Search results for "PECVD"

Hits ?▲	Authors	Title	Venue	Year	Link	Author keywords
105	Ming Chang, Jen-Cheng Chen, Jia-Sheng Heh	The Control of Membrane Thickness in PECVD Process Utilizing a Rule Extraction Technique of Neural Networks.	ISNN (2)	2006	DBLP DOI BibTeX RDF
62	Vladimir Korkhov, Valeria V. Krzhizhanovskaya	Benchmarking and Adaptive Load Balancing of the Virtual Reactor Application on the Russian-Dutch Grid.	International Conference on Computational Science (1)	2006	DBLP DOI BibTeX RDF	parallel distributed application, Virtual Reactor, PECVD, Grid, benchmarking, heterogeneous resources, adaptive load balancing
54	Satya Saripalli, Vikram Dalal	Microcrystalline silicon-germanium solar cells fabricated using VHF PECVD.	EIT	2008	DBLP DOI BibTeX RDF
51	Byungwhan Kim, Seongjin Choi	Adaptive Network-Based Fuzzy Inference Model of Plasma Enhanced Chemical Vapor Deposition Process.	ISNN (1)	2007	DBLP DOI BibTeX RDF
28	Yilei Fu, Zhisheng Zhang, Zhijie Xia, Haiying Wen, Min Dai, Hui Zhang	Quality Prediction of PECVD Process with Random Forest and Long Short-Term Memory Neural Network.	M2VIP	2023	DBLP DOI BibTeX RDF
28	Robert S. Matos, Nilson S. Ferreira, Stefan Talu, Atefeh Ghaderi, Shahram Solaymani, Marcelo A. Pires, Edgar Aparecido Sanches, Henrique D. da Fonseca Filho	Percolative, Multifractal, and Symmetry Properties of the Surface at Nanoscale of Cu-Ni Bimetallic Thin Films Deposited by RF-PECVD.	Symmetry	2022	DBLP DOI BibTeX RDF
28	Leonid Mochalov, Alexander Logunov, Igor Prokhorov, Tatiana Sazanova, Sergey Zelentsov, Aleksander Knyazev, Nikolay Starostin, Aleksey Letnianchik, Edik U. Rafailov, Vladimir Vorotyntsev	Preparation of PbTe Thin Films for High-Sensitive Mid-IR Photodetectors by PECVD.	ICTON	2020	DBLP DOI BibTeX RDF
28	Leonid Mochalov, Alexander Logunov, Tatiana Sazanova, Artem Kulikov, Edik U. Rafailov, Sergey Zelentsov, Vladimir Vorotyntsev	Zinc Oxide Nanostructured Materials Prepared by PECVD as a Platform for Biosensors.	ICTON	2020	DBLP DOI BibTeX RDF
28	Qunchao Guo, Xinhua Geng	Deposition High Quality P-type Microcrystalline Silicon Thin Films by RF-PECVD.	ICSAI	2019	DBLP DOI BibTeX RDF
28	Sandeep S. Saseendran, Tangla D. Kongnyuy, Bruno Figeys, Federico Buja, Benedetto Troia, Sarp Kerman, Aleksandrs Marinins, Roelof Jansen, Xavier Rottenberg, Deniz Sabuncuoglu Tezcan, Philippe Soussan	A 300mm CMOS-Compatible PECVD Silicon Nitride Platform for Integrated Photonics with Low Loss and Low Process Induced Phase Variation.	OFC	2019	DBLP BibTeX RDF
28	Marquis Crose, Weiqi Zhang, Anh Tran, Panagiotis D. Christofides	Multiscale three-dimensional CFD modeling for PECVD of amorphous silicon thin films.	Comput. Chem. Eng.	2018	DBLP DOI BibTeX RDF
28	Matroni Koutsoureli, N. Siannas, George J. Papaioannou	Temperature accelerated discharging processes through the bulk of PECVD silicon nitride films for MEMS capacitive switches.	Microelectron. Reliab.	2017	DBLP DOI BibTeX RDF
28	Hiram E. Martinez, Andrey Kosarev, A. B. Pevtsov, A. V. Zherzdev, N. A. Feoktistov, Y. Kudriavtsev	High contrast distributed Bragg reflectors based on Si: H/SiC: H PECVD multilayer structure.	CCE	2016	DBLP DOI BibTeX RDF
28	Yu Xin, Gregory Pandraud, Lukasz S. Pakula, Bruno Morana, Paddy J. French	Combination of LPCVD and PECVD SiC in fabricating evanescent waveguides.	NEMS	2016	DBLP DOI BibTeX RDF
28	Matthew A. Stott, Thomas A. Wall, Erik Hamilton, Roger Chu, Aaron R. Hawkins, Damla Ozcelik, Joshua W. Parks, Gopikrishnan G. Meena, Holger Schmidt	Silicate overcoat layers for the improvement of PECVD SiO2 optofluidic waveguides.	MWSCAS	2015	DBLP DOI BibTeX RDF
28	Hiroshi Taka, Katsumasa Suzuki, Norihiro Tsujioka, Shoichi Murakami	Development of high-quality low-temperature (≤ 120°C) PECVD-SiN films by organosilane.	3DIC	2015	DBLP DOI BibTeX RDF
28	Matroni Koutsoureli, Loukas Michalas, Anestis Gantis, George J. Papaioannou	A study of deposition conditions on charging properties of PECVD silicon nitride films for MEMS capacitive switches.	Microelectron. Reliab.	2014	DBLP DOI BibTeX RDF
28	Songmei Wu, M.-O. Bammatter, Wei Tang, V. Auzelyte, Haixia Zhang 0002, Juergen Brugger	High aspect ratio etching of nanopores in PECVD SiC through AAO mask.	NEMS	2013	DBLP DOI BibTeX RDF
28	Bogdan Majkusiak, Romuald B. Beck, Andrzej Mazurak, J. Grabowski	Investigation of double barrier MOS tunnel diodes with PECVD silicon quantum well.	Microelectron. Reliab.	2011	DBLP DOI BibTeX RDF
28	Ismael Cosme, Andrey Kosarev, Francisco Temoltzi, Adrian Itzmoyotl	Electronic properties of GeySi1-y: H films deposited by LF PECVD at low temperatures.	CCE	2011	DBLP DOI BibTeX RDF
28	Hendrik Purwins, Ahmed Nagi, Bernd Barak, Uwe Hockele, Andreas Kyek, Benjamin Lenz, Gunter Pfeifer, Kurt Weinzierl	Regression methods for prediction of PECVD Silicon Nitride layer thickness.	CASE	2011	DBLP DOI BibTeX RDF
28	Etienne Herth, Bernard Legrand, Lionel Buchaillot, Nathalie Rolland, Tuami Lasri	Optimization of SiNX: H films deposited by PECVD for reliability of electronic, microsystems and optical applications.	Microelectron. Reliab.	2010	DBLP DOI BibTeX RDF
28	Jesús Oziel Martínez-Gutiérrez, Oscar García-Serrano, Gabriel Romero-Paredes, Ramon Peña-Sierra, Alejandro Ávila-García	Characterization of polymeric thin films from isopropanol by PECVD.	CCE	2010	DBLP DOI BibTeX RDF
28	Robby Peibst, T. Dürkop, Eberhard Bugiel, Namil Koo, Thomas Mollenhauer, Max C. Lemme, Heinrich Kurz, Karl R. Hofmann	PECVD grown Ge nanocrystals embedded in SiO2: From disordered to templated self-organization.	Microelectron. J.	2009	DBLP DOI BibTeX RDF
28	Sean W. King, J. A. Gradner	Intrinsic stress fracture energy measurements for PECVD thin films in the SiOxCyNz: H system.	Microelectron. Reliab.	2009	DBLP DOI BibTeX RDF
28	Amadine Jouve, Wenbin Hong, D. Blumenshine, JoElle Dachsteiner, Rama Puligadda, Dongshun Bai, J. Diaz, David Henry	Material improvement for ultrathin-wafer handling in TSV creation and PECVD process.	3DIC	2009	DBLP DOI BibTeX RDF
28	Pin Lv, Zhe Chen, Alice H. X. Zhang	Effect of laser annealing on amorphous silicon carbide films prepared by PECVD.	NEMS	2009	DBLP DOI BibTeX RDF
28	Owain D. Clark	Thin film amorphous silicon cells by inductive PECVD, with a view towards flexible substrates.		2009	RDF
28	Wen-Chin Chen, Amy H. I. Lee, Wei-Jaw Deng, Kan-Yuang Liu	The implementation of neural network for semiconductor PECVD process.	Expert Syst. Appl.	2007	DBLP DOI BibTeX RDF
28	A. Pecora, Luca Maiolo, A. Bonfiglietti, M. Cuscunà, F. Mecarini, Luigi Mariucci, Guglielmo Fortunato, N. D. Young	Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing.	Microelectron. Reliab.	2005	DBLP DOI BibTeX RDF
28	B. Díaz, José A. Rodríguez 0004, Montse Riera, Andreu Llobera, Carlos Domínguez, Joaquín Tutor-Sánchez	Optical properties of silicon rich silicon oxides obtained by PECVD.	Microelectron. J.	2004	DBLP DOI BibTeX RDF
28	H. Zhou, F. G. Shi, B. Zhao, J. Yota	Effect of deposition methods on dielectric breakdown strength of PECVD low-k carbon doped silicon dioxide dielectric thin films.	Microelectron. J.	2004	DBLP DOI BibTeX RDF
28	H. Zhou, F. G. Shi, B. Zhao	Thickness dependent dielectric breakdown of PECVD low-k carbon doped silicon dioxide dielectric thin films: modeling and experiments.	Microelectron. J.	2003	DBLP DOI BibTeX RDF
28	Rodolfo Zolá García-Lozano, Magali Estrada, Antonio Cerdeira	Effects of impurity concentration, hydrogen plasma process and crystallization temperature on poly-crystalline films obtained from PECVD a-Si: H layers.	Microelectron. Reliab.	2003	DBLP DOI BibTeX RDF
28	Seung-Soo Han	Neural Network Modeling of PECVD SiN Films and Its Optimization Using Genetic Algorithms.	Int. J. Fuzzy Log. Intell. Syst.	2001	DBLP BibTeX RDF
25	Seung Soo Han, Dong Sun Seo, Sang Jeen Hong	Modeling and Characterization of Plasma Processes Using Modular Neural Network.	ISNN (2)	2006	DBLP DOI BibTeX RDF