influence of sputter gas and annealing.	Microelectron. J.	2005	DBLP DOI BibTeX RDF
19	Salvador Dueñas, Helena Castán, Héctor García, J. Barbolla, E. San Andrés, I. Mártil, G. González-Díaz	On the influence of substrate cleaning method and rapid thermal annealing conditions on the electrical characteristics of Al/SiNx/SiO2/Si fabricated by ECR-CVD.	Microelectron. Reliab.	2005	DBLP DOI BibTeX RDF
19	R. Rölver, O. Winkler, Michael Först, B. Spangenberg, H. Kurz	Light emission from Si/SiO2 superlattices fabricated by RPECVD.	Microelectron. Reliab.	2005	DBLP DOI BibTeX RDF
19	X. Blasco, Montserrat Nafría, Xavier Aymerich, J. Pétry, Wilfried Vandervorst	Breakdown spots of ultra-thin (EOT<1.5nm) HfO2/SiO2 stacks observed with enhanced - CAFM.	Microelectron. Reliab.	2005	DBLP DOI BibTeX RDF
19	Lidia Aguilera, Marc Porti, Montserrat Nafría, Xavier Aymerich	Pre- and post-BD electrical conduction of stressed HfO2/SiO2 MOS gate stacks observed at the nanoscale.	Microelectron. Reliab.	2005	DBLP DOI BibTeX RDF
19	A. Sibai, S. Lhostis, Yoann Rozier, O. Salicio, S. Amtablian, C. Dubois, J. Legrand, J. P. Sénateur, M. Audier, L. Hubert-Pfalzgraff	Characterization of crystalline MOCVD SrTiO3 films on SiO2/Si(100).	Microelectron. Reliab.	2005	DBLP DOI BibTeX RDF
19	V. Em. Vamvakas, D. Davazoglou	Influence of the annealing temperature on the IR properties of SiO2 films grown from SiH4+O2.	Microelectron. Reliab.	2005	DBLP DOI BibTeX RDF
19	Takashi Kawanoue, Seiichi Omoto, Masahiko Hasunuma, Takashi Yoda	Investigation of Cu ion drift through CVD TiSiN into SiO2 under bias temperature stress conditions.	IEICE Electron. Express	2005	DBLP DOI BibTeX RDF
19	A. Madan, S. C. Bose, P. J. George, Chandra Shekhar 0001	Evaluation of Device Parameters of HfO2/SiO2/Si Gate Dielectric Stack for MOSFETs.	VLSI Design	2005	DBLP DOI BibTeX RDF	Direct Tunneling, gate leakage current, high-K gate stack, MOSFETs
19	Pui-To Lai, Jing-Ping Xu, H. P. Wu, C. L. Chan	Interfacial properties and reliability of SiO2 grown on 6H-SiC in dry O2 plus trichloroethylene.	Microelectron. Reliab.	2004	DBLP DOI BibTeX RDF
19	V. Sánchez, J. Munguía, Magali Estrada	Photo-CVD process for ultra thin SiO2 films.	Microelectron. Reliab.	2004	DBLP DOI BibTeX RDF
19	Enrique Miranda 0002, Jordi Suñé	Electron transport through broken down ultra-thin SiO2 layers in MOS devices.	Microelectron. Reliab.	2004	DBLP DOI BibTeX RDF
19	Hideki Yagi, Takuya Sano, Koji Miura, Dhanorm Plumwongrot, Kazuya Ohira, Takeo Maruyama, Shigehisa Arai	GaInAsP/InP long-wavelength lasers with strain-compensated quantum-wire active regions and SiO2/semiconductor reflectors.	IEICE Electron. Express	2004	DBLP DOI BibTeX RDF
19	Masayuki Furuhashi, Tetsuya Hirose, Hiroshi Tsuji, Masayuki Tachi, Kenji Taniguchi 0001	Atomic configuration of boron pile-up at the Si/SiO2 interface.	IEICE Electron. Express	2004	DBLP DOI BibTeX RDF
19	K. Oya, T. Nakazawa, S. Kittaka, K. Tsunetomo, K. Kintaka, Jun Nishii, K. Hirao	Fabrication of One-Dimensional Photonic Crystal with Large Dispersion in SiO2 Glass Substrate Using Deep Dry Etching Technique.	ICMENS	2004	DBLP DOI BibTeX RDF
19	Guillaume Marinier, Stefan Dilhaire, Luis David Patiño Lopez, Mohamed Benzohra	Determination of passive SiO2-Au microstructure resonant frequencies.	Microelectron. Reliab.	2003	DBLP DOI BibTeX RDF
19	Marc Porti, Montserrat Nafría, Xavier Aymerich	Oxide conductivity increase during the progressive-breakdown of SiO2 gate oxides observed with C-AFM.	Microelectron. Reliab.	2003	DBLP DOI BibTeX RDF
19	Jordi Suñé, Ernest Y. Wu, David Jiménez, Wing L. Lai	Statistics of soft and hard breakdown in thin SiO2 gate oxides.	Microelectron. Reliab.	2003	DBLP DOI BibTeX RDF
19	François Lime, Gérard Ghibaudo, B. Guillaumot	Charge trapping in SiO2/HfO2/TiN gate stack.	Microelectron. Reliab.	2003	DBLP DOI BibTeX RDF
19	Hongguo Zhang, Pant Gurang, Nihdi Sigh, Quvdo Manuel, Robert M. Wallace, Bruce Gnade, Kevin Stokes	The effect of small-signal AC voltages on C-V characterization and parameter extraction of SiO2 thin films.	Microelectron. Reliab.	2003	DBLP DOI BibTeX RDF
19	Ernest Y. Wu, Jordi Suñé, Wing L. Lai, Alex Vayshenker, Edward J. Nowak, David L. Harmon	Critical reliability challenges in scaling SiO2-based dielectric to its limit.	Microelectron. Reliab.	2003	DBLP DOI BibTeX RDF
19	Marc Porti, S. Meli, Montserrat Nafría, Xavier Aymerich	Pre-breakdown noise in electrically stressed thin SiO2 layers of MOS devices observed with C-AFM.	Microelectron. Reliab.	2003	DBLP DOI BibTeX RDF
19	Prem Pal, Suneet Tuli, Sudhir Chandra	Design And Fabrication Of SIO2 Micromechanical Structures Inside Anisotropically Etched Cavity.	Int. J. Comput. Eng. Sci.	2003	DBLP DOI BibTeX RDF
19	J. Li, Q. X. Zhang, A. Q. Liu	Prevent Notching For Soi Microstructure Fabrication Using SIO2 Thin Film Technique.	Int. J. Comput. Eng. Sci.	2003	DBLP DOI BibTeX RDF
19	Elena Atanassova, Dejan Spasov	Thermal Ta2O5--alternative to SiO2 for storage capacitor application.	Microelectron. Reliab.	2002	DBLP DOI BibTeX RDF
19	Ruggero Feruglio, Fernanda Irrera, Bruno Riccò	Microscopic aspects of defect generation in SiO2.	Microelectron. Reliab.	2002	DBLP DOI BibTeX RDF
19	X. Blasco, Montserrat Nafría, Xavier Aymerich	Conduction and Breakdown Behaviour of Atomic Force Microscopy Grown SiO2 Gate Oxide on MOS Structures.	Microelectron. Reliab.	2002	DBLP DOI BibTeX RDF
19	Anri Nakajima, Quazi D. M. Khosru, Takashi Yoshimoto, Shin Yokoyama	Atomic-layer-deposited silicon-nitride/SiO2 stack--a highly potential gate dielectrics for advanced CMOS technology.	Microelectron. Reliab.	2002	DBLP DOI BibTeX RDF
19	Stefano Aresu, Ward De Ceuninck, R. Dreesen, Kris Croes, E. Andries, Jean Manca, Luc De Schepper, Robin Degraeve, Ben Kaczer, Marc D'Olieslaeger	High-resolution SILC measurements of thin SiO2 at ultra low voltages.	Microelectron. Reliab.	2002	DBLP DOI BibTeX RDF
19	A. N. Nazarov, I. N. Osiyuk, V. S. Lysenko, T. Gebel, Lars Rebohle, W. Skorupa	Charge trapping and degradation in Ge+ ion implanted SiO2 layers during high-field electron injection.	Microelectron. Reliab.	2002	DBLP DOI BibTeX RDF
19	Fen Chen, Rolf-Peter Vollertsen, Baozhen Li, Dave Harmon, Wing L. Lai	A new empirical extrapolation method for time-dependent dielectric breakdown reliability projections of thin SiO2 and nitride-oxide dielectrics.	Microelectron. Reliab.	2002	DBLP DOI BibTeX RDF
19	Elena Gnani, Susanna Reggiani, Renato Colle, Massimo Rudan	Calculation of Transport Parameters of SiO2 Polymorphs.	VLSI Design	2001	DBLP DOI BibTeX RDF
19	Hasan Ymeri, Bart Nauwelaers, Karen Maex	Frequency-dependent mutual resistance and inductance formulas for coupled IC interconnects on an Si-SiO2 substrate.	Integr.	2001	DBLP DOI BibTeX RDF
19	Daniel Hill, X. Blasco, Marc Porti, Montserrat Nafría, Xavier Aymerich	Characterising the surface roughness of AFM grown SiO2 on Si.	Microelectron. Reliab.	2001	DBLP DOI BibTeX RDF
19	Akinobu Teramoto, H. Umeda, K. Azamawari, Kiyoteru Kobayashi, K. Shiga, J. Komori, Y. Ohno, A. Shigetomi	Time-dependent dielectric breakdown of SiO2 films in a wide electric field range.	Microelectron. Reliab.	2001	DBLP DOI BibTeX RDF
19	Marc Porti, X. Blasco, Montserrat Nafría, Xavier Aymerich, Alexander Olbrich, Bernd Ebersberger	Local current fluctuations before and after breakdown of thin SiO2 films observed with conductive atomic force microscope.	Microelectron. Reliab.	2001	DBLP DOI BibTeX RDF
19	Rosana Rodríguez, Marc Porti, Montserrat Nafría, Xavier Aymerich	Influence of a low field with opposite polarity to the stress on the degradation of 4.5 nm thick SiO2 films.	Microelectron. Reliab.	2001	DBLP DOI BibTeX RDF
19	Lingfeng Mao 0001, Yao Yang, Jian-Lin Wei, Heqiu Zhang, Mingzhen Xu, Changhua Tan	Effect of SiO2/Si interface roughness on gate current.	Microelectron. Reliab.	2001	DBLP DOI BibTeX RDF
19	Detlef Weber, F. Höhnsdorf, A. Hausmann, A. Klipp, Z. Stavreva, J. Herrmann, L. Bauch, M. Junack, H. Neef, M. Nichterwitz, S. Finsterbusch	Impact of substituting SiO2 ILD by low k materials into AlCu RIE metallization.	Microelectron. Reliab.	2001	DBLP DOI BibTeX RDF
19	Fernanda Irrera	Electrical degradation and recovery of dielectrics in n++-poly-Si/SiOx/SiO2/p-sub structures designed for application in low-voltage non-volatile memories.	Microelectron. Reliab.	2001	DBLP DOI BibTeX RDF
19	Nadia Harabech, Rachid Bouchakour, Pierre Canet, Philippe Pannier, Jean-Pierre Sorbier	Extraction of Fowler-Nordheim parameters of thin SiO2 oxide film including polysilicon gate depletion: validation with an EEPROM memory cell.	ISCAS	2000	DBLP DOI BibTeX RDF
19	Per Hyldgaard, Henry K. Harbury, Wolfgang Porod	Electrostatic Formation of Coupled Si/SiO2 Quantum Dot Systems.	VLSI Design	1998	DBLP DOI BibTeX RDF
19	Minhan Chen, Wolfgang Porod	Simulation of Quantum-Dot Structures in Si/SiO2.	VLSI Design	1998	DBLP DOI BibTeX RDF
19	A. Scholze, Andreas Wettstein, Andreas Schenk, Wolfgang Fichtner	Self-Consistent Calculations of the Ground State and the Capacitance of a 3D Si/SiO2 Quantum Dot.	VLSI Design	1998	DBLP DOI BibTeX RDF
19	Yoshiki Ninomiya	Quantitative estimation of SiO2 content in igneous rocks using thermal infrared spectra with a neural network approach.	IEEE Trans. Geosci. Remote. Sens.	1995	DBLP DOI BibTeX RDF
19	L. D. Bartholomew, N. M. Gralenski, J. C. Sisson, G. U. Pignatel	Doped SiO2 deposition from TMP in APCVD.	Eur. Trans. Telecommun.	1990	DBLP DOI BibTeX RDF
19	E. D. Kolb, P. L. Key, Robert A. Laudise, Edith E. Simpson	Pressure-volume-temperature behavior in the system H2O-NaOH-SiO2 and its relationship to the hydrothermal growth of quartz.	Bell Syst. Tech. J.	1983	DBLP DOI BibTeX RDF
19	D. W. Ormond, J. R. Gardiner	Reliability of SiO2 Gate Dielectric with Semi-Recessed Oxide Isolation.	IBM J. Res. Dev.	1980	DBLP DOI BibTeX RDF
19	L. A. Kasprzak, A. K. Gaind	Near-Ideal Si-SiO2 Interfaces.	IBM J. Res. Dev.	1980	DBLP DOI BibTeX RDF
19	Morris Shatzkes, Moshe Av-Ron, Robert A. Gdula	Defect-Related Breakdown and Conduction in SiO2.	IBM J. Res. Dev.	1980	DBLP DOI BibTeX RDF
19	Paul P. Castrucci, Joseph S. Logan	Electrode Control of SiO2 Passivated Planar Junctions.	IBM J. Res. Dev.	1964	DBLP DOI BibTeX RDF
19	Donald R. Kerr, Joseph S. Logan, P. Johannes Burkhardt, William A. Pliskin	Stabilization of SiO2 Passivation Layers with P2O5.	IBM J. Res. Dev.	1964	DBLP DOI BibTeX RDF
19	George Cheroff, Frank F. Fang, Frederick Hochberg	Effect of Low Temperature Annealing on the Surface Conductivity of Si in the Si-SiO2-Al System.	IBM J. Res. Dev.	1964	DBLP DOI BibTeX RDF
19	Victor Ovchinnikov, A. Shevchenko	Surface Plasmon Resonances in Diffusive Reflection Spectra of Multilayered Silver Nanocomposite Films.	ICQNM	2008	DBLP DOI BibTeX RDF	metal nanoclusters, ion-beam mixing, nanoparticle interaction, plasmon resonance
19	Daniel Mazor, Michael L. Bushnell, David J. Mulligan, Richard J. Blaikie	Fault Models and Device Yield of a Large Population of Room Temperature Operation Single-Electron Transistors.	VLSI Design	2007	DBLP DOI BibTeX RDF
19	Hsing-Wen Wang	Identification of Characteristics After Soft Breakdown with GA-Based Neural Networks.	IEA/AIE	2006	DBLP DOI BibTeX RDF	Low-frequency noise, soft breakdown, degraded characteristics, CMOS, evolutionary neural networks
19	Saraju P. Mohanty, Elias Kougianos	Modeling and Reduction of Gate Leakage during Behavioral Synthesis of NanoCMOS Circuits.	VLSI Design	2006	DBLP DOI BibTeX RDF
19	Saraju P. Mohanty, Ramakrishna Velagapudi, Valmiki Mukherjee, Hao Li	Reduction of Direct Tunneling Power Dissipation during Behavioral Synthesis of Nanometer CMOS Circuits.	ISVLSI	2005	DBLP DOI BibTeX RDF
19	Bipin Rajendran, Pawan Kapur, Krishna Saraswat, R. Fabian W. Pease	Self-consistent power/performance/reliability analysis for copper interconnects.	SLIP	2004	DBLP DOI BibTeX RDF	Joule heating, copper interconnects, rent's rule, electromigration, duty cycle, current density
19	Fatih Hamzaoglu, Mircea R. Stan	Circuit-level techniques to control gate leakage for sub-100nm CMOS.	ISLPED	2002	DBLP DOI BibTeX RDF	low power, MTCMOS, gate leakage, domino circuits
19	Robert K. Grube, Qi Wang, Sung-Mo Kang	Design limitations in deep sub-0.1µm CMOS SRAM.	ACM Great Lakes Symposium on VLSI	2002	DBLP DOI BibTeX RDF	GIDL, on-chip cache, tunneling currents, gate leakage
19	Hideki Hirayama, Kazufumi Kaneda, Hideo Yamashita, Yoshiki Yamaji, Yoshimi Monden	Visualization of optical phenomena caused by multilayer films based on wave optics.	Vis. Comput.	2001	DBLP DOI BibTeX RDF	Multilayer thin film, Multiple reflection and refraction, Complex refractive index, Composite reflectance and transmittance, Interference
19	Lionel Palun, Laurent Montès, Panagiota Morfouli, Nathalie Mathieu, Nadine Guillemot, Sandrine Descheneaux, Jean-Michel Terrot, Christophe Malhaire	Micro-System Process for Education: Morphological and Electrical Characterization.	MSE	2001	DBLP DOI BibTeX RDF
19	Wei Li, Qiang Li 0039, J. S. Yuan, Joshua McConkey, Yuan Chen, Sundar Chetlur, Jonathan Zhou, A. S. Oates	Hot-carrier-Induced Circuit Degradation for 0.18 µm CMOS Technology.	ISQED	2001	DBLP DOI BibTeX RDF
19	Nihar R. Mohapatra, Arijit Dutta, Madhav P. Desai, V. Ramgopal Rao	Effect Of Fringing Capacitances In Sub 100 Nm Mosfet's With High-K Gate Dielectrics.	VLSI Design	2001	DBLP DOI BibTeX RDF
19	Yasuo Takahashi, Akira Fujiwara, Yukinori Ono, Katsumi Murase	Silicon Single-Electron Devices and Their Applications.	ISMVL	2000	DBLP DOI BibTeX RDF
19	Kwan-Do Kim, Young-Kwan Park, Jun-Ha Lee, Jeong-Taek Kong, Hee-Sung Kang, Young-Wug Kim, Seok-Jin Kim	Three Dimensional Analysis of Thermal Degradation Effects in FDSOI MOSFET's.	ISQED	2000	DBLP DOI BibTeX RDF	FDSOI, self-heating, finger type, bar type
19	Hideki Hirayama, Kazufumi Kaneda, Hideo Yamashita, Yoshiki Yamaji, Yoshimi Monden	Visualization of Optical Phenomena Caused by Multilayer Films with Complex Refractive Indices.	PG	1999	DBLP DOI BibTeX RDF
19	Zhen-qiu Ning, Patrick M. Dewilde	SPIDER: capacitance modelling for VLSI interconnections.	IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.	1988	DBLP DOI BibTeX RDF