Hits ?▲ |
Authors |
Title |
Venue |
Year |
Link |
Author keywords |
94 | Peter J. Byrne, Cathal Heavey, Kamil Erkan Kabak |
An analysis of tool capabilities in the photolithography area of an ASIC fab. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Proceedings of the Winter Simulation Conference, WSC 2007, Washington, DC, USA, December 9-12, 2007, pp. 1761-1767, 2007, WSC, 1-4244-1306-0. The full citation details ...](Pics/full.jpeg) |
2007 |
DBLP DOI BibTeX RDF |
|
88 | Arthur M. D. Shr, Alan Liu, Peter P. Chen |
A Heuristic Load Balancing Scheduling Method for Dedicated Machine Constraint. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IEA/AIE ![In: Advances in Applied Artificial Intelligence, 19th International Conference on Industrial, Engineering and Other Applications of Applied Intelligent Systems, IEA/AIE 2006, Annecy, France, June 27-30, 2006, Proceedings, pp. 750-759, 2006, Springer, 3-540-35453-0. The full citation details ...](Pics/full.jpeg) |
2006 |
DBLP DOI BibTeX RDF |
|
65 | Peter J. Byrne |
An analysis of semiconductor reticle management using discrete event simulation. ![Search on Bibsonomy](Pics/bibsonomy.png) |
SCSC ![In: Proceedings of the 2007 Summer Computer Simulation Conference, SCSC 2007, San Diego, California, USA, July 16-19, 2007, pp. 593-600, 2007, Simulation Councils, Inc., 1-56555-316-0. The full citation details ...](Pics/full.jpeg) |
2007 |
DBLP BibTeX RDF |
photolithography, reticle management, decision support systems, discrete event simulation |
59 | Lars Mönch, Matthias Prause, Volker Schmalfuss |
Simulation-based solution of load-balancing problems in the photolithography area of a semiconductor wafer fabrication facility. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Proceedings of the 33nd conference on Winter simulation, WSC 2001, Arlington, VA, USA, December 9-12, 2001, pp. 1170-1177, 2001, WSC, 0-7803-7309-X. The full citation details ...](Pics/full.jpeg) |
2001 |
DBLP DOI BibTeX RDF |
|
47 | Huy Nguyen Anh Pham, Arthur M. D. Shr, Peter P. Chen |
An Integer Linear Programming Approach for Dedicated Machine Constraint. ![Search on Bibsonomy](Pics/bibsonomy.png) |
ACIS-ICIS ![In: 7th IEEE/ACIS International Conference on Computer and Information Science, IEEE/ACIS ICIS 2008, 14-16 May 2008, Portland, Oregon, USA, pp. 69-74, 2008, IEEE Computer Society, 978-0-7695-3131-1. The full citation details ...](Pics/full.jpeg) |
2008 |
DBLP DOI BibTeX RDF |
Dedicated Machine Constraint, Photolithography, Integer Linear Programming, Semiconductor Manufacturing |
41 | Kamil Erkan Kabak, Cathal Heavey, Vincent Corbett |
Analysis of multiple process flows in an ASIC fab with a detailed photolithography area model. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Proceedings of the 2008 Winter Simulation Conference, Global Gateway to Discovery, WSC 2008, InterContinental Hotel, Miami, Florida, USA, December 7-10, 2008, pp. 2185-2193, 2008, WSC, 978-1-4244-2708-6. The full citation details ...](Pics/full.jpeg) |
2008 |
DBLP DOI BibTeX RDF |
|
35 | Jessica E. Rajkowski, Aaron P. Gerratt, Ethan W. Schaler, Sarah Bergbreiter |
A multi-material milli-robot prototyping process. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IROS ![In: 2009 IEEE/RSJ International Conference on Intelligent Robots and Systems, October 11-15, 2009, St. Louis, MO, USA, pp. 2777-2782, 2009, IEEE, 978-1-4244-3803-7. The full citation details ...](Pics/full.jpeg) |
2009 |
DBLP DOI BibTeX RDF |
|
35 | Sandip Kundu |
The Guiding Light for Chip Testing. ![Search on Bibsonomy](Pics/bibsonomy.png) |
DDECS ![In: Proceedings of the 11th IEEE Workshop on Design & Diagnostics of Electronic Circuits & Systems (DDECS 2008), Bratislava, Slovakia, April 16-18, 2008, pp. 1, 2008, IEEE Computer Society, 978-1-4244-2276-0. The full citation details ...](Pics/full.jpeg) |
2008 |
DBLP DOI BibTeX RDF |
|
35 | Yoko Yamanishi, Shinya Sakuma, Yuki Kihara, Fumihito Arai |
On-chip magnetic 3D soft microactuators made by gray-scale lithography. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IROS ![In: 2008 IEEE/RSJ International Conference on Intelligent Robots and Systems, September 22-26, 2008, Acropolis Convention Center, Nice, France, pp. 4054-4059, 2008, IEEE, 978-1-4244-2057-5. The full citation details ...](Pics/full.jpeg) |
2008 |
DBLP DOI BibTeX RDF |
|
35 | Huy Nguyen Anh Pham, Arthur M. D. Shr, Peter P. Chen, Alan Liu |
Scheduling for Dedicated Machine Constraint Using Integer Programming. ![Search on Bibsonomy](Pics/bibsonomy.png) |
ICTAI (1) ![In: 20th IEEE International Conference on Tools with Artificial Intelligence (ICTAI 2008), November 3-5, 2008, Dayton, Ohio, USA, Volume 1, pp. 499-506, 2008, IEEE Computer Society, 978-0-7695-3440-4. The full citation details ...](Pics/full.jpeg) |
2008 |
DBLP DOI BibTeX RDF |
|
35 | Yi-Chung Lo, Yuan-Hsun Wu, Chia-Sheng Huang, Hong-Wen Liu, Chi-Hung Lin, Jengping Lin, Wensyang Hsu, Chaoen Wang |
Sub-Microfabrication of Protein Micropatterns for Cell Biology Applications. ![Search on Bibsonomy](Pics/bibsonomy.png) |
ICMENS ![In: 2004 International Conference on MEMS, NANO, and Smart Systems (ICMENS 2004), 25-27 August 2004, Banff, Alberta, Canada, pp. 226-232, 2004, IEEE Computer Society, 0-7695-2189-4. The full citation details ...](Pics/full.jpeg) |
2004 |
DBLP DOI BibTeX RDF |
|
35 | Anne M. Murray, David J. Miller 0004 |
Automated material handling systems: automated reticle handling: a comparison of distributed and centralized reticle storage and transport. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Proceedings of the 35th Winter Simulation Conference: Driving Innovation, New Orleans, Louisiana, USA, December 7-10, 2003, pp. 1360-1365, 2003, IEEE Computer Society, 0-7803-8132-7. The full citation details ...](Pics/full.jpeg) |
2003 |
DBLP DOI BibTeX RDF |
|
29 | Vipul Singhal, C. B. Keshav, K. G. Surnanth, P. R. Suresh |
Transistor Flaring in Deep Submicron-Design Considerations. ![Search on Bibsonomy](Pics/bibsonomy.png) |
ASP-DAC/VLSI Design ![In: Proceedings of the 7th Asia and South Pacific Design Automation Conference (ASP-DAC 2002), and the 15th International Conference on VLSI Design (VLSI Design 2002), Bangalore, India, January 7-11, 2002, pp. 299-304, 2002, IEEE Computer Society, 0-7695-1299-2. The full citation details ...](Pics/full.jpeg) |
2002 |
DBLP DOI BibTeX RDF |
Deep Submicron (DSM), pullback, photolithography, Subwavelength-lithography, Optical Proximity Correction (OPC), SPICE-models, standard-ce1l library, Design for Manufacturability (DFM) |
29 | H. Keith Nishihara, P. A. Crossley |
Measuring Photolithographic Overlay Accuracy and Critical Dimensions by Correlating Binarized Laplacian of Gaussian Convolutions. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IEEE Trans. Pattern Anal. Mach. Intell. ![In: IEEE Trans. Pattern Anal. Mach. Intell. 10(1), pp. 17-30, 1988. The full citation details ...](Pics/full.jpeg) |
1988 |
DBLP DOI BibTeX RDF |
positioning accuracy measurement, convolution correlation, picture element clusters, resist alignment, photolithographic overlay accuracy, critical dimensions, binarized Laplacian of Gaussian convolutions, IC manufacture, interference fringes, edge topology differences, low-contrast images, bar grating, integrated circuit technology, photolithography, pattern recognition, computer vision, computer vision, computerised pattern recognition, feature matching, Laplace transforms, noise tolerance |
23 | Youbao Zhang, Huijie Huang |
Photolithography Control System : A Case Study For Cyber-Physical System. ![Search on Bibsonomy](Pics/bibsonomy.png) |
CoRR ![In: CoRR abs/2402.15693, 2024. The full citation details ...](Pics/full.jpeg) |
2024 |
DBLP DOI BibTeX RDF |
|
23 | Aris Magklaras 0001, Panayiotis Alefragis, Christos Gogos, Christos Valouxis, Alexios N. Birbas |
A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Inf. ![In: Inf. 14(8), pp. 428, 2023. The full citation details ...](Pics/full.jpeg) |
2023 |
DBLP DOI BibTeX RDF |
|
23 | Cheng Zheng, Guangyuan Zhao, Peter T. C. So |
Neural Lithography: Close the Design-to-Manufacturing Gap in Computational Optics with a 'Real2Sim' Learned Photolithography Simulator. ![Search on Bibsonomy](Pics/bibsonomy.png) |
CoRR ![In: CoRR abs/2309.17343, 2023. The full citation details ...](Pics/full.jpeg) |
2023 |
DBLP DOI BibTeX RDF |
|
23 | Xiaojiang Liu, Gaoqiang Niu, Jin Li, Yi Zhuang, Xitong Sun, Fei Wang |
MEMS Gas Sensors with Metal-Oxide Semiconductor Materials Patterned at Wafer-Level by Photolithography Technique. ![Search on Bibsonomy](Pics/bibsonomy.png) |
SENSORS ![In: 2023 IEEE SENSORS, Vienna, Austria, October 29 - Nov. 1, 2023, pp. 1-4, 2023, IEEE, 979-8-3503-0387-2. The full citation details ...](Pics/full.jpeg) |
2023 |
DBLP DOI BibTeX RDF |
|
23 | Tao Zhang 0044, Kamil Erkan Kabak, Cathal Heavey, Oliver Rose |
A Reinforcement Learning Approach for Improved Photolithography Schedules. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Winter Simulation Conference, WSC 2023, San Antonio, TX, USA, December 10-13, 2023, pp. 2136-2147, 2023, IEEE, 979-8-3503-6966-3. The full citation details ...](Pics/full.jpeg) |
2023 |
DBLP DOI BibTeX RDF |
|
23 | Yanli Li, Xianhe Liu, Qi Wang, Qiang Wu |
A Further Analysis of the Forbidden Pitch in Photolithography in Advanced Technology Nodes. ![Search on Bibsonomy](Pics/bibsonomy.png) |
ASICON ![In: 15th IEEE International Conference on ASIC, ASICON 2023, Nanjing, China, October 24-27, 2023, pp. 1-4, 2023, IEEE, 979-8-3503-1298-0. The full citation details ...](Pics/full.jpeg) |
2023 |
DBLP DOI BibTeX RDF |
|
23 | Tianwei Wu, Xueqiu You, Zhong Chen 0005 |
Hollow Microneedles on a Paper Fabricated by Standard Photolithography for the Screening Test of Prediabetes. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Sensors ![In: Sensors 22(11), pp. 4253, 2022. The full citation details ...](Pics/full.jpeg) |
2022 |
DBLP DOI BibTeX RDF |
|
23 | Patrick C. Deenen, Rick A. M. Adriaensen, John W. Fowler |
Building a Digital Twin of the Photolithography Area of A Real-World Wafer FAB To Validate Improved Production Control. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Winter Simulation Conference, WSC 2022, Singapore, December 11-14, 2022, pp. 3394-3405, 2022, IEEE, 978-1-6654-7661-4. The full citation details ...](Pics/full.jpeg) |
2022 |
DBLP DOI BibTeX RDF |
|
23 | Aris Magklaras 0001, Christos Gogos, Panagiotis Alefragis, Christos Valouxis, Alexios N. Birbas |
Sampling Points Selection Algorithm For Advanced Photolithography Process. ![Search on Bibsonomy](Pics/bibsonomy.png) |
SEEDA-CECNSM ![In: 7th South-East Europe Design Automation, Computer Engineering, Computer Networks and Social Media Conference, SEEDA-CECNSM 2022, Ioannina, Greece, September 23-25, 2022, pp. 1-5, 2022, IEEE, 979-8-3503-9858-8. The full citation details ...](Pics/full.jpeg) |
2022 |
DBLP DOI BibTeX RDF |
|
23 | Ibrahem Jasim, Jiayu Liu, Chen Zhu, Muhammad Roman, Jie Huang 0003, Edward C. Kinzel, Mahmoud Almasri |
Microsphere Photolithography Patterned Nanohole Array on an Optical Fiber. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IEEE Access ![In: IEEE Access 9, pp. 32627-32633, 2021. The full citation details ...](Pics/full.jpeg) |
2021 |
DBLP DOI BibTeX RDF |
|
23 | Zhian Kuang, Liting Sun, Huijun Gao, Masayoshi Tomizuka |
Practical Fractional-Order Variable-Gain Super-Twisting Control with Application to Wafer Stages of Photolithography Systems. ![Search on Bibsonomy](Pics/bibsonomy.png) |
CoRR ![In: CoRR abs/2102.03540, 2021. The full citation details ...](Pics/full.jpeg) |
2021 |
DBLP BibTeX RDF |
|
23 | Amir Ghasemi, Cathal Heavey |
An Evaluation of Strategies for Job Mix Selection in Job Shop Production Environments - Case: A Photolithography Workstation. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Winter Simulation Conference, WSC 2021, Phoenix, AZ, USA, December 12-15, 2021, pp. 1-12, 2021, IEEE, 978-1-6654-3311-2. The full citation details ...](Pics/full.jpeg) |
2021 |
DBLP DOI BibTeX RDF |
|
23 | Luhua Xu, Deng Mao, Jinsong Zhang, Yun Wang, Zhenping Xing, Md Samiul Alam, Maxime Jacques, Yannick D'Mello, Santiago Bernal, David V. Plant |
Broadband Polarization Beam Splitters Based on MMI Couplers with Internal Photonic Crystals Fabricated Using 193 nm Photolithography. ![Search on Bibsonomy](Pics/bibsonomy.png) |
OFC ![In: Optical Fiber Communications Conference and Exhibition, OFC 2021, San Francisco, CA, USA, June 6-10, 2021, pp. 1-3, 2021, IEEE, 978-1-943580-86-6. The full citation details ...](Pics/full.jpeg) |
2021 |
DBLP BibTeX RDF |
|
23 | Andrei Ushkov, Olivier Delléa, Isabelle Verrier, Thomas Kampfe, Alexey A. Shcherbakov, Jean-Yves Michalon, Yves Jourlin |
Nanosphere Photolithography: The Influence of Nanopore Arrays Disorder on Extraordinary Optical Transmission. ![Search on Bibsonomy](Pics/bibsonomy.png) |
PHOTOPTICS ![In: Proceedings of the 9th International Conference on Photonics, Optics and Laser Technology, PHOTOPTICS 2021, Online Streaming, February 11-13, 2021., pp. 46-53, 2021, SCITEPRESS, 978-989-758-492-3. The full citation details ...](Pics/full.jpeg) |
2021 |
DBLP DOI BibTeX RDF |
|
23 | Yingying Dou, Lin Chen, Hui Li 0043, Biao Tang, Alex Henzen, Guofu Zhou |
Photolithography Fabricated Spacer Arrays Offering Mechanical Strengthening and Oil Motion Control in Electrowetting Displays. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Sensors ![In: Sensors 20(2), pp. 494, 2020. The full citation details ...](Pics/full.jpeg) |
2020 |
DBLP DOI BibTeX RDF |
|
23 | James C. Chen, Tzu-Li Chen, Hsiao-Ching Hung |
Capacity allocation with lot splitting in photolithography area using hybrid genetic algorithm based on self-tuning strategy. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Comput. Ind. Eng. ![In: Comput. Ind. Eng. 148, pp. 106656, 2020. The full citation details ...](Pics/full.jpeg) |
2020 |
DBLP DOI BibTeX RDF |
|
23 | Shigehiro Hashimoto, Kiyoshi Yoshinaka |
Is Dielectrophoretic Movement through Micro Channel with Asymmetric Surface Electrodes Fabricated by Photolithography Technique Effective to Sort Flowing Cell? ![Search on Bibsonomy](Pics/bibsonomy.png) |
BIBE ![In: 20th IEEE International Conference on Bioinformatics and Bioengineering, BIBE 2020, Cincinnati, OH, USA, October 26-28, 2020, pp. 498-503, 2020, IEEE, 978-1-7281-9574-2. The full citation details ...](Pics/full.jpeg) |
2020 |
DBLP DOI BibTeX RDF |
|
23 | Shigehiro Hashimoto, Kazuyuki Abe |
Monitoring of Orientation of Cells by Electric Impedance: Test on Oriented Cells Using Micro Striped Grooves Pattern by Photolithography. ![Search on Bibsonomy](Pics/bibsonomy.png) |
BIBE ![In: 19th IEEE International Conference on Bioinformatics and Bioengineering, BIBE 2019, Athens, Greece, October 28-30, 2019, pp. 557-562, 2019, IEEE, 978-1-7281-4617-1. The full citation details ...](Pics/full.jpeg) |
2019 |
DBLP DOI BibTeX RDF |
|
23 | Hyeong-Ook Kim, Se-Hyeon Park, Jung Yeon Park, James R. Morrison |
On the Consequences of Un-Modeled Dynamics to the Optimality of Schedules in Clustered Photolithography Tools. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: 2019 Winter Simulation Conference, WSC 2019, National Harbor, MD, USA, December 8-11, 2019, pp. 2224-2235, 2019, IEEE, 978-1-7281-3283-9. The full citation details ...](Pics/full.jpeg) |
2019 |
DBLP DOI BibTeX RDF |
|
23 | Oluwayemisi Sonoiki |
Photolithography and surface modification applications of a 172 nanometer xenon microplasma excilamp ![Search on Bibsonomy](Pics/bibsonomy.png) |
|
2019 |
RDF |
|
23 | Teun Janssen |
Optimization in the Photolithography Bay: Scheduling and the Traveling Salesman Problem. ![Search on Bibsonomy](Pics/bibsonomy.png) |
|
2019 |
RDF |
|
23 | Peng Zhang, Youlong Lv, Jie Zhang 0041 |
An improved imperialist competitive algorithm based photolithography machines scheduling. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Int. J. Prod. Res. ![In: Int. J. Prod. Res. 56(3), pp. 1017-1029, 2018. The full citation details ...](Pics/full.jpeg) |
2018 |
DBLP DOI BibTeX RDF |
|
23 | Peng Zhang 0049, Xinming Zhao, Xia Sheng, Jie Zhang 0041 |
An Imperialist Competitive Algorithm Incorporating Remaining Cycle Time Prediction for Photolithography Machines Scheduling. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IEEE Access ![In: IEEE Access 6, pp. 66787-66797, 2018. The full citation details ...](Pics/full.jpeg) |
2018 |
DBLP DOI BibTeX RDF |
|
23 | Neam Heng Lee, Jian Zhen Tay, Varghese Swamy, Narayanan Ramakrishnan |
Smartphone Display Based Photolithography to Fabricate Microdevices. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IEEE Access ![In: IEEE Access 6, pp. 35713-35719, 2018. The full citation details ...](Pics/full.jpeg) |
2018 |
DBLP DOI BibTeX RDF |
|
23 | Sreenath Chalil Madathil, Siddhartha Nambiar, Scott J. Mason, Mary E. Kurz |
On scheduling a photolithography area containing cluster tools. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Comput. Ind. Eng. ![In: Comput. Ind. Eng. 121, pp. 177-188, 2018. The full citation details ...](Pics/full.jpeg) |
2018 |
DBLP DOI BibTeX RDF |
|
23 | Tzu-Yen Hong, Chen-Fu Chien 0001, Hung-Kai Wang, Hong-Zhi Guo |
A two-phase decoding genetic algorithm for TFT-LCD array photolithography stage scheduling problem with constrained waiting time. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Comput. Ind. Eng. ![In: Comput. Ind. Eng. 125, pp. 200-211, 2018. The full citation details ...](Pics/full.jpeg) |
2018 |
DBLP DOI BibTeX RDF |
|
23 | Amir Ghasemi, Cathal Heavey, Kamil Erkan Kabak |
Implementing a New Genetic Algorithm to solve the Capacity Allocation Problem in the photolithography Area. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: 2018 Winter Simulation Conference, WSC 2018, Gothenburg, Sweden, December 9-12, 2018, pp. 3696-3707, 2018, IEEE, 978-1-5386-6572-5. The full citation details ...](Pics/full.jpeg) |
2018 |
DBLP DOI BibTeX RDF |
|
23 | Hsuan An Kuo, Chen Fu Chien 0001 |
Using Auxiliary Capacity Planning Strategy Genetic Algorithm for TFT-LCD photolithography scheduling to empower Industry 3.5. ![Search on Bibsonomy](Pics/bibsonomy.png) |
CASE ![In: 14th IEEE International Conference on Automation Science and Engineering, CASE 2018, Munich, Germany, August 20-24, 2018, pp. 920-925, 2018, IEEE, 978-1-5386-3593-3. The full citation details ...](Pics/full.jpeg) |
2018 |
DBLP DOI BibTeX RDF |
|
23 | Nurul Ashikin Binti Daud, Yuta Ooka, Tomohisa Tabata, Tomohiro Tetsumoto, Takasumi Tanabe |
Electro-Optic Modulator Based on Photolithography Fabricated p-i-n Integrated Photonic Crystal Nanocavity. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IEICE Trans. Electron. ![In: IEICE Trans. Electron. 100-C(8), pp. 670-674, 2017. The full citation details ...](Pics/full.jpeg) |
2017 |
DBLP DOI BibTeX RDF |
|
23 | Luca Rondi, Fadil Santosa, Zhu Wang 0003 |
A Variational Approach to the Inverse Photolithography Problem. ![Search on Bibsonomy](Pics/bibsonomy.png) |
SIAM J. Appl. Math. ![In: SIAM J. Appl. Math. 76(1), pp. 110-137, 2016. The full citation details ...](Pics/full.jpeg) |
2016 |
DBLP DOI BibTeX RDF |
|
23 | Katsuo Nakamura, Yoshikazu Hirai, Toshiyuki Tsuchiya, Osamu Tabata, Florian Larramendy, Oliver Paul |
Simulation study of SU-8 structures realized by single-step projection photolithography. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IEEE SENSORS ![In: 2016 IEEE SENSORS, Orlando, FL, USA, October 30 - November 3, 2016, pp. 1-3, 2016, IEEE, 978-1-4799-8287-5. The full citation details ...](Pics/full.jpeg) |
2016 |
DBLP DOI BibTeX RDF |
|
23 | Patrick Dumais, Yuming Wei, Ming Li, Fei Zhao, Xin Tu, Jia Jiang, Dritan Celo, Dominic J. Goodwill, Hongyan Fu 0001, Dongyu Geng, Eric Bernier |
2×2 multimode interference coupler with low loss using 248 nm photolithography. ![Search on Bibsonomy](Pics/bibsonomy.png) |
OFC ![In: Optical Fiber Communications Conference and Exhibition, OFC 2016, Anaheim, CA, USA, March 20-24, 2016, pp. 1-3, 2016, IEEE, 978-1-9435-8007-1. The full citation details ...](Pics/full.jpeg) |
2016 |
DBLP BibTeX RDF |
|
23 | Masanori Iwata, Kenji Miyake, Nobuyoshi Yamauchi, Junko Kazusa |
Blue GaN based LED fabrication using hybrid process of the minimal photolithography system and MOCVD. ![Search on Bibsonomy](Pics/bibsonomy.png) |
ICICDT ![In: International Conference on IC Design and Technology, ICICDT 2016, Ho Chi Minh, Vietnam, June 27-29, 2016, pp. 1-4, 2016, IEEE, 978-1-5090-0827-8. The full citation details ...](Pics/full.jpeg) |
2016 |
DBLP DOI BibTeX RDF |
|
23 | Terence Sweeney, Kevin Curran |
The detection of empty resist bottles or air in the resist lines of a photolithography coating tool. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Int. J. Comput. Integr. Manuf. ![In: Int. J. Comput. Integr. Manuf. 28(8), pp. 881-892, 2015. The full citation details ...](Pics/full.jpeg) |
2015 |
DBLP DOI BibTeX RDF |
|
23 | Bing-Hai Zhou, Xin Li 0030, Richard Y. K. Fung |
Dynamic scheduling of photolithography process based on Kohonen neural network. ![Search on Bibsonomy](Pics/bibsonomy.png) |
J. Intell. Manuf. ![In: J. Intell. Manuf. 26(1), pp. 73-85, 2015. The full citation details ...](Pics/full.jpeg) |
2015 |
DBLP DOI BibTeX RDF |
|
23 | Kyungsu Park, James R. Morrison |
Controlled Wafer Release in Clustered Photolithography Tools: Flexible Flow Line Job Release Scheduling and an LMOLP Heuristic. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IEEE Trans Autom. Sci. Eng. ![In: IEEE Trans Autom. Sci. Eng. 12(2), pp. 642-655, 2015. The full citation details ...](Pics/full.jpeg) |
2015 |
DBLP DOI BibTeX RDF |
|
23 | Kyosuke Muramatsu, Hideaki Asakura, Keijiro Suzuki, Ken Tanizawa, Munehiro Toyama, Minoru Ohtsuka, Nobuyuki Yokoyama, Kazuyuki Matsumaro, Miyoshi Seki, Keiji Koshino, Kazuhiro Ikeda, Shu Namiki, Hitoshi Kawashima, Hiroyuki Tsuda |
Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IEICE Electron. Express ![In: IEICE Electron. Express 12(7), pp. 20150019, 2015. The full citation details ...](Pics/full.jpeg) |
2015 |
DBLP DOI BibTeX RDF |
|
23 | Wen-Chin Chen, Xiao-Yun Jiang, Hui-Pin Chang, Hisa-Ping Chen |
An effective system for parameter optimization in photolithography process of a LGP stamper. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Neural Comput. Appl. ![In: Neural Comput. Appl. 24(6), pp. 1391-1401, 2014. The full citation details ...](Pics/full.jpeg) |
2014 |
DBLP DOI BibTeX RDF |
|
23 | Rodrigo Martinez-Duarte |
SU-8 Photolithography as a Toolbox for Carbon MEMS. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Micromachines ![In: Micromachines 5(3), pp. 766-782, 2014. The full citation details ...](Pics/full.jpeg) |
2014 |
DBLP DOI BibTeX RDF |
|
23 | Kyung-Hak Choi, Jinwoo Huh, Yonghao Cui, Krutarth Trivedi, Walter Hu, Byeong-Kwon Ju, Jeong-Bong Lee |
One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Micromachines ![In: Micromachines 5(2), pp. 228-238, 2014. The full citation details ...](Pics/full.jpeg) |
2014 |
DBLP DOI BibTeX RDF |
|
23 | Abdoul Bitar, Stéphane Dauzère-Pérès, Claude Yugma |
On the importance of optimizing in scheduling: the photolithography workstation. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Proceedings of the 2014 Winter Simulation Conference, Savannah, GA, USA, December 7-10, 2014, pp. 2561-2570, 2014, IEEE/ACM. The full citation details ...](Pics/full.jpeg) |
2014 |
DBLP DOI BibTeX RDF |
|
23 | Wen-Yi Lin, Wen-Bin Wu, K. C. Cheng, Hsin Hung Li |
Photolithography for Thin-Film-Transistor Liquid Crystal Displays. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Handbook of Visual Display Technology ![In: Handbook of Visual Display Technology, pp. 835-859, 2012, Springer, 978-3-540-79566-7. The full citation details ...](Pics/full.jpeg) |
2012 |
DBLP DOI BibTeX RDF |
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23 | Li-Yuan Yen, Kuo-Hao Chang |
Cycle time reduction for photolithography area with multi-workstation. ![Search on Bibsonomy](Pics/bibsonomy.png) |
CSCWD ![In: IEEE 16th International Conference on Computer Supported Cooperative Work in Design, CSCWD 2012, May 23-25, 2012, Wuhan, China, pp. 742-746, 2012, IEEE, 978-1-4673-1212-7. The full citation details ...](Pics/full.jpeg) |
2012 |
DBLP DOI BibTeX RDF |
|
23 | Jhih-Nan Yan, Yung-Chun Lee |
Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate. ![Search on Bibsonomy](Pics/bibsonomy.png) |
NEMS ![In: 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, Kyoto, Japan, March 5-8, 2012, pp. 36-39, 2012, IEEE, 978-1-4673-1122-9. The full citation details ...](Pics/full.jpeg) |
2012 |
DBLP DOI BibTeX RDF |
|
23 | Yi-Ta Hsieh, Yung-Chun Lee |
Metal contact printing photolithography for fabricating sub-micrometer patterned sapphire substrates in light-emitting diodes. ![Search on Bibsonomy](Pics/bibsonomy.png) |
NEMS ![In: 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, Kyoto, Japan, March 5-8, 2012, pp. 40-44, 2012, IEEE, 978-1-4673-1122-9. The full citation details ...](Pics/full.jpeg) |
2012 |
DBLP DOI BibTeX RDF |
|
23 | Kuo-Feng Huang, Sung-Wen Tsai, Yung-Chun Lee |
Fabrication metal roller mold with sub-micrometer feature size based on contact printing photolithography. ![Search on Bibsonomy](Pics/bibsonomy.png) |
NEMS ![In: 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, Kyoto, Japan, March 5-8, 2012, pp. 31-35, 2012, IEEE, 978-1-4673-1122-9. The full citation details ...](Pics/full.jpeg) |
2012 |
DBLP DOI BibTeX RDF |
|
23 | Lin Li 0008, Xiaowen Liu, Andrew J. Mason |
Die-level photolithography and etchless parylene packaging processes for on-CMOS electrochemical biosensors. ![Search on Bibsonomy](Pics/bibsonomy.png) |
ISCAS ![In: 2012 IEEE International Symposium on Circuits and Systems, ISCAS 2012, Seoul, Korea (South), May 20-23, 2012, pp. 2401-2404, 2012, IEEE, 978-1-4673-0218-0. The full citation details ...](Pics/full.jpeg) |
2012 |
DBLP DOI BibTeX RDF |
|
23 | James R. Morrison |
On the fidelity of the ax+b equipment model for clustered photolithography scanners in fab-level simulation. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Winter Simulation Conference 2011, WSC'11, Phoenix, AZ, USA, December 11-14, 2011, pp. 2034-2044, 2011, IEEE, 978-1-4577-2108-3. The full citation details ...](Pics/full.jpeg) |
2011 |
DBLP DOI BibTeX RDF |
|
23 | Hao Lv, Shiyuan Liu, Peng Zhang, Zirong Tang |
Fabrication of biomimetic gecko setae by direct photolithography and micromolding processes. ![Search on Bibsonomy](Pics/bibsonomy.png) |
NEMS ![In: 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011, Kaohsiung, Taiwan, February 20-23, 2011, pp. 503-506, 2011, IEEE, 978-1-61284-775-7. The full citation details ...](Pics/full.jpeg) |
2011 |
DBLP DOI BibTeX RDF |
|
23 | Wen-Hui Li, Hong-Wei Chen, Ya-Wen Hu, Yung-Chun Lee, Fei-Bin Hsiao |
Fabrication of seamless roller molds using step-and-rotate curved surface photolithography and application on micro-lens array optic film. ![Search on Bibsonomy](Pics/bibsonomy.png) |
NEMS ![In: 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011, Kaohsiung, Taiwan, February 20-23, 2011, pp. 728-731, 2011, IEEE, 978-1-61284-775-7. The full citation details ...](Pics/full.jpeg) |
2011 |
DBLP DOI BibTeX RDF |
|
23 | Hyun-Jin Kim, Kwang-Jae Kim, Doh-Soon Kwak |
A case study on modeling and optimizing photolithography stage of semiconductor fabrication process. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Qual. Reliab. Eng. Int. ![In: Qual. Reliab. Eng. Int. 26(7), pp. 765-774, 2010. The full citation details ...](Pics/full.jpeg) |
2010 |
DBLP DOI BibTeX RDF |
|
23 | Kazuyoshi Itoga, Jun Kobayashi, Masayuki Yamato, Teruo Okano |
Development of Microfabrication Technology with Maskless Photolithography Device Using LCD Projector. ![Search on Bibsonomy](Pics/bibsonomy.png) |
J. Robotics Mechatronics ![In: J. Robotics Mechatronics 22(5), pp. 608-612, 2010. The full citation details ...](Pics/full.jpeg) |
2010 |
DBLP DOI BibTeX RDF |
|
23 | Andreas Klemmt, Jan Lange, Gerald Weigert, Frank Lehmann 0001, Jens Seyfert |
A multistage mathematical programming based scheduling approach for the photolithography area in semiconductor manufacturing. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Proceedings of the 2010 Winter Simulation Conference, WSC 2010, Baltimore, Maryland, USA, 5-8 December 2010, pp. 2474-2485, 2010, IEEE, 978-1-4244-9864-2. The full citation details ...](Pics/full.jpeg) |
2010 |
DBLP DOI BibTeX RDF |
|
23 | Hong-Wei Chen, Yung-Chun Lee, Fei-Bin Hsiao |
Fabrication of seamless patterns onto metal rollers by photolithography. ![Search on Bibsonomy](Pics/bibsonomy.png) |
NEMS ![In: 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010, Xiamen, China, January 20-23, 2010, pp. 887-892, 2010, IEEE, 978-1-4244-6543-9. The full citation details ...](Pics/full.jpeg) |
2010 |
DBLP DOI BibTeX RDF |
|
23 | Lih-Shyang Chen, Young-Jinn Lay, Lian-Yong Lin, Jing-Jou Tang, Wen-Lin Cheng, Yu-Jen Lin |
The 3D Display and Analysis of the Pattern of Photolithography. ![Search on Bibsonomy](Pics/bibsonomy.png) |
ICCCI (1) ![In: Computational Collective Intelligence. Technologies and Applications - Second International Conference, ICCCI 2010, Kaohsiung, Taiwan, November 10-12, 2010. Proceedings, Part I, pp. 117-127, 2010, Springer, 978-3-642-16692-1. The full citation details ...](Pics/full.jpeg) |
2010 |
DBLP DOI BibTeX RDF |
|
23 | Arthur M. D. Shr, Alan Liu, Peter P. Chen |
Load Balancing Among Photolithography Machines in the Semiconductor Manufacturing System. ![Search on Bibsonomy](Pics/bibsonomy.png) |
J. Inf. Sci. Eng. ![In: J. Inf. Sci. Eng. 24(2), pp. 379-391, 2008. The full citation details ...](Pics/full.jpeg) |
2008 |
DBLP BibTeX RDF |
|
23 | Shu-Hsing Chung, Chun-Ying Huang, Amy H. I. Lee |
Heuristic algorithms to solve the capacity allocation problem in photolithography area (CAPPA). ![Search on Bibsonomy](Pics/bibsonomy.png) |
OR Spectr. ![In: OR Spectr. 30(3), pp. 431-452, 2008. The full citation details ...](Pics/full.jpeg) |
2008 |
DBLP DOI BibTeX RDF |
|
23 | James R. Morrison, Donald P. Martin |
Performance evaluation of photolithography cluster tools. ![Search on Bibsonomy](Pics/bibsonomy.png) |
OR Spectr. ![In: OR Spectr. 29(3), pp. 375-389, 2007. The full citation details ...](Pics/full.jpeg) |
2007 |
DBLP DOI BibTeX RDF |
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23 | Fumihito Arai, Takuma Nakano, Mika Tada, Yu-Ching Lin, Seiichi Ikeda, Tomoyuki Uchida, Hiroyuki Oura, Toshio Fukuda, Takehisa Matsuda, Makoto Negoro |
Fabrication of Cell-Adhesion Surface and Arteriole Model by Photolithography. ![Search on Bibsonomy](Pics/bibsonomy.png) |
J. Robotics Mechatronics ![In: J. Robotics Mechatronics 19(5), pp. 535-543, 2007. The full citation details ...](Pics/full.jpeg) |
2007 |
DBLP DOI BibTeX RDF |
|
23 | James R. Morrison, Maruthi Kumar Mutnuri |
On the Throughput of Clustered Photolithography Tools: Wafer Advancement and Intrinsic Equipment Loss. ![Search on Bibsonomy](Pics/bibsonomy.png) |
CASE ![In: IEEE Conference on Automation Science and Engineering, CASE 2007, September 22-25, 2007. Scottsdale, Arizona, USA, pp. 88-93, 2007, IEEE, 978-1-4244-1154-2. The full citation details ...](Pics/full.jpeg) |
2007 |
DBLP DOI BibTeX RDF |
|
23 | Benoît Torbiéro, Marie-Laure Pourciel-Gouzy, Iryna Humenyuk, Jean-Baptiste Doucet, Augustin Martinez, Pierre Temple-Boyer |
Mass patterning of polysiloxane layers using spin coating and photolithography techniques. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Microelectron. J. ![In: Microelectron. J. 37(2), pp. 133-136, 2006. The full citation details ...](Pics/full.jpeg) |
2006 |
DBLP DOI BibTeX RDF |
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23 | Yung-Kuang Yang, Tsun-Ching Chang |
Experimental analysis and optimization of a photo resist coating process for photolithography in wafer fabrication. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Microelectron. J. ![In: Microelectron. J. 37(8), pp. 746-751, 2006. The full citation details ...](Pics/full.jpeg) |
2006 |
DBLP DOI BibTeX RDF |
|
23 | H.-Y. Kang, Amy H. I. Lee |
Critical dimension control in photolithography based on the yield by a simulation program. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Microelectron. Reliab. ![In: Microelectron. Reliab. 46(5-6), pp. 1006-1012, 2006. The full citation details ...](Pics/full.jpeg) |
2006 |
DBLP DOI BibTeX RDF |
|
23 | D. Y. Sha, S. Y. Hsu, Z. H. Che 0001, C. H. Chen |
A dispatching rule for photolithography scheduling with an on-line rework strategy. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Comput. Ind. Eng. ![In: Comput. Ind. Eng. 50(3), pp. 233-247, 2006. The full citation details ...](Pics/full.jpeg) |
2006 |
DBLP DOI BibTeX RDF |
|
23 | F. Mert Sasoglu, Andrew J. Bohl, Bradley E. Layton |
Microfabrication procedure of PDMS microbeam array using photolithography for laminin printing and piconewton force transduction on axons. ![Search on Bibsonomy](Pics/bibsonomy.png) |
EMBC ![In: 28th International Conference of the IEEE Engineering in Medicine and Biology Society, EMBC 2006, New York City, NY, USA, August 30 - September 3, 2006, Main Volume, pp. 2844-2847, 2006, IEEE, 1-4244-0032-5. The full citation details ...](Pics/full.jpeg) |
2006 |
DBLP DOI BibTeX RDF |
|
23 | Arthur M. D. Shr, Alan Liu, Peter P. Chen |
A Load Balancing Method for Dedicated Photolithography Machine Constraint. ![Search on Bibsonomy](Pics/bibsonomy.png) |
BASYS ![In: Information Technology For Balanced Manufacturing Systems - IFIP TC5, WG 5.5 Seventh International Conference on Information Technology for Balanced Automation Systems in Manufacturing and Services, Niagara Falls, Ontario, Canada, September 4-6, 2006, pp. 339-348, 2006, Springer, 978-0-387-36590-9. The full citation details ...](Pics/full.jpeg) |
2006 |
DBLP DOI BibTeX RDF |
|
23 | Shu-Hsing Chung, Chun-Ying Huang, Amy Hsin-I Lee |
Using Constraint Satisfaction Approach to Solve the Capacity Allocation Problem for Photolithography Area. ![Search on Bibsonomy](Pics/bibsonomy.png) |
ICCSA (3) ![In: Computational Science and Its Applications - ICCSA 2006, International Conference, Glasgow, UK, May 8-11, 2006, Proceedings, Part III, pp. 610-620, 2006, Springer, 3-540-34075-0. The full citation details ...](Pics/full.jpeg) |
2006 |
DBLP DOI BibTeX RDF |
|
23 | Yang-Kuao Kuo, Chuen-Guang Chao, Chi-Yuan Lin |
Analysis of instability line width and white wall created by the photolithography process. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Microelectron. J. ![In: Microelectron. J. 35(11), pp. 915-922, 2004. The full citation details ...](Pics/full.jpeg) |
2004 |
DBLP DOI BibTeX RDF |
|
23 | Wei Kang, Ziqiang John Mao |
Adaptive modeling and H∞ control for photolithography manufacturing process. ![Search on Bibsonomy](Pics/bibsonomy.png) |
ACC ![In: Proceedings of the 2004 American Control Conference, ACC 2004, Boston, MA, USA, June 30 - July 2, 2004, pp. 1392-1393, 2004, IEEE, 0-7803-8335-4. The full citation details ...](Pics/full.jpeg) |
2004 |
DBLP DOI BibTeX RDF |
|
23 | Wei Kang, Ziqiang John Mao |
An adaptive model for the control of critical dimension in photolithography process. ![Search on Bibsonomy](Pics/bibsonomy.png) |
CDC ![In: 43rd IEEE Conference on Decision and Control, CDC 2004, Nassau, Bahamas, December 14-17, 2004, pp. 4231-4236, 2004, IEEE, 0-7803-8682-5. The full citation details ...](Pics/full.jpeg) |
2004 |
DBLP DOI BibTeX RDF |
|
23 | Amr Arisha, Paul Young |
Intelligent Simulation-Based Lot Scheduling of Photolithography Toolsets in a Wafer Fabrication Facility. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Proceedings of the 36th conference on Winter simulation, Washington, DC, USA, December 5-8, 2004, pp. 1935-1942, 2004, IEEE Computer Society, 0-7803-8786-4. The full citation details ...](Pics/full.jpeg) |
2004 |
DBLP BibTeX RDF |
|
23 | Nirupama Nayani, Mansooreh Mollaghasemi |
Validation and Verification of the Simulation Model of a Photolithography Process in Semiconductor Manufacturing. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Proceedings of the 30th conference on Winter simulation, WSC 1998, Washington DC, USA, December 13-16, 1998, pp. 1017-1022, 1998, WSC, 0-7803-5134-7. The full citation details ...](Pics/full.jpeg) |
1998 |
DBLP DOI BibTeX RDF |
|
23 | Christopher P. Ausschnitt, Allan C. Thomas, Timothy J. Wiltshire |
Advanced DUV photolithography in a pilot lineenvironment. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IBM J. Res. Dev. ![In: IBM J. Res. Dev. 41(1&2), pp. 21-38, 1997. The full citation details ...](Pics/full.jpeg) |
1997 |
DBLP DOI BibTeX RDF |
|
23 | Thomas C. McGuigan |
Modeling the Lot Selection Process in Semiconductor Photolithography Processing. ![Search on Bibsonomy](Pics/bibsonomy.png) |
WSC ![In: Proceedings of the 24th Winter Simulation Conference, Arlington, VA, USA, December 13-16, 1992, pp. 885-889, 1992, ACM Press, 0-7803-0798-4. The full citation details ...](Pics/full.jpeg) |
1992 |
DBLP DOI BibTeX RDF |
|
23 | Teruo Matsuzawa, Akemi Moniwa, N. Hasegawa, Hideo Sunami |
Two-Dimensional Simulation of Photolithography on Reflective Stepped Substrate. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. ![In: IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 6(3), pp. 446-451, 1987. The full citation details ...](Pics/full.jpeg) |
1987 |
DBLP DOI BibTeX RDF |
|
23 | Anne M. Spence, Douglas J. Welter |
Capacity planning of a photolithography work cell in a wafer manufacturing line. ![Search on Bibsonomy](Pics/bibsonomy.png) |
ICRA ![In: Proceedings of the 1987 IEEE International Conference on Robotics and Automation, Raleigh, North Carolina, USA, March 31 - April 3, 1987, pp. 702-708, 1987, IEEE, 0-8186-0787-4. The full citation details ...](Pics/full.jpeg) |
1987 |
DBLP DOI BibTeX RDF |
|
23 | Terry Cline, Wendy Fong, Steven Rosenberg |
An Expert Advisor for Photolithography. ![Search on Bibsonomy](Pics/bibsonomy.png) |
IJCAI ![In: Proceedings of the 9th International Joint Conference on Artificial Intelligence. Los Angeles, CA, USA, August 1985, pp. 411-413, 1985, Morgan Kaufmann. The full citation details ...](Pics/full.jpeg) |
1985 |
DBLP BibTeX RDF |
|
23 | Arthur G. Gross, J. Raamot, S. B. Watkins |
Device photolithography: Computer systems for pattern generator control. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Bell Syst. Tech. J. ![In: Bell Syst. Tech. J. 49(9), pp. 2011-2029, 1970. The full citation details ...](Pics/full.jpeg) |
1970 |
DBLP DOI BibTeX RDF |
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23 | Patrick G. Dowd, Morton J. Cowan, Peter E. Rosenfeld, A. Zacharias |
Device photolithography: The primary pattern generator part iii-the control system. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Bell Syst. Tech. J. ![In: Bell Syst. Tech. J. 49(9), pp. 2061-2067, 1970. The full citation details ...](Pics/full.jpeg) |
1970 |
DBLP DOI BibTeX RDF |
|
23 | D. S. Alles, J. W. Elek, F. L. Howland, B. Nevis, R. J. Nielsen, W. A. Schlegel, J. G. Skinner, C. E. Stout |
Device photolithography: The step-and-repeat camera. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Bell Syst. Tech. J. ![In: Bell Syst. Tech. J. 49(9), pp. 2145-2177, 1970. The full citation details ...](Pics/full.jpeg) |
1970 |
DBLP DOI BibTeX RDF |
|
23 | K. M. Poole |
Device photolithography: The primary pattern generator introduction. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Bell Syst. Tech. J. ![In: Bell Syst. Tech. J. 49(9), pp. 2031, 1970. The full citation details ...](Pics/full.jpeg) |
1970 |
DBLP DOI BibTeX RDF |
|
23 | Judith G. Brinsfield, Stephen Pardee |
Device photolithography: The mask shop information system. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Bell Syst. Tech. J. ![In: Bell Syst. Tech. J. 49(9), pp. 2203-2220, 1970. The full citation details ...](Pics/full.jpeg) |
1970 |
DBLP DOI BibTeX RDF |
|
23 | F. R. Ashley, E. B. Murphy, H. J. Savard |
Device photolithography: A computer controlled coordinate measuring machine. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Bell Syst. Tech. J. ![In: Bell Syst. Tech. J. 49(9), pp. 2193-2202, 1970. The full citation details ...](Pics/full.jpeg) |
1970 |
DBLP DOI BibTeX RDF |
|
23 | Barret Broyde |
Device photolithography: Electron-sensitive materials. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Bell Syst. Tech. J. ![In: Bell Syst. Tech. J. 49(9), pp. 2095-2104, 1970. The full citation details ...](Pics/full.jpeg) |
1970 |
DBLP DOI BibTeX RDF |
|
23 | F. L. Howland, K. M. Poole |
Device photolithography: An overview of the new mask-making system. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Bell Syst. Tech. J. ![In: Bell Syst. Tech. J. 49(9), pp. 1997-2009, 1970. The full citation details ...](Pics/full.jpeg) |
1970 |
DBLP DOI BibTeX RDF |
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23 | G. J. W. Kossyk, J. P. Laico, L. Rongved, J. W. Stafford |
Device photolithography: The primary pattern generator part ii-mechanical design. ![Search on Bibsonomy](Pics/bibsonomy.png) |
Bell Syst. Tech. J. ![In: Bell Syst. Tech. J. 49(9), pp. 2043-2059, 1970. The full citation details ...](Pics/full.jpeg) |
1970 |
DBLP DOI BibTeX RDF |
|